Abstract: A heat exchanger includes: a copper pipe forming a refrigerant circulation passage; and a plurality of fins arranged at positions spaced apart from each other along one direction and coupled to an outer circumferential surface of the copper pipe, wherein the copper pipe includes: a plurality of straight tubes extending along the arranged direction of the plurality of fins; and a plurality of return bends connected to one end of one of the plurality of straight tubes and one end of another one of the plurality of straight tubes by welding, wherein burrs having a circumference greater than an outer diameter of each straight tube are formed at both ends of the plurality of straight tubes, a distance between a rim of the burr and an outer surface of the straight tube is 0.4 mm to 1.8 mm.

Abstract: A heat exchanger includes: a copper pipe forming a refrigerant circulation passage; and a plurality of fins arranged at positions spaced apart from each other along one direction and coupled to an outer circumferential surface of the copper pipe, wherein the copper pipe includes: a plurality of straight tubes extending along the arranged direction of the plurality of fins; and a plurality of return bends connected to one end of one of the plurality of straight tubes and one end of another one of the plurality of straight tubes by welding, wherein burrs having a circumference greater than an outer diameter of each straight tube are formed at both ends of the plurality of straight tubes, a distance between a rim of the burr and an outer surface of the straight tube is 0.4 mm to 1.8 mm.

Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.

Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.

Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.

Abstract: A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.

Abstract: Provided is a composite film used for a light emitting apparatus including a light emitting device. The composite film includes a fluorescent layer including phosphors and an optical plate disposed on the fluorescent layer, and diffusing, reducing or mixing at least one of light emitted by the light emitting device, light emitted by the phosphors and a combination thereof.