Abstract: The present invention relates to a single-nucleotide polymorphism (SNP) for determining genotypes specific to the regions from which VHSV has been isolated, to PNA for identifying same and a method for identifying, by using same, the single-nucleotide polymorphism (SNP) for determining genotypes specific to the regions from which VHSV has been isolated and, more specifically, to PNA and a kit capable of detecting the single-nucleotide polymorphism mutations of C755A and A756G of the VHSV G-protein by using PNA comprising a sequence of SEQ ID NO: 1. The present invention enables an easy, rapid and accurate identification of genotypes specific to the regions from which VHSV has been isolated, by using PNA having an excellent binding affinity to DNA so as to make each genotype exhibit a different melting temperature.

Abstract: A vacuum sample chamber for a particle and optical device includes on one surface thereof, an aperture through which a particle beam to be focused along an optical axis of particles such as electrons, ions and neutral particles is incident; and on the opposite surface thereof, a detachable sample holder through which light penetrates, thereby enabling a sample to be observed and analyzed by means of the particle beam and light. A sample chamber is capable of reducing observation time by maintaining a vacuum therein even when a sample is put into or taken out from a sample chamber of an electron microscope or focused ion beam observation equipment, and capable of obtaining an optical image on the outside thereof without inserting a light source or an optical barrel into the sample chamber. A light-electron fusion microscope comprising the sample chamber.

Abstract: The present invention relates to a particle beam mass spectrometer and particle measurement method by means of same. More particularly, the present invention relates to a particle beam mass spectrometer including: a particle focusing unit focusing a particle beam induced by gas flow; an electron gun forming a charged particle beam by accelerating thermal electrons to ionize the particle beam focused by the particle focusing unit; a deflector deflecting the charged particle beam according to kinetic energy to charge ratio; and a sensing unit measuring a current induced by the deflected charged particle beam, wherein the deflector includes at least one particle beam separation electrode provided at each of opposite sides with respect to a progress axis of the charged particle beam before being deflected.

Abstract: The present invention relates to a particle beam mass spectrometer and particle measurement method by means of same. More particularly, the present invention relates to a particle beam mass spectrometer including: a particle focusing unit focusing a particle beam induced by gas flow; an electron gun forming a charged particle beam by accelerating thermal electrons to ionize the particle beam focused by the particle focusing unit; a deflector deflecting the charged particle beam according to kinetic energy to charge ratio; and a sensing unit measuring a current induced by the deflected charged particle beam, wherein the deflector includes at least one particle beam separation electrode provided at each of opposite sides with respect to a progress axis of the charged particle beam before being deflected.

Abstract: The present invention relates to a single-nucleotide polymorphism (SNP) for determining genotypes specific to the regions from which VHSV has been isolated, to PNA for identifying same and a method for identifying, by using same, the single-nucleotide polymorphism (SNP) for determining genotypes specific to the regions from which VHSV has been isolated and, more specifically, to PNA and a kit capable of detecting the single-nucleotide polymorphism mutations of C755A and A756G of the VHSV G-protein by using PNA comprising a sequence of SEQ ID NO: 1. The present invention enables an easy, rapid and accurate identification of genotypes specific to the regions from which VHSV has been isolated, by using PNA having an excellent binding affinity to DNA so as to make each genotype exhibit a different melting temperature.

Abstract: A vacuum sample chamber for a particle and optical device includes on one surface thereof, an aperture through which a particle beam to be focused along an optical axis of particles such as electrons, ions and neutral particles is incident; and on the opposite surface thereof, a detachable sample holder through which light penetrates, thereby enabling a sample to be observed and analyzed by means of the particle beam and light. A sample chamber is capable of reducing observation time by maintaining a vacuum therein even when a sample is put into or taken out from a sample chamber of an electron microscope or focused ion beam observation equipment, and capable of obtaining an optical image on the outside thereof without inserting a light source or an optical barrel into the sample chamber. A light-electron fusion microscope comprising the sample chamber.

Abstract: According to one embodiment of the present invention, an ion source includes: an anode tube in which gas flowing in through one side is ionized and discharged to the other side and in which a slit is formed on the outer circumference thereof; a filament which emits thermal electrons toward the slit so as to ionize the gas; and a diffusion-preventing body arranged between the filament and the slit and having at least one hole through which the thermal electrons can pass so as to reduce the diffusion of the thermal electrons flowing into the anode tube.

Abstract: Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.

Abstract: According to one embodiment of the present invention, an ion source includes: an anode tube in which gas flowing in through one side is ionized and discharged to the other side and in which a slit is formed on the outer circumference thereof; a filament which emits thermal electrons toward the slit so as to ionize the gas; and a diffusion-preventing body arranged between the filament and the slit and having at least one hole through which the thermal electrons can pass so as to reduce the diffusion of the thermal electrons flowing into the anode tube.

Abstract: Disclosed herein are a monochromator and a charged particle beam apparatus including the same. The monochromator may include a first electrostatic lens configured to have a charged particle beam discharged by an emitter incident on the first electrostatic lens, refract a ray of the charged particle beam, and include a plurality of electrodes and a second electrostatic lens spaced apart from the first electrostatic lens at a specific interval and configured to have a central axis disposed identically with a central axis of the first electrostatic lens, have the charged particle beam output by the first electrostatic lens incident on the second electrostatic lens, refract the ray of the charged particle beam, and comprise a plurality of electrodes. Accordingly, there is an advantage in that a charged particle beam can have an excellent profile even after passing through the monochromator.

Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.

Abstract: The movement-free bending method means the one of deformation methods for a one- or two-dimensional nanostructures using an ion beam capable of bending and deforming them and furthermore, changing a bending direction without requiring a motion such as a rotation of the nanostructures. The present invention affords a movement-free bending method for deforming the nanostructure 20 having the one-dimensional or two-dimensional shape by irradiating the ion beam 10, wherein a bending direction of the nanostructure 20 is controlled depending on energy of the ion beam 10 or a thickness of the nanostructure 20.

Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.

Abstract: The movement-free bending method means the one of deformation methods for a one- or two-dimensional nanostructures using an ion beam capable of bending and deforming them and furthermore, changing a bending direction without requiring a motion such as a rotation of the nanostructures. The present invention affords a movement-free bending method for deforming the nanostructure 20 having the one-dimensional or two-dimensional shape by irradiating the ion beam 10, wherein a bending direction of the nanostructure 20 is controlled depending on energy of the ion beam 10 or a thickness of the nanostructure 20.

Abstract: An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.

Abstract: An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.

Abstract: The present disclosure relates to a method for fabricating a scanning probe microscope (SPM) nanoneedle probe using an ion beam, a SPM nanoneedle probe, a method of fabricating a critical dimension scanning probe microscope (CD-SPM) nanoneedle probe using an ion beam, a CD-SPM nanoneedle probe, and uses thereof. A disclosed method can comprise: positioning the probe so that a tip of the probe on which the nanoneedle is attached faces toward a direction in which the ion beam is irradiated; and aligning the nanoneedle attached on the tip of the probe with the ion beam in parallel by irradiating the ion beam toward the tip of the probe on which the nanoneedle is attached.

Abstract: The present invention relates to a method for fabricating a scanning probe microscope (SPM) nanoneedle probe using ion beam which is preferably focused ion beam and a nanoneedle probe thereby. More particularly, the present invention relates to a method for fabricating a SPM nanoneedle probe capable of being easily adjusted with an intended pointing direction of a nanoneedle attached on a tip of the SPM nanoneedle probe and of being easily straightened with the nanoneedle attached on the tip of the SPM nanoneedle probe along the intended pointing direction, and to a SPM nanoneedle probe thereby. Also, the present invention relates to a method for fabricating a critical dimension SPM (CD-SPM) nanoneedle probe capable of precisely scanning the sidewall of an sample object in nanoscale using ion beam which is preferably focused ion beam, and to a CD-SPM nanoneedle probe thereby.

Abstract: The present invention relates to a deformation method of nanometer-scale material using a particle beam and a nano-tool thereby. The deformation method of the nanometer-scale material using the particle beam according to the present invention is characterized in that the nanometer-scale material is bent toward a direction of the particle beam by irradiating the particle beam on the nanometer-scale material.

Abstract: The present invention relates to a deformation method of nanometer-scale material using a particle beam and a nano-tool thereby. The deformation method of the nanometer-scale material using the particle beam according to the present invention is characterized in that the nanometer-scale material is bent toward a direction of the particle beam by irradiating the particle beam on the nanometer-scale material.