Patents by Inventor Sang Jin Jo

Sang Jin Jo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250090063
    Abstract: Disclosed are a bladder monitoring method and apparatus based on a multi-channel strain bladder sensor, and a multi-channel strain bladder sensor verification method and apparatus. The multi-channel strain bladder sensor verification method according to an embodiment of the present disclosure may comprise the steps of: controlling expansion and contraction of a measurement object acting as a bladder; acquiring a sensing value from each channel of a bladder sensor attached to the measurement object, according to the control of expansion and contraction of the measurement object; tracking the volume change and expansion direction of the measurement object by analyzing data regarding the change in the sensing value from each channel of the bladder sensor; and verifying the bladder sensor on the basis of whether the volume change and expansion direction of the measurement object are included within the standard range corresponding to the control of expansion and contraction of the measurement object.
    Type: Application
    Filed: April 19, 2023
    Publication date: March 20, 2025
    Inventors: Sang Hoon LEE, Hee Jae SHIN, Young Jun CHO, Yu Jin JO
  • Publication number: 20250085511
    Abstract: An optical imaging system includes a first lens group including a first lens and a second lens, a second lens group including a third lens, a fourth lens, and a fifth lens, and a third lens group including a sixth lens and a seventh lens. The first to seventh lenses are arranged in order from an object side, at least one of the first lens group to the third lens group is moved on an optical axis to change a distance between the first lens group to the third lens group, and the following conditional expression is satisfied: 0.2 < BFL / ( 2 * IMG ? HT ) < 2. where BFL is a distance on the optical axis from an image-side surface of the seventh lens to an imaging surface of an image sensor, and IMG HT is half a diagonal length of the imaging surface of the image sensor.
    Type: Application
    Filed: November 20, 2024
    Publication date: March 13, 2025
    Applicant: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Ju Hwa SON, Hyo Jin HWANG, Yong Joo JO, Sang Hyun JANG, Jong Gi LEE
  • Publication number: 20250058629
    Abstract: A system and a method for controlling sound output in a vehicle can enhance driving sensitivity. The system includes a sensing device that obtains vehicle information of the vehicle, a sound device that plays and outputs a vehicle sound through speakers, a seat device that controls seat vibration based on the vehicle sound, and a control device connected with the sensing device, the sound device, and the seat device. The control device determines a driving mode of the vehicle based on the vehicle information, performs sound shift control for the speakers based on the driving mode, and controls the seat vibration in conjunction with the sound shift control.
    Type: Application
    Filed: March 25, 2024
    Publication date: February 20, 2025
    Inventors: Ki Chang Kim, Tae Kun Yun, Sang Jin Hong, Dong Chul Park, Eun Soo Jo, Jin Sung Lee
  • Publication number: 20250034421
    Abstract: An ink for photonic annealing includes metal micron particles, and metal nanoparticles adsorbed on a surface of the metal micron particles, and the adsorbed metal nanoparticles are formed in a single layer.
    Type: Application
    Filed: October 11, 2024
    Publication date: January 30, 2025
    Applicant: UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY
    Inventors: Sun Ho JEONG, Ye Jin Jo, Sang Hyeok Bae, Ji Yu Shim
  • Patent number: 8257886
    Abstract: A method for fabricating a phase shift mask includes obtaining a layout of a mask region which sets up alight transmitting region; obtaining a layout of a phase shift region placed in a border portion of the mask region by disposing a shadow core region for light-shielding in a middle portion of the mask region; forming phase shift patterns following the layout of the phase shift region on a light transmitting substrate; and forming a shadow core layer pattern which exposes a portion of the substrate corresponding to the light transmitting region between the phase shift patterns and covering and light-shielding the portion of the substrate corresponding to the shadow core region, and a mask fabricated by the method.
    Type: Grant
    Filed: December 8, 2009
    Date of Patent: September 4, 2012
    Assignee: Hynix Semiconductor Inc.
    Inventor: Sang Jin Jo
  • Publication number: 20110159415
    Abstract: An etching apparatus includes: an etching space including a chamber; a chuck in the chamber and on which a transparent object to be etched can be loaded; a light source configured to irradiate light onto the object to be etched in order to detect a degree of etching of the object to be etched; and a detector configured to detect an intensity of the light having transmitted through the object to be etched after being emitted from the light source.
    Type: Application
    Filed: December 28, 2010
    Publication date: June 30, 2011
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Sang Jin JO
  • Patent number: 7799488
    Abstract: Disclosed herein is a method for manufacturing a phase shift mask. An embodiment of the disclosed method includes forming a conductive layer on a mask substrate, irradiating a predetermined area of the mask substrate on which the conductive layer is formed with an electron beam to selectively reduce a portion of silicon oxide (SiO2) in the substrate to silicon (Si), etching only the predetermined area converted to Si, and removing the conductive layer to form the phase shift mask.
    Type: Grant
    Filed: December 27, 2007
    Date of Patent: September 21, 2010
    Assignee: Hynix Semiconductor Inc.
    Inventors: Sang Jin Jo, Ho Yong Jung
  • Publication number: 20100233588
    Abstract: A method for fabricating a phase shift mask includes obtaining a layout of a mask region which sets up alight transmitting region; obtaining a layout of a phase shift region placed in a border portion of the mask region by disposing a shadow core region for light-shielding in a middle portion of the mask region; forming phase shift patterns following the layout of the phase shift region on a light transmitting substrate; and forming a shadow core layer pattern which exposes a portion of the substrate corresponding to the light transmitting region between the phase shift patterns and covering and light-shielding the portion of the substrate corresponding to the shadow core region, and a mask fabricated by the method.
    Type: Application
    Filed: December 8, 2009
    Publication date: September 16, 2010
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Sang Jin Jo
  • Publication number: 20080182182
    Abstract: Disclosed herein is a method for manufacturing a phase shift mask. An embodiment of the disclosed method includes forming a conductive layer on a mask substrate, irradiating a predetermined area of the mask substrate on which the conductive layer is formed with an electron beam, etching the predetermined area, and removing the conductive layer to form the phase shift mask.
    Type: Application
    Filed: December 27, 2007
    Publication date: July 31, 2008
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Sang Jin Jo, Ho Yong Jung