Abstract: An inductively coupled plasma apparatus for exhaust gas treatment, includes: an inductively coupled plasma reactor installed on an exhaust pipe through which exhaust gas generated from a process chamber of a semiconductor manufacturing facility is discharged; a power supply configured to supply high-frequency power to the inductively coupled plasma reactor through a transmission line; and an impedance matching unit configured to match impedance of the inductively coupled plasma reactor with impedance of the power supply, wherein the impedance matching unit includes a variable power storage element, an operation data measuring instrument measuring operation data of the inductively coupled plasma reactor, and a controller stepwise adjusting total capacitance by the variable power storage element using an operation data sampling value obtained by the operation data measuring instrument in one operation cycle and reflecting the adjusted total capacitance on starting impedance matching in a next operation cycle.

Abstract: Provided herein are an organic electronic compound capable of improving luminous efficiency, stability and lifespan of an electronic device, an organic electronic element employing the same, and an electronic device thereof.

Abstract: A two-layer thermal container according to the present invention comprises an outer container having a first intake port at an upper end thereof and an opening at a lower portion thereof; an inner container as a cylindrical body having a second intake port formed at an upper end thereof and inserted into an opening of the outer container with the outer circumferential surface of the second intake port being in close contact with the inner circumferential surface of the first intake port; a sealing member assembled to the opening to seal the opening and having its upper surface contacted with the bottom surface of the inner container; and an insertion stopper inserted into the second intake port of the inner container to seal the second intake port.

Abstract: An apparatus for detecting an arc in a plasma chamber is designed to detect the respective voltage and current values of RF power supplied to the plasma chamber and calculate the ratio of the voltage and current values to accomplish a required control of the supplying of the power. When it is determined that the arc is generated, the apparatus rapidly controls the supplying of the power to prevent damages on the plasma chamber and contaminations on the materials to be processed due to the generation of the arc.

Abstract: A plasma reactor and a plasma ignition method using the same are disclosed. The disclosed plasma reactor includes at least one magnetic core having a transformer primary winding wound thereon, an AC power supply for supplying AC power to the transformer primary winding wound on the magnetic core, at least one plasma chamber body, at which the magnetic core is installed, to directly induce a voltage in the plasma chamber body through the magnetic core, thereby inducing induced electromotive force in the plasma chamber body, and at least one floating chamber connected to the plasma chamber body via an insulating region, the induced electromotive force from the plasma chamber body being indirectly transferred to the floating chamber. Ignition of plasma is generated in accordance with a voltage difference generated between, the plasma chamber body and the floating chamber, and the ignited plasma is supplied to a process chamber.

Abstract: A system for driving a multi-lamp, and more particularly to, a system for driving a multi-lamp for driving a parallel arrangement of a plurality of discharge lamps and a method of driving a plurality of discharge lamps and a method thereof.

Abstract: A system for driving a multi-lamp, and more particularly to, a system for driving a multi-lamp for driving a parallel arrangement of a plurality of discharge lamps and a method of driving a plurality of discharge lamps and a method thereof.