Patents by Inventor Sang-Kyung Choi

Sang-Kyung Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for enhancing protein strength
    Patent number: 11975091
    Abstract: A composition for enhancing protein strength according to the present invention contains an aminosilane compound capable of covalent binding with a protein of hair, scalp, skin, nails, leather, or textile, so that the protein and the amino silane compound form a covalent bond, and thus the composition can improve the protein strength enhancement effect and maximize the semi-permanent protein strength enhancement effect.
    Type: Grant
    Filed: September 10, 2021
    Date of Patent: May 7, 2024
    Assignee: LG Household & Health Care Ltd.
    Inventors: Seong Kil Son, Won Kyung Choi, Dong Wan Kim, Ji Hee Yoo, Jeong Rae Lee, Sang Min Lee
  • Super-resolution lithography apparatus and method based on multi light exposure method
    Patent number: 8279400
    Abstract: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: October 2, 2012
    Assignee: Korea Research Institute of Standards and Science
    Inventors: Hee Su Park, Sun Kyung Lee, Jae Yong Lee, Sang-Kyung Choi, Dong-Hoon Lee
  • SUPER-RESOLUTION LITHOGRAPHY APPARATUS AND METHOD BASED ON MULTI LIGHT EXPOSURE METHOD
    Publication number: 20100123889
    Abstract: Disclosed herein is a super-resolution lithography apparatus and method based on a multiple light exposure method. The super-resolution lithography apparatus comprises a photographic medium having energy levels of a first ground state, a second ground state, a first excited state, a second excited state and a quenching state; a first light source inducing energy level transition between the first ground state and the first excited state of the photographic medium; a second light source inducing energy level transition between the second ground state and the first excited state of the photographic medium; and a third light source inducing energy level transition between the second ground state and the second excited state of the photographic medium. Accordingly, the resolution of lithography can be improved simply by using a photographic medium having a simple structure and conventional laser beams and increasing the number of exposure steps.
    Type: Application
    Filed: March 12, 2009
    Publication date: May 20, 2010
    Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE
    Inventors: Hee Su PARK, Sun Kyung LEE, Jae Yong LEE, Sang-Kyung CHOI, Dong-Hoon LEE