Patents by Inventor Sang-Gu YIM

Sang-Gu YIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240108817
    Abstract: An implantable microneedle and a manufacturing method therefor is disclosed. The implantable microneedle includes a coating layer for covering at least one part of the surface of a tip part of the microneedle. When exposed to moisture, the coating layer can be separated from the tip part of the microneedle and thus be implanted.
    Type: Application
    Filed: December 5, 2023
    Publication date: April 4, 2024
    Inventors: Seung Yun YANG, Sang-Gu YIM, Young Jun HWANG
  • Patent number: 11938308
    Abstract: The present invention provides an implantable microneedle and a manufacturing method therefor. An implantable microneedle according to the present invention comprises a coating layer for covering at least one part of the surface of a tip part of the microneedle. When exposed to moisture, the coating layer can be separated from the tip part of the microneedle and thus be implanted.
    Type: Grant
    Filed: January 17, 2019
    Date of Patent: March 26, 2024
    Assignee: SNVIA CO., LTD.
    Inventors: Seung Yun Yang, Sang-Gu Yim, Young Jun Hwang
  • Publication number: 20220339417
    Abstract: An implantable substance delivery vehicle of the present invention comprises: a pin comprising a bevel tip and an engraved groove on the surface of the bevel tip; and a substance to be delivered into the body, inserted so as so as to protrude outwardly from the tip, wherein, when the implantable substance delivery vehicle is used for implantation, the substance to be delivered into the body, inserted so as so as to protrude, is caught in tissue so as to be readily detached.
    Type: Application
    Filed: September 2, 2020
    Publication date: October 27, 2022
    Applicant: SNVIA CO., LTD.
    Inventors: Seung Yun YANG, Sang Gu YIM, Eun Nam TAK
  • Publication number: 20220118124
    Abstract: A photocrosslinkable hydrogel may comprise a radioisotope-labeled photocrosslinkable compound or a pharmaceutically acceptable salt thereof, which may be used as a composition for radiotherapy, a composition for radiodiagnostic imaging and a composition for anticancer treatment. The hydrogel is excellent in staying in a local area requiring radiation treatment, so that it can be treated while minimizing damage to surrounding tissues. In addition, it can be used in combination with an anticancer agent and used as a pharmaceutical composition for anticancer treatment, so that cancer can be effectively treated. The hydrogel can be manufactured on site immediately and conveniently using a portable microfluidic system, thereby maximizing the radiation treatment effect.
    Type: Application
    Filed: December 19, 2019
    Publication date: April 21, 2022
    Applicant: SNVIA CO., LTD.
    Inventors: Seung Yun YANG, Sodam KIM, Sang-Gu YIM, Sujeet KUMAR, Ajeesh CHANDRASEKHARAN
  • Publication number: 20200368452
    Abstract: The present invention provides an implantable microneedle and a manufacturing method therefor. An implantable microneedle according to the present invention comprises a coating layer for covering at least one part of the surface of a tip part of the microneedle. When exposed to moisture, the coating layer can be separated from the tip part of the microneedle and thus be implanted.
    Type: Application
    Filed: January 17, 2019
    Publication date: November 26, 2020
    Inventors: Seung Yun YANG, Sang-Gu YIM, Young Jun HWANG
  • Patent number: 10315166
    Abstract: The present disclosure provides an etching mask, a method for manufacturing the same, a method for manufacturing a porous membrane using the same, a porous membrane, a fine dust blocking mask including the same, and a method for manufacturing a surface enhanced Raman scattering active substrate. In this connection, the etching mask includes an organic film; and a pattern layer disposed on the organic film, wherein the pattern layer has openings defined therein having a uniform size, wherein each of the openings includes a micro-scale or nano-scale hole.
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: June 11, 2019
    Assignee: PUSAN NATIONAL UNIVERSITY INDUSTRY UNIVERSITY COOPERATION FOUNDATION OF PUSAN
    Inventors: Seung Yun Yang, Seunghyun Lee, Sang-Gu Yim
  • Publication number: 20170282127
    Abstract: The present disclosure provides an etching mask, a method for manufacturing the same, a method for manufacturing a porous membrane using the same, a porous membrane, a fine dust blocking mask including the same, and a method for manufacturing a surface enhanced Raman scattering active substrate. In this connection, the etching mask includes an organic film; and a pattern layer disposed on the organic film, wherein the pattern layer has openings defined therein having a uniform size, wherein each of the openings includes a micro-scale or nano-scale hole.
    Type: Application
    Filed: August 28, 2015
    Publication date: October 5, 2017
    Inventors: Seung Yun YANG, Seunghyun LEE, Sang-Gu YIM