Patents by Inventor Sang Joon SUN

Sang Joon SUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10050772
    Abstract: Methods and apparatus for generating a standard pattern for data signals from a set of multiple data signals are provided. The standard pattern consists of a signal length, a centerline, an upper limit, and a lower limit. One of methods comprises, receiving first and second data signals, determining a standard pattern length for each of the first and second data signals, sampling each of the first and second data signals by as much as the determined standard pattern length, aligning the sampled first and second data signals, and generating a standard pattern for the first and second data signals by overlapping the aligned first and second data signals, wherein the generated standard pattern is a standard pattern having reflected thereinto upper and lower limit ranges that are determined using levels of the aligned first and second data signals.
    Type: Grant
    Filed: March 16, 2017
    Date of Patent: August 14, 2018
    Assignee: SAMSUNG SDS CO., LTD.
    Inventors: In Suk Park, Sang Joon Sun, Seung Jun Lee, Dae Jung Ahn
  • Publication number: 20170272233
    Abstract: Methods and apparatus for generating a standard pattern for data signals from a set of multiple data signals are provided. The standard pattern consists of a signal length, a centerline, an upper limit, and a lower limit. One of methods comprises, receiving first and second data signals, determining a standard pattern length for each of the first and second data signals, sampling each of the first and second data signals by as much as the determined standard pattern length, aligning the sampled first and second data signals, and generating a standard pattern for the first and second data signals by overlapping the aligned first and second data signals, wherein the generated standard pattern is a standard pattern having reflected thereinto upper and lower limit ranges that are determined using levels of the aligned first and second data signals.
    Type: Application
    Filed: March 16, 2017
    Publication date: September 21, 2017
    Applicant: SAMSUNG SDS CO., LTD.
    Inventors: In Suk PARK, Sang Joon SUN, Seung Jun LEE, Dae Jung AHN