Abstract: An apparatus and a method for caring emotion of a driver based on a vehicle sound, may include a detector configured to detect driving information of the vehicle and body information of a user, a non-transitory storage to store instructions, and a processor to execute the instructions. The processor determines an emotional status of the driver by use of at least one of the driving information or the body information, to generate a healing sound by designing a virtual sound based on the driving information and the emotional status of the driver, and to generate and output the healing sound.

Abstract: An optical imaging system includes a first lens having a convex image-side surface, a second lens having a concave object-side surface, a third lens, a fourth lens, and a fifth lens disposed sequentially from an object side. The optical imaging system satisfies 4.8<f/IMG_HT<9.0, where f is a focal length of the optical imaging system, and IMG_HT is half a diagonal length of an imaging surface of an image sensor.

Abstract: In a sound system that uses over-the-air (OTA), a blockchain platform server is configured to support performance of a virtual sound transaction in a virtual environment. An OTA server is configured to manage a virtual sound transmitted from the blockchain platform server. A vehicle communication control device is configured to perform wireless communication with the OTA server. The vehicle communication control device is configured to download the virtual sound from the OTA server, determine whether the virtual sound is similar to a predetermined specific sound, perform an OTA state test of the virtual sound when the virtual sound is not similar to the predetermined specific sound, and control a sound processing device to play the virtual sound when the virtual sound passes the OTA state test.

Abstract: Provided is a technology for increasing accuracy of position estimation by estimating a position of a signal source based on an error due to altitudes of a sensor and a signal source and an error due to a pitch of an aircraft as well as an error due to curvature of the earth. At this time, a position estimation method may include receiving measurement data from a plurality of sensors, estimating first position data of the signal source based on the measurement data, identifying an altitude error of the first position data, and estimating second position data that is data obtained by correcting the first position data based on the altitude error.

Abstract: An optical imaging system includes a first lens having a convex image-side surface, a second lens having a concave object-side surface, a third lens, a fourth lens, and a fifth lens disposed sequentially from an object side. The optical imaging system satisfies 4.8<f/IMG_HT<9.0, where f is a focal length of the optical imaging system, and IMG_HT is half a diagonal length of an imaging surface of an image sensor.

Abstract: There is provide a method for manufacturing analytical semiconductor samples by using an apparatus for manufacturing analytical semiconductor samples, which minimizes a feedback time by manufacturing a viewing surface that is environment-friendly and has a large area. The method comprising mounting the analytical semiconductor samples to a holder; discharging deionized (DI) water to an upper surface of a polishing plate through a DI water nozzle; grinding the analytical semiconductor samples with the upper surface of the polishing plat; determining whether a desired viewing surface of the analytical semiconductor samples has been acquired after the grinding of the analytical semiconductor samples; and transferring the analytical semiconductor samples to analyze the viewing surface of the ground analytical semiconductor samples based on a determination that the desired viewing surface of the analytical semiconductor samples has been acquired.

Abstract: A method for fabricating a phase shift mask includes obtaining a layout of a mask region which sets up alight transmitting region; obtaining a layout of a phase shift region placed in a border portion of the mask region by disposing a shadow core region for light-shielding in a middle portion of the mask region; forming phase shift patterns following the layout of the phase shift region on a light transmitting substrate; and forming a shadow core layer pattern which exposes a portion of the substrate corresponding to the light transmitting region between the phase shift patterns and covering and light-shielding the portion of the substrate corresponding to the shadow core region, and a mask fabricated by the method.

Abstract: An etching apparatus includes: an etching space including a chamber; a chuck in the chamber and on which a transparent object to be etched can be loaded; a light source configured to irradiate light onto the object to be etched in order to detect a degree of etching of the object to be etched; and a detector configured to detect an intensity of the light having transmitted through the object to be etched after being emitted from the light source.

Abstract: Disclosed herein is a method for manufacturing a phase shift mask. An embodiment of the disclosed method includes forming a conductive layer on a mask substrate, irradiating a predetermined area of the mask substrate on which the conductive layer is formed with an electron beam to selectively reduce a portion of silicon oxide (SiO2) in the substrate to silicon (Si), etching only the predetermined area converted to Si, and removing the conductive layer to form the phase shift mask.

Abstract: A method for fabricating a phase shift mask includes obtaining a layout of a mask region which sets up alight transmitting region; obtaining a layout of a phase shift region placed in a border portion of the mask region by disposing a shadow core region for light-shielding in a middle portion of the mask region; forming phase shift patterns following the layout of the phase shift region on a light transmitting substrate; and forming a shadow core layer pattern which exposes a portion of the substrate corresponding to the light transmitting region between the phase shift patterns and covering and light-shielding the portion of the substrate corresponding to the shadow core region, and a mask fabricated by the method.

Abstract: Disclosed herein is a method for manufacturing a phase shift mask. An embodiment of the disclosed method includes forming a conductive layer on a mask substrate, irradiating a predetermined area of the mask substrate on which the conductive layer is formed with an electron beam, etching the predetermined area, and removing the conductive layer to form the phase shift mask.