Abstract: A method of processing a substrate using an apparatus for processing a substrate, which generates plasma in a processing space by applying microwaves is provided, the method including a plasma treatment operation of processing a substrate using plasma; a replacing operation of performing the plasma treatment operation a predetermined number of times and replacing a component included in the apparatus; and a backup operation of backing up the apparatus after the replacing operation, wherein the backup operation includes a preheating operation in which the temperature adjusting unit increases a temperature of the processing space by increasing a temperature of coolant supplied to the process chamber; and a bake purge operation performed after the preheating operation and including removing impurities from the component.

Abstract: A display device includes pixel electrodes spaced apart from each other, a first definition layer defining reflective openings opening a first area of each of the pixel electrodes, reflective electrodes disposed on the first area of each of the pixel electrodes, extending from the first area of each of the pixel electrodes to the first definition layer, and spaced apart from each other, a second definition layer disposed on the first definition layer and defining pixel openings opening a second area of each of the reflective electrodes, light emitting layers disposed on the second area of each of the reflective electrodes within the pixel openings, a common electrode overlapping the light emitting layers and the second definition layer in plan view, an encapsulation layer overlapping the common electrode in plan view, a capping layer disposed on the encapsulation layer, and a low refractive index layer disposed on the capping layer.

Abstract: A method of providing text information associated with content includes identifying content including an image uploaded to a content server, extracting text from the image included in the content, and providing text information including the extracted text as the text information associated with the content.

Abstract: Disclosed is a method of treating a substrate by using a substrate treating apparatus generating plasma in a treatment space by applying microwaves, the method including: a plasma treatment operation of treating a substrate with the plasma; a replacement operation in which the plasma treatment operation is performed a preset number of times and a component included in the substrate treating apparatus is replaced; and a backup operation of backing up the substrate treating apparatus after the replacement operation, in which the backup operation includes a bake purge operation for removing byproducts present in the component.