Abstract: A display device includes: a substrate; a display element on the substrate; a capping layer on the display element; and a thin film encapsulation layer on the capping layer, wherein the capping layer includes: a first capping layer on the display element; a second capping layer on the first capping layer, the second capping layer having a refractive index greater than that of the first capping layer; and a third capping layer on the second capping layer, the third capping layer having a refractive index smaller than that of the second capping layer, wherein the second capping layer has a thickness of 30 nanometers (nm) to 60 nm.

Abstract: The inventive concept provides a substrate treating method for etching a specific region on a substrate. The substrate treating method includes supplying a treating liquid to the substrate; and irradiating a laser to the specific region to locally heat the specific region; and wherein at the irradiating the laser, the laser is irradiated a plurality of times within the specific region, and the laser is irradiated to a region which does not overlap on the substrate, but which overlaps within the specific region.

Abstract: A pre-coating filter device includes: a filtration tank comprising a raw water inlet through which raw water flows on one side, and a drain port at the bottom; a top cover coupled to the upper part of the filtration tank and comprising a coupling hole through the middle part; a purified water discharge pipe coupled to the coupling hole of the top cover; a purified water storage space unit coupled to the lower part of the top cover and located within the filtration tank, and comprising a communication pipe connected to the central part; a filter coupling plate body coupled to the lower part of the purified water storage space unit and comprising a plurality of coupling holes through; and a pre-coating filter coupled to the coupling hole of the filter coupling plate body.

Abstract: An apparatus and method for treating a substrate are provided. The apparatus includes at least one first process chamber configured to supply a developer onto the substrate; at least one second process chamber configured to treat the substrate using a supercritical fluid; a transfer chamber configured to transfer the substrate from the at least one first process chamber to the at least one second process chamber, while the developer supplied in the at least one first process chamber remains on the substrate; and a temperature and humidity control system configured to manage temperature and humidity of the transfer chamber by supplying a first gas of constant temperature and humidity into the transfer chamber.

Abstract: A pre-coating filter device includes: a filtration tank comprising a raw water inlet through which raw water flows on one side, and a drain port at the bottom; a top cover coupled to the upper part of the filtration tank and comprising a coupling hole through the middle part; a purified water discharge pipe coupled to the coupling hole of the top cover; a purified water storage space unit coupled to the lower part of the top cover and located within the filtration tank, and comprising a communication pipe connected to the central part; a filter coupling plate body coupled to the lower part of the purified water storage space unit and comprising a plurality of coupling holes through; and a pre-coating filter coupled to the coupling hole of the filter coupling plate body.