Abstract: In one example embodiment, position of the alignment unit is acquired using a fiducial mark formed on a moving table, and the moving table is moved such that an alignment mark formed on the workpiece is located within a field of view of the alignment unit to measure the position of the alignment mark. Subsequently, the position and posture of the workpiece are accurately measured based on the position of the alignment unit and the position of the alignment mark measured by the alignment unit.

Abstract: In one embodiment, a center of rotation and a slippage amount are estimated when slippage occurs due to radial runout during planar rotation ? to align the mask and the substrate. The slippage amount is estimated after rotation is reflected in a movement command value of a stage as a compensation value, and a moving table, on which the substrate is placed, is moved to compensate the slippage amount, thereby improving overlay performance.

Abstract: According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.

Abstract: According to an example embodiment a substrate processing apparatus includes a supporting unit, a lifting unit on at least a side of the supporting unit, a tray supported by the lifting unit, and a transfer unit configured to transfer a substrate to the tray such that the substrate is positioned on the tray. The lifting unit moves the tray up and down to load or unload the substrate located on the tray on or from the supporting unit.

Abstract: Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual mask instead of a physical mask used in a conventional mask exposure, a virtual target mark instead of an alignment mark used in the conventional mask exposure, and perform an overlay per layer, such that the deposition exposure can be achieved in the maskless exposure.

Abstract: Disclosed herein are a maskless exposure apparatus configured to perform exposure by tilting a beam spot array with respect to a scan direction (Y-axis direction) thus preventing stitching stripes and a stitching method using the same. A step distance, in which exposure dose uniformity in a stitching area is within a tolerance range, is calculated using actual position data of beam spots constituting the beam spot array on an exposure plane, and if necessary, using beam power data and/or beam size data. As exposure is performed based on image data conforming to the step distance, the stitching area has a uniform exposure dose, enabling exposure without stitching stripes.

Abstract: Example embodiments are directed to an auto-focusing device for use in a maskless exposure apparatus that performs a beam focus calibration and an auto-focusing method using the same. The auto-focusing device includes a projection optical unit, a focus calibration unit, and a controller. The projection optical unit includes a distance measurement sensor and a focus controller that generate a beam of light. The focus calibration unit includes a substrate having a reference mark on which the beam generated from the projection optical unit is illuminated, a measuring optical unit configured to obtain image information of the beam illuminated on the reference mark, and a stage configured to support the substrate and the measuring optical unit. The controller is configured to control the focus controller so that a beam of the beam generated from the measuring optical unit is located on the surface of an exposed member.

Abstract: Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure apparatus includes the measurement optical system including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical system.

Abstract: Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof. According to example embodiments, a beam measurement device measures positions and focuses of at least three beams from among a plurality of beams emitted from multiple heads, the measurement enabling alignment of a position and an angle of a lens barrel deviated from a reference position according to an error in position and focus of the measured at least three beams.

Abstract: An actuator according to example embodiments may be relatively compact and may be driven with 2 degrees of freedom with less spatial constraints. The actuator may include a base member, a ball screw member including a ball screw coupled to the base member and a ball nut screwed onto the ball screw, a driving member coupled to the ball nut so as to move in conjunction with the ball nut, a first directional displacement member configured to move in a first direction in response to a first movement of the driving member, a wedge member coupled to the driving member so as to be moved in a second direction in response to a second movement of the driving member, a second directional displacement member configured to move in a second direction in conjunction with the wedge member, and a binding member configured to bind the first directional displacement member to at least one of the driving member, the wedge member, and the base member.

Abstract: Example embodiments are directed to a maskless exposure apparatus using off-axis alignment to form a virtual mask pattern on a substrate. The maskless exposure apparatus includes a movement unit on which the substrate is placed, a light source unit configured to output light, a projection unit configured to divide the light output from the light source unit into a plurality of spot beams to form the pattern and configured to project the spot beams to the movement unit, an alignment unit configured to output alignment light to align the substrate and a virtual mask, a beam imaging unit configured to capture the spot beams and the alignment light, and a controller configured to measure distances between the captured alignment light and at least two of the captured spot beams and configured to determine alignment between the virtual mask and the substrate based on the measured distances to control movement of the movement unit.

Abstract: Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough.

Abstract: An exposure apparatus and a method to measure a beam position and assigning an address using the same are disclosed. The exposure apparatus includes a Digital Micromirror Device (DMD) having a plurality of micromirrors, each micromirror to modulate light projected from a light source and project a modulated DMD beam onto an exposed surface, a measurement mask to measure positions of the DMD beams projected onto the exposed surface, a sensor to detect light intensities of the DMD beams measured by the measurement mask, and a controller to determine the positions of the DMD beams according to the detected light intensities.

Abstract: A method to compress exposure data may include converting image data into a plurality of exposure data, generating new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and compressing the new exposure data. An exposure apparatus may include a conversion unit that converts image data into a plurality of exposure data, a control unit that generates new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and a compression unit that compresses the new exposure data.

Abstract: An exposure apparatus may include: a stage configured to move a substrate; an optical unit configured to generate and project a plurality of laser beams; and a control unit configured to measure straightness of the stage by controlling the projection of the laser beams to an exposed surface of the substrate while moving the stage. A method to measure straightness of a stage in an exposure apparatus may include: placing a substrate on the stage; moving the stage and substrate; generating a plurality of laser beams; projecting the laser beams to the substrate on the stage; and measuring the straightness of the stage by projecting the laser beams to an exposed surface of the substrate.

Abstract: A method of measuring a position error of a beam of an exposure apparatus and an exposure apparatus using the same are provided. An exposure apparatus using a digital micromirror device (DMD) element instead of a mask measures a radiation amount of a beam that passes through each pinhole using a mask including a pinhole, and when the radiation amount is less than a reference value, it is determined that an exposure beam has a position error. By using the exposure apparatus and a method of measuring a position error of a beam, a measurement time period is reduced, and a position error of a beam is simply and accurately determined.

Abstract: An origin of a reference coordinate system is assigned to one of a plurality of center points, and center point coordinates according to the reference coordinate system are assigned to remaining center points, so that reference marks successively correspond to center points of a plurality of microscopes fixed to a base. Beam position detection marks disposed between the reference marks with exposure points of exposure heads fixed to the base are crossed to assign beam coordinates according to the reference coordinate system to the exposure points. Thus, alignment may be easily and accurately performed, and is effective for increasingly larger apparatuses.

Abstract: An LCD glass cassette to store glasses to be mounted on an LCD. The LCD glass cassette has: a side frame and a rear frame, respectively having a side supporter and a rear supporter to respectively support and supporting a side edge and a rear edge of the glass; and a front frame with a front supporter supporting a front edge of the glass. Thus, there is provided the LCD glass cassette capable of effectively preventing bending of LCD glass while the glass is stored.

Abstract: A non-contact feeder system to supply an induced current to an electrical load includes at least three feeding cables arranged approximately parallel with one another along a moving direction of the electrical load; a plurality of AC power supplies to supply AC currents to the feeding cables; pick-up parts to supply an induced current, induced from a magnetic field formed by the AC current flowing through each of the feeding cables, to the electrical load and to be movable along the feeding cables without contacting the feeding cables as the electrical load moves; and a controller to control the plurality of AC power supplies, so that phases of the AC currents supplied from the AC power supplies are the same, and directions of the AC currents flowing through the feeding cables positioned adjacent to one another are reverse with respect to one another. Thus, the space to mount components in the non-contact feeder system is decreased and the induced current is improved.

Abstract: A non-contact feeder system to supply an induced current to an electrical load includes at least three feeding cables arranged approximately parallel with one another along a moving direction of the electrical load; a plurality of AC power supplies to supply AC currents to the feeding cables; pick-up parts to supply an induced current, induced from a magnetic field formed by the AC current flowing through each of the feeding cables, to the electrical load and to be movable along the feeding cables without contacting the feeding cables as the electrical load moves; and a controller to control the plurality of AC power supplies, so that phases of the AC currents supplied from the AC power supplies are the same, and directions of the AC currents flowing through the feeding cables positioned adjacent to one another are reverse with respect to one another. Thus, the space to mount components in the non-contact feeder system is decreased and the induced current is improved.