Patents by Inventor Sang lck LEE

Sang lck LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS OF FORMING A LOW-K DIELECTRIC LAYER AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20170207083
    Abstract: A method of forming a dielectric layer includes forming a preliminary dielectric layer on a substrate using a silicon precursor and performing an energy treatment on the preliminary dielectric layer to form a dielectric layer. In the dielectric layer, a ratio of Si—CH3 bonding unit to Si—O bonding unit ranges from 0.5 to 5.
    Type: Application
    Filed: November 11, 2016
    Publication date: July 20, 2017
    Applicants: Samsung Electronics Co., Ltd., DNF Co., Ltd.
    Inventors: Sunhye HWANG, Myong Woon KIM, Younjoung CHO, Sang lck LEE, Sang Yong JEON, In Kyung JUNG, Wonwoong CHUNG, Jungsik CHOI