Patents by Inventor Sang Hoon MIN

Sang Hoon MIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240107751
    Abstract: A semiconductor memory device is provided. The semiconductor memory device comprises a substrate including a cell region having an active region defined by a cell element isolation layer, a peripheral region near the cell region, and a boundary region between the cell region and the peripheral region. The device includes a word line structure in the substrate and extending in a first direction, a bit line structure on the substrate extending from the cell region to the boundary region in a second direction that crosses the first direction, including first and second cell conductive layers sequentially stacked on the substrate, and a bit line contact between the substrate and the bit line structure and connecting the substrate with the bit line structure. The second cell conductive layer in the boundary region is thicker than the second cell conductive layer in the cell region.
    Type: Application
    Filed: July 14, 2023
    Publication date: March 28, 2024
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jin A KIM, Kang-Uk KIM, Sang Hoon MIN, Choong Hyun LEE
  • Patent number: 11939334
    Abstract: The present disclosure relates to a novel PLK1 degradation inducing compound having a structure according to Formula I, a method for preparing the same, and the use thereof. The compounds of the present disclosure exhibit an effect of inducing PLK1 degradation. Therefore, the compounds of the present disclosure may be effectively utilized for preventing or treating PLK1-related diseases.
    Type: Grant
    Filed: August 10, 2022
    Date of Patent: March 26, 2024
    Assignee: UPPTHERA, INC.
    Inventors: Soo Hee Ryu, Im Suk Min, Han Kyu Lee, Seong Hoon Kim, Hye Guk Ryu, Keum Young Kang, Sang Youn Kim, So Hyun Chung, Jun Kyu Lee, Gibbeum Lee
  • Patent number: 11912710
    Abstract: The present disclosure relates to a novel PLK1 degradation inducing compound having a structure according to Formula I, a method for preparing the same, and the use thereof. The compounds of the present disclosure exhibit an effect of inducing PLK1 degradation. Therefore, the compounds of the present disclosure may be effectively utilized for preventing or treating PLK1-related diseases.
    Type: Grant
    Filed: August 10, 2022
    Date of Patent: February 27, 2024
    Assignee: UPPTHERA, INC.
    Inventors: Soo Hee Ryu, Im Suk Min, Han Kyu Lee, Seong Hoon Kim, Hye Guk Ryu, Keum Young Kang, Sang Youn Kim, So Hyun Chung, Jun Kyu Lee, Gibbeum Lee