Patents by Inventor Sandrine E. Sportouch

Sandrine E. Sportouch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method to perform deep implants without scattering to adjacent areas
    Patent number: 6815317
    Abstract: A method of fabricating an integrated circuit in and on a semiconductor substrate with deep implantations by applying a scattered ion capturing layer in the resist mask opening to capture any implanted ions scattered in the resist and deflected out of the resist into the mask opening to prevent these ions from reaching the semiconductor substrate and affecting the concentration of ions at the edge of the mask and thus the performance of the integrated circuit.
    Type: Grant
    Filed: June 5, 2002
    Date of Patent: November 9, 2004
    Assignees: International Business Machines Corporation, Infineon Technologies, AG
    Inventors: Thomas Schafbauer, Sandrine E. Sportouch
  • Method to perform deep implants without scattering to adjacent areas
    Publication number: 20030228741
    Abstract: A method of fabricating an integrated circuit in and on a semiconductor substrate with deep implantations by applying a scattered ion capturing layer in the resist mask opening to capture any implanted ions scattered in the resist and deflected out of the resist into the mask opening to prevent these ions from reaching the semiconductor substrate and affecting the concentration of ions at the edge of the mask and thus the performance of the integrated circuit.
    Type: Application
    Filed: June 5, 2002
    Publication date: December 11, 2003
    Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION, Infineon Technologies North America Corp.
    Inventors: Thomas Schafbauer, Sandrine E. Sportouch