Abstract: An apparatus for cleaning a sensor includes: at least one fluid flow path unit assembled and arranged to correspond to a size and a field of view (FOV) region of a sensor unit and formed with a spray flow path for flowing a fluid supplied through an inlet nozzle, a cover unit coupled to each of the fluid flow path units to shield an opened upper surface of the fluid flow path unit, and a spray nozzle unit selectively coupled to the cover unit and formed so that the fluid flowing along the spray flow path is sprayed toward the FOV region.

Abstract: Disclosed is a maskless exposure method, where it is possible to perform a more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit, and it is also possible to reduce generation of a blur in an exposed pattern.

Abstract: The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrate 22 is disposed on a scan stage 20 that can be moved in horizontal and vertical directions. Meanwhile, an optical unit 30 for generating light available for exposure is disposed above the substrate 22. Light that has passed though the optical unit 30 is transferred to a DMD unit 40. The DMD unit 40 is provided with DMDs 42 for selectively reflecting the light to form a pattern on the substrate 22. The DMDs 42 are arranged in a plurality of rows in such a manner that DMDs 42 in the same row are spaced apart by a predetermined distance from each other and DMDs 42 in different rows partially overlap with each other at one end portions thereof. Thus, when the DMDs 42 scan the substrate 22, scan marks 62 are produced discontinuously in two straight lines.

Abstract: An exposing apparatus maintains uniformly a gap between a substrate and a mask stage. The substrate is disposed on a substrate chuck and the substrate chuck is supported by gap motors and air cylinders. The gap motors control the gap between the substrate and the mask stage and the air cylinders support the deflect portion of the substrate chuck to maintain the flatness of the whole area of the substrate.

Abstract: Disclosed is a maskless exposure method, where it is possible to perform a more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit, and it is also possible to reduce generation of a blur in an exposed pattern.

Abstract: The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrate 22 is disposed on a scan stage 20 that can be moved in horizontal and vertical directions. Meanwhile, an optical unit 30 for generating light available for exposure is disposed above the substrate 22. Light that has passed though the optical unit 30 is transferred to a DMD unit 40. The DMD unit 40 is provided with DMDs 42 for selectively reflecting the light to form a pattern on the substrate 22. The DMDs 42 are arranged in a plurality of rows in such a manner that DMDs 42 in the same row are spaced apart by a predetermined distance from each other and DMDs 42 in different rows partially overlap with each other at one end portions thereof. Thus, when the DMDs 42 scan the substrate 22, scan marks 62 are produced discontinuously in two straight lines.

Abstract: An exposing apparatus comprises a mask stage, a supporter that supports the mask stage, a substrate below the mask stage, and a substrate chuck that supports the substrate. The exposing apparatus further comprises a substrate chuck moving mechanism that moves the substrate chuck, a gap motor unit installed on the substrate chuck moving mechanism that controls a gap between the substrate and the mask stage, and a substrate chuck flatness maintaining mechanism that maintains a flatness of the substrate chuck.