Patents by Inventor Sandy M. Wen

Sandy M. Wen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated apparatus for efficient removal of halogen residues from etched substrates
    Patent number: 9735002
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: August 15, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven H. Kim
  • Integrated method and apparatus for efficient removal of halogen residues from etched substrates
    Patent number: 7655571
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: February 2, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven M. Kim
  • IMPLEMENTATION OF ADVANCED ENDPOINT FUNCTIONS WITHIN THIRD PARTY SOFTWARE BY USING A PLUG-IN APPROACH
    Publication number: 20090158265
    Abstract: Embodiments described herein generally relate to a method of updating a software routine with subprograms and subroutines that can be accessed by an end user on an as-needed basis. In one embodiment, a method of providing a control function for a semiconductor process to a pre-existing software architecture is described. The method includes providing a plug-in to the pre-existing software architecture, providing an upgrade library file having the control function therein, and uploading the upgrade library file to the pre-existing software architecture at the plug-in to facilitate process control of the semiconductor process.
    Type: Application
    Filed: December 13, 2007
    Publication date: June 18, 2009
    Inventors: Matthew Fenton Davis, Lei Lian, Vivien Chang, Sandy M. Wen, Mikhail Taraboukhine
  • INTEGRATED APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES
    Publication number: 20090014324
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Application
    Filed: August 29, 2008
    Publication date: January 15, 2009
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven H. Kim
  • INTEGRATED METHOD AND APPARATUS FOR EFFICIENT REMOVAL OF HALOGEN RESIDUES FROM ETCHED SUBSTRATES
    Publication number: 20080102646
    Abstract: A method and apparatus for removing volatile residues from a substrate are provided. In one embodiment, a method for volatile residues from a substrate includes providing a processing system having a load lock chamber and at least one processing chamber coupled to a transfer chamber, treating a substrate in the processing chamber with a chemistry comprising halogen, and removing volatile residues from the treated substrate in the load lock chamber.
    Type: Application
    Filed: October 26, 2006
    Publication date: May 1, 2008
    Inventors: Mark Naoshi Kawaguchi, Kin Pong Lo, Brett Christian Hoogensen, Sandy M. Wen, Steven H. Kim