Abstract: Provided is a container including a container portion configured to form a storage space in which contents are stored, a head portion disposed at an upper side of the container portion and configured to promote discharge of the contents, which enter the head portion from the container portion, through an internal pressure change caused by a pressing portion which is formed at one side of the head portion and made of an elastic material, and a nozzle configured to discharge the contents, which enter the nozzle from the head portion, in fixed amounts.

Abstract: According to an embodiment of the present disclosure, a content container is provided. The content container may include: a container part configured to accommodate a liquid content; an upper cap that is detachably coupled to the container part and includes a first accommodation part configured to accommodate a solid content and a pressing part moved by being pressed; and a lower cap that is inserted into the container part, and includes an accommodation tube forming a second accommodation part and a plurality of communication holes formed in the outside of the accommodation tube to communicate with the container part, wherein, by pressing the upper cap, the solid content is moved from the first accommodation part to the second accommodation part.

Abstract: A container includes a container portion having a storage space in which contents are stored, a spout coupled to the container portion and through which the contents in the container portion are discharged, and a nozzle configured to discharge the contents in fixed amounts, wherein the contents enter the nozzle from the head portion, and the spout and the nozzle are integrally formed.

Abstract: A suction device that incorporates liquid to form a wet seal with a foreign body and/or debris, enabling an effective contact for extraction from canals, passages, and other bodily areas of a patient. A liquid chamber is formed between a distal nozzle and a distal end of a main body. The liquid chamber acts as a reservoir to facilitate a wet seal at the distal end of the embodiment. A vacuum provides suction through the embodiment, and a pressure release outlet is incorporated into the main body to allow for variation of suction force, affecting the moisture coverage presented to the area of extraction. Nozzle tip attachments may be affixed to the distal nozzle to further facilitate foreign body extraction. Other embodiments are described and shown.

Abstract: A container includes a container portion having a storage space in which contents are stored, a spout coupled to the container portion and through which the contents in the container portion are discharged, and a nozzle configured to discharge the contents in fixed amounts, wherein the contents enter the nozzle from the head portion, and the spout and the nozzle are integrally formed.

Abstract: Provided is a container including a container portion configured to form a storage space in which contents are stored, a head portion disposed at an upper side of the container portion and configured to promote discharge of the contents, which enter the head portion from the container portion, through an internal pressure change caused by a pressing portion which is formed at one side of the head portion and made of an elastic material, and a nozzle configured to discharge the contents, which enter the nozzle from the head portion, in fixed amounts.

Abstract: According to an embodiment of the present disclosure, a content container is provided. The content container may include: a container part configured to accommodate a liquid content; an upper cap that is detachably coupled to the container part and includes a first accommodation part configured to accommodate a solid content and a pressing part moved by being pressed; and a lower cap that is inserted into the container part, and includes an accommodation tube forming a second accommodation part and a plurality of communication holes formed in the outside of the accommodation tube to communicate with the container part, wherein, by pressing the upper cap, the solid content is moved from the first accommodation part to the second accommodation part.

Abstract: The present invention provides a method for controlling a mobile device adaptively to the user by collecting and analyzing the behavior pattern of the users of the mobile devices, and generating the suitable policy for each of the users. The method may comprise gathering, by the mobile device, behavior patterns of the user, sending, by the mobile device, information about the gathered behavior patterns to an analysis device, analyzing, by the analysis device, the information about the behavior patterns, generating, by the analysis device, media control information based on the behavior patterns and access authority of the user by referring to a management table comprising a list of one or more mobile devices and one or more information about behavior patterns, sending it, by the analysis device, to the mobile device, and controlling the mobile device based on the media control information.

Abstract: An EUV mask (10, 309) includes an opening (26) that helps to attenuate and phase shift extreme ultraviolet radiation using a subtractive rather than additive method. A first embedded layer (20) and a second embedded layer (21) may be provided between a lower multilayer reflective stack (14) and an upper multilayer reflective stack (22) to ensure an appropriate and accurate depth of the opening (26), while allowing for defect inspection of the EUV mask (10, 309) and optional defect repair. An optional ARC layer (400) may be deposited in region (28) to reduce the amount of reflection within dark region (28). Alternately, a single embedded layer of hafnium oxide, zirconium oxide, tantalum silicon oxide, tantalum oxide, or the like, may be used in place of embedded layers (20, 21). Optimal thicknesses and locations of the various layers are described.

Abstract: Methods and apparatus are provided for extreme ultraviolet phase shift masks. The apparatus comprises a substrate, a reflectance region, and an attenuating phase shifter. The reflectance region overlies the substrate. The attenuating phase shifter overlies the reflectance region. The attenuating phase shifter includes a plurality of openings that expose portions of the reflectance region. The attenuating phase shifter attenuates radiation through a combination of absorption and destructive interference. The method comprises projecting radiation having a wavelength less than 40 nanometers towards a mask having a plurality of openings through an attenuating phase shifter. The plurality of openings expose a reflectance region in the mask. The attenuating phase shifter is less than 700 angstroms thick. Radiation impinging on the reflectance region exposed by said plurality of openings is reflected whereas radiation impinging on the attenuating phase shifter is attenuated and shifted in phase.

Abstract: An EUV mask (10) includes an opening (26) that helps to attenuate and phase shift extreme ultraviolet radiation using a subtractive rather than additive method. An etch stop layer (20) may be provided between a lower multilayer reflective stack (14) and an upper multilayer reflective stack (22) to ensure an appropriate and accurate depth of the opening. An absorber layer (32) may be deposited within the opening to sufficiently reduce the amount of reflection within dark region (30). Optimal thicknesses and locations of the various layers are described.

Abstract: An EUV mask (10, 309) includes an opening (26) that helps to attenuate and phase shift extreme ultraviolet radiation using a subtractive rather than additive method. A first embedded layer (20) and a second embedded layer (21) may be provided between a lower multilayer reflective stack (14) and an upper multilayer reflective stack (22) to ensure an appropriate and accurate depth of the opening (26), while allowing for defect inspection of the EUV mask (10, 309) and optional defect repair. An optional ARC layer (400) may be deposited in region (28) to reduce the amount of reflection within dark region (28). Alternately, a single embedded layer of hafnium oxide, zirconium oxide, tantalum silicon oxide, tantalum oxide, or the like, may be used in place of embedded layers (20, 21). Optimal thicknesses and locations of the various layers are described.

Abstract: The present invention provides a method of fabricating a silicon fin useful in preparing FinFET type semiconductor structures. The method is particularly useful for creating fins with a width and smoothness appropriate for sub-50 nm type gates. The method begins with a silicon fin prepared by lithographic means from an SOI type structure such that the fin is larger in dimension, particularly width, than is desired in the final fin. If desired the silicon fin can include a nitride cap. A conformal diffusion layer, such as of silicon dioxide, is then deposited onto the fin and silicon dioxide substrate. A PECVD deposition using TEOS gas is one method to deposit the diffusion layer. The coated fin is then heated and exposed to oxygen. The oxygen diffuses through the diffusion layer and converts a portion of the silicon material to silicon dioxide. This oxidation continues until a desired amount of silicon material is converted to SiO2 such that the remaining silicon has the desired dimensions.

Abstract: Methods and apparatus are provided for extreme ultraviolet phase shift masks. The apparatus comprises a substrate, a reflectance region, and an attenuating phase shifter. The reflectance region overlies the substrate. The attenuating phase shifter overlies the reflectance region. The attenuating phase shifter includes a plurality of openings that expose portions of the reflectance region. The attenuating phase shifter attenuates radiation through a combination of absorption and destructive interference. The method comprises projecting radiation having a wavelength less than 40 nanometers towards a mask having a plurality of openings through an attenuating phase shifter. The plurality of openings expose a reflectance region in the mask. The attenuating phase shifter is less than 700 angstroms thick. Radiation impinging on the reflectance region exposed by said plurality of openings is reflected whereas radiation impinging on the attenuating phase shifter is attenuated and shifted in phase.