Patents by Inventor Sang Jin Cho
Sang Jin Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250066347Abstract: The present invention relates to: a substituted thiazolidinedione derivative compound having a novel structure acting as a sterol regulatory element-binding protein-1 (SREBP1) inhibitor, a hydrate thereof, or a pharmaceutically acceptable salt thereof; and a pharmaceutical composition for preventing or treating cancer, comprising same as an active ingredient.Type: ApplicationFiled: December 19, 2022Publication date: February 27, 2025Inventors: Jun-Kyum KIM, Jia CHOI, Eun-Jung KIM, Cheol-Kyu PARK, Seok Won HAM, Min Gi PARK, Hyeon Ju JEONG, Sung Jin KIM, Kyungim MIN, Jong Min PARK, Jungwook CHIN, Sung Jin CHO, Jina KIM, Kyung Jin JUNG, Nayeon KIM, Suhui KIM, Sugyeong KWON, Su-Jeong LEE, Minseon JEONG, Hongchan AN, Jeong-Eun PARK, Dong-Hyun KIM, Ji-youn LIM, Ju-sik MIN, Ji Sun HWANG, Hyo-Jung CHOI, Hayoung HWANG, Oh-Bin KWON, Sungwoo LEE, Sang Bum KIM
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Patent number: 12230667Abstract: A semiconductor device including a switching element on a substrate, a pad isolation layer on the switching element, a conductive pad passing through the pad isolation layer and connected to the switching element, an insulating pattern on the pad isolation layer and having a height greater than a horizontal width, a lower electrode on side surfaces of the insulating pattern on side surfaces of the insulating pattern and in contact with the conductive pad, a capacitor dielectric layer on the lower electrode and having a monocrystalline dielectric layer and a polycrystalline dielectric layer, the monocrystalline dielectric layer being relatively close to side surfaces of the insulating pattern compared to the polycrystalline dielectric layer an upper electrode on the capacitor dielectric layer may be provided.Type: GrantFiled: June 30, 2022Date of Patent: February 18, 2025Assignees: Samsung Electronics Co., Ltd., SEOUL NATIONAL UNIVERISTY R&DB FOUNDATIONInventors: Sang Yeol Kang, Kyu Ho Cho, Han Jin Lim, Cheol Seong Hwang
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Patent number: 12230804Abstract: A method of manufacturing an all-solid-state battery electrode, an all-solid-state battery electrode manufactured by the method, and an all-solid-state battery including the electrode are disclosed. In the method, a specific type of binder included in the electrode is prepared in a fiber form by applying pressure to the binder under specific conditions, so that the fiber-form binder thus prepared has an average fineness that satisfies a specific range. Therefore, the all-solid-state battery including the electrode has an advantage of having high capacity even in the case of electrode thickening for high loading.Type: GrantFiled: December 7, 2021Date of Patent: February 18, 2025Assignees: HYUNDAI MOTOR COMPANY, KIA CORPORATION, KOREA ELECTRONICS TECHNOLOGY INSTITUTEInventors: Jae Min Lim, Yong Gu Kim, Hong Seok Min, Sang Heon Lee, Sa Heum Kim, Yun Sung Kim, Ji Sang Yu, Kyung Su Kim, Goo Jin Jeong, Woo Suk Cho
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Patent number: 12216317Abstract: A multi-channel optical sub-assembly includes a printed circuit board with a signal processor mounted thereon, a package window mounted on the printed circuit board, the package window including a transparent material, a package mounted on the package window, and an optical device accommodated into an inner space of the package and configured to convert an electrical signal, input from the signal processor, into an optical signal, wherein the electrical signal sequentially passes through a window through electrode buried in the package window and a package through electrode buried in the package and is input to the optical device.Type: GrantFiled: August 2, 2022Date of Patent: February 4, 2025Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Eun Kyu Kang, Jong Jin Lee, Dae Seon Kim, Sang Jin Kwon, Won Bae Kwon, Soo Yong Jung, Hae Chung Kang, Dae Woong Moon, Gye Sul Cho
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Publication number: 20250040360Abstract: A display device includes: a substrate; a thin film transistor positioned on the substrate and including a source electrode, a drain electrode, and an active layer positioned between the source electrode and the drain electrode; a gate electrode positioned on the thin film transistor and overlapping the active layer in a plan view; a gate protection layer positioned on the gate electrode and overlapping the active layer in the plan view; an insulating layer positioned on the gate protection layer; and a gate cover layer positioned between side surfaces of the gate electrode and the insulating layer, where the gate cover layer includes a first portion and a second portion spaced apart from the first portion with the gate electrode interposed therebetween, and the first portion and the second portion are in contact with the gate protection layer.Type: ApplicationFiled: April 11, 2024Publication date: January 30, 2025Inventors: Hee Sung YANG, Su Kyeong SHIN, Woo Jin CHO, Sang Gab KIM, Joon Hwa BAE
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Patent number: 10394117Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.Type: GrantFiled: May 11, 2018Date of Patent: August 27, 2019Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
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Publication number: 20180259847Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.Type: ApplicationFiled: May 11, 2018Publication date: September 13, 2018Applicants: Samsung Electronics Co., Ltd., Research & Business Foundation SUNGKYUNKWAN UNIVERSITY, Fine Semitech Co., Ltd.Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU
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Patent number: 10001700Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.Type: GrantFiled: June 3, 2014Date of Patent: June 19, 2018Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
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Publication number: 20160282712Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes graphite-containing thin film.Type: ApplicationFiled: June 3, 2014Publication date: September 29, 2016Applicants: Research & Business Foundation SUNGKYUNKWAN UNIVER SITY, Fine Semitech Co., Ltd.Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU
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Publication number: 20140077909Abstract: Provided is a magnetic device using permanent magnets according to an exemplary embodiment of the present invention. In more detail, the present invention relates to a magnetic device using permanent magnets that can form a high magnetic field using a first permanent magnet and a second permanent magnet to perform various kinds of magnetic field application experiments, in particular, can be used for a single crystal growth, generation of polarized neutrons, and the like, and easily manufactured with a simple configuration and secure sufficient durability.Type: ApplicationFiled: June 5, 2013Publication date: March 20, 2014Inventors: Sang - Jin CHO, Shin - Ae KIM, Elena MAGAY
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Patent number: 8659377Abstract: Provided is a magnetic device using permanent magnets according to an exemplary embodiment of the present invention. In more detail, the present invention relates to a magnetic device using permanent magnets that can form a high magnetic field using a first permanent magnet and a second permanent magnet to perform various kinds of magnetic field application experiments, in particular, can be used for a single crystal growth, generation of polarized neutrons, and the like, and easily manufactured with a simple configuration and secure sufficient durability.Type: GrantFiled: June 5, 2013Date of Patent: February 25, 2014Assignee: Korea Atomic Energy Research InstituteInventors: Sang-Jin Cho, Shin-Ae Kim, Elena Magay
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Patent number: 7635839Abstract: A method for fabricating a supermirror for forming a neutron guide. In the method, a neutron supermirror, which is widely used in the formation of thin films in cold neutron guides and the spectrometer field, is fabricated with nickel thin films and titanium thin films, having varying thickness, using a combination of monochromator structures in which nickel thin films and titanium thin films, having the same thickness, are stacked in the form of periodic structures. According to the method, a combination of monochromator structures having a variety of different thicknesses is formed, such that the amount of the overlap of peaks due to the monochromator structures can be adjusted to increase reflectivity, and some of the monochromator structures can be removed during the fabrication of the supermirror to make it easy to extract monochromatic beams, such that it is easy to fabricate a transmission monochromator, rather than a reflection monochromator.Type: GrantFiled: April 2, 2007Date of Patent: December 22, 2009Assignee: Korea Atomic Energy Research InstituteInventors: Sang-Jin Cho, Chang-Hee Lee, Hark-Rho Kim, Ji-Yong So
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Patent number: 7560687Abstract: A polarized neutron guide for separating neutrons into polarized neutrons while minimizing loss of the neutrons is provided. The polarized neutron guide includes a body, the first space and the second space, and a neutron separation space. The body includes super mirrors coated with a neutron-reflective thin film and the first and second spaces are formed by the first plate inside the body. The neutron separation space is formed by the second plate disposed at the entry of the first space and the third plate disposed at the entry of the second space. Spin-up polarized neutrons and spin-down polarized neutrons are simultaneously separated and transferred in the first and second spaces, respectively. Therefore, with minimum loss of the neutrons, the spin-up polarized neutrons and the spin-down polarized neutrons are effectively separated and collected.Type: GrantFiled: June 8, 2006Date of Patent: July 14, 2009Assignee: Korea Atomic Energy Research InstituteInventors: Sang Jin Cho, Chang Hee Lee, Hark Rho Kim, Young Jin Kim
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Publication number: 20080115338Abstract: A method for fabricating a supermirror for forming a neutron guide. In the method, a neutron supermirror, which is widely used in the formation of thin films in cold neutron guides and the spectrometer field, is fabricated with nickel thin films and titanium thin films, having varying thickness, using a combination of monochromator structures in which nickel thin films and titanium thin films, having the same thickness, are stacked in the form of periodic structures. According to the method, a combination of monochromator structures having a variety of different thicknesses is formed, such that the amount of the overlap of peaks due to the monochromator structures can be adjusted to increase reflectivity, and some of the monochromator structures can be removed during the fabrication of the supermirror to make it easy to extract monochromatic beams, such that it is easy to fabricate a transmission monochromator, rather than a reflection monochromator.Type: ApplicationFiled: April 2, 2007Publication date: May 22, 2008Applicant: KOREA ATOMIC ENERGY RESEARCH INSTITUTEInventors: Sang-Jin Cho, Chang-Hee Lee, Hark-Rho Kim, Ji-Yong So
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Patent number: 6863409Abstract: Disclosed herein is an apparatus for generating a parallel beam with a high flux. The apparatus of the present invention includes a light source, a first mirror and a second mirror. The light source is positioned at a first focal point of a first ellipse. The first mirror is positioned on the first ellipse to reflect a beam emitted by the light source, and concavely shaped to conform to a section of the first ellipse. The second mirror is positioned across a path of the beam reflected by the first mirror, and convexly shaped to conform to a section of a second ellipse so that an angle formed by two tangent lines passing through each pair of incident points of neighboring rays incident upon the second mirror, respectively, is half of an angle formed by two tangent lines passing through each pair of incident points of neighboring rays incident upon the first mirror, respectively.Type: GrantFiled: March 18, 2003Date of Patent: March 8, 2005Assignees: Korea Atomic Energy Research Institute, Korea Hydro & Nuclear Power Co., Ltd.Inventors: Sang Jin Cho, Chang Hee Lee, Young Jin Kim, Jeong Soo Lee, Young Hyun Choi, Kwang Pyo Hong
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Publication number: 20040136102Abstract: Disclosed herein is an apparatus for generating a parallel beam with a high flux. The apparatus of the present invention includes a light source, a first mirror and a second mirror. The light source is positioned at a first focal point of a first ellipse. The first mirror is positioned on the first ellipse to reflect a beam emitted by the light source, and concavely shaped to conform to a section of the first ellipse. The second mirror is positioned across a path of the beam reflected by the first mirror, and convexly shaped to conform to a section of a second ellipse so that an angle formed by two tangent lines passing through each pair of incident points of neighboring rays incident upon the second mirror, respectively, is half of an angle formed by two tangent lines passing through each pair of incident points of neighboring rays incident upon the first mirror, respectively.Type: ApplicationFiled: March 18, 2003Publication date: July 15, 2004Inventors: Sang Jin Cho, Chang Hee Lee, Young Jin Kim, Jeong Soo Lee, Young Hyun Choi, Kwang Pyo Hong