Patents by Inventor Sang Ro Lee

Sang Ro Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240127487
    Abstract: An image encoding/decoding method, device and recording medium based sed on multiple compression levels disclosure may include extracting a region of interest for machine vision from an input image, determining a compression level of the region of interest, and encoding the compression level of the region of interest.
    Type: Application
    Filed: October 11, 2023
    Publication date: April 18, 2024
    Applicants: Electronics and Telecommunications Research Institute, Konkuk University Industrial Cooperation Corp
    Inventors: Han Shin LIM, Sang Woon KWAK, Hyon Gon CHOO, Kyoung Ro YOON, Shin KIM, Ye Gi LEE
  • Publication number: 20240129465
    Abstract: An object-based image encoding/decoding method and device of the present disclosure may include an image partition step which partitions an image to obtain a first object region, a region scaling step which scales the first object region based on a scaling factor of the first object region to obtain a second objection region, a region merging step which merges the second object region with at least one of an object region different from the second object region or a non-object region to obtain a merged image, and an image reconstruction step which reconstructs the merged image.
    Type: Application
    Filed: October 10, 2023
    Publication date: April 18, 2024
    Applicants: Electronics and Telecommunications Research Institute, Konkuk University Industrial Cooperation Corp
    Inventors: Hyon Gon CHOO, Sang Woon KWAK, Han Shin LIM, Kyoung Ro YOON, Shin KIM, Ye Gi LEE
  • Publication number: 20240079568
    Abstract: A lithium secondary battery includes a cathode, a separator, and an anode including an anode current collector and an anode active material layer formed on the anode current collector and facing the cathode with the separator interposed therebetween. The anode active material layer includes a first anode active material layer formed on the anode current collector and including a first anode active material and a first anode binder containing a styrene-butadiene-based rubber (SBR) binder and a second anode active material layer formed on the first anode active material layer and including a second anode active material and a second anode binder containing a acryl-based binder. Each of the first anode active material and the second anode active material includes a silicon-based active material and a graphite-based material and contains 2 to 9.5 parts by weight of silicon with respect to the 100 part by weight of the graphite-based active material.
    Type: Application
    Filed: October 25, 2023
    Publication date: March 7, 2024
    Inventors: Yong Seok LEE, Jung Hwan KIM, Myung Ro LEE, Sang Won BAE, Ji Hee BAE
  • Publication number: 20240045108
    Abstract: A wet etching method according to the present disclosure includes cleaning the glass, forming a nanoscale pattern by wet-etching the cleaned glass, and cleaning and drying the nano-patterned glass, wherein a wet etching solution used in the wet etching includes hydrofluoric acid and a surfactant. According to the present disclosure, a glass having high transmittance/low reflectance can be provided. The glass can be applied to an optical device and a display including a mobile device.
    Type: Application
    Filed: October 19, 2021
    Publication date: February 8, 2024
    Inventors: Sang-Ro LEE, Katsushi IGARASHI
  • Patent number: 11618710
    Abstract: The present invention relates to a nano-protrusion forming method and a base material having a nano-protrusion surface formed by the method. The method includes forming an anti-reflective layer including nano-protrusions having a width of several nm to several tens of nm, and/or an anti-glare layer including protrusions having a width of several tens of nm to several ?m, by a wet etching process using an acid solution without using a nano-mask.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: April 4, 2023
    Inventors: Sang Ro Lee, Yun Hwan Kim, Jae Hyung Seo, Ki Hun Kim, Ji Young Lee
  • Publication number: 20200189966
    Abstract: The present invention relates to a nano-protrusion forming method and a base material having a nano-protrusion surface formed by the method. The method includes forming an anti-reflective layer including nano-protrusions having a width of several nm to several tens of nm, and/or an anti-glare layer including protrusions having a width of several tens of nm to several ?m, by a wet etching process using an acid solution without using a nano-mask.
    Type: Application
    Filed: August 2, 2017
    Publication date: June 18, 2020
    Inventors: Sang Ro LEE, Yun Hwan KIM, Jae Hyung SEO, Ki Hun KIM, Ji Young LEE
  • Publication number: 20190382871
    Abstract: The present invention relates to a method of using a methane gas to recover tin with high purity and to produce hydrogen at once, and the method uses the methane reduction technique that combines the two different processes of tin recovery and hydrogen production, thereby recovering tin with high purity from a methane gas and a tin oxide according to the methane reduction technique stably without emission of environmental pollutants, such as carbon dioxide, sulfur dioxide, nitrogen oxide, etc., and also producing hydrogen available as a new energy resource. Further, the present invention enables the recycling of waste materials containing tin oxides generated in all kinds of industries to prevent environmental contaminations and to offer solutions to the stable recovery of expensive tin with high purity and the dramatic reduction of hydrogen production costs at once, increasing economical efficiency and thus contributing to the efficient use of resources.
    Type: Application
    Filed: July 21, 2017
    Publication date: December 19, 2019
    Applicants: A1ENGINEERING, THE INDUSTRIAL & ACADEMIC COOPERATION IN CHUNGNAM NATIONAL UNIVERSITY
    Inventors: Jun Hyun Han, Hyun You Kim, Sang Ro Lee, Hyung Chul Wie, Sang Yeol Kim
  • Patent number: 10365039
    Abstract: A multi-stage separation heat-exchange type drying system is provided. A plurality of first heat exchange blocks of the first main body are installed to be spaced from each other at a predetermined interval, and first vortex generating blocks are installed between the first heat exchange blocks. Also, a plurality of second heat exchange blocks of the second main body are installed to be spaced apart from each other at a predetermined interval, and second vortex generating blocks are installed between the second heat exchange blocks. The heat exchange occurs in a manner that the first heat exchange blocks and the second heat exchange blocks corresponding to each other, positioned up and down, exchange a heat medium therebetween.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: July 30, 2019
    Assignee: A1ENGINEERING
    Inventors: Hyung Chul Wie, Se Gyeong Jang, Sang Ro Lee
  • Publication number: 20180058759
    Abstract: A multi-stage separation heat-exchange type drying system is provided. A plurality of first heat exchange blocks of the first main body are installed to be spaced from each other at a predetermined interval, and first vortex generating blocks are installed between the first heat exchange blocks. Also, a plurality of second heat exchange blocks of the second main body are installed to be spaced apart from each other at a predetermined interval, and second vortex generating blocks are installed between the second heat exchange blocks. The heat exchange occurs in a manner that the first heat exchange blocks and the second heat exchange blocks corresponding to each other, positioned up and down, exchange a heat medium therebetween.
    Type: Application
    Filed: March 9, 2016
    Publication date: March 1, 2018
    Applicant: A1ENGINEERING
    Inventors: Hyung Chul Wie, Se Gyeong Jang, Sang Ro Lee
  • Patent number: 9527436
    Abstract: A planar lighting mirror in which nano-patterns are formed on an entirety or at a specific local area of a mirror surface of a mirror glass and a light source is disposed around the nano-patterns to be used like a mirror in normal operation. In particular, when the light source is activated, the entirety or the specific local area of the mirror surface with the nano-patterns formed thereon planarly emits light from the light source which flows into the side of the mirror glass so as not to deteriorate a mirrors reflective functions.
    Type: Grant
    Filed: December 14, 2014
    Date of Patent: December 27, 2016
    Assignees: Hyundai Motor Company, SEP INC
    Inventors: Sungjune Park, Sang Young Kim, Sang Ro Lee, Yun Hwan Kim, Jae Hyung Seo
  • Publication number: 20160122880
    Abstract: A method for forming a protrusion by masking includes a mask formation step for forming a mask layer on a base material; an etching step for etching an area in which a mask is not formed on the base material, and a mask removal step for removing the mask layer. The mask formation step includes a step for forming at least one small mask, and a step for forming at least one big mask.
    Type: Application
    Filed: September 5, 2013
    Publication date: May 5, 2016
    Inventors: Sang Ro LEE, Jong Joo RHA, Myung Jum PARK, Myoung Geun KIM, Yun Hwan KIM, Jae Hyung SEO, Xin YUE, Ji Young LEE
  • Publication number: 20150266412
    Abstract: A planar lighting mirror in which nano-patterns are formed on an entirety or at a specific local area of a mirror surface of a mirror glass and a light source is disposed around the nano-patterns to be used like a mirror in normal operation. In particular, when the light source is activated, the entirety or the specific local area of the mirror surface with the nano-patterns formed thereon planarly emits light from the light source which flows into the side of the mirror glass so as not to deteriorate a mirrors reflective functions.
    Type: Application
    Filed: December 14, 2014
    Publication date: September 24, 2015
    Applicants: SEP, INC., HYUNDAI MOTOR COMPANY
    Inventors: Sung June Park, Sang Young Kim, Sang Ro Lee, Yun Hwan Kim, Jae Hyung Seo
  • Patent number: 6441554
    Abstract: Disclosed is an apparatus for generating low-temp plasma at atmospheric pressure, comprising: a couple of electrodes facing each other at a distance, one of them being connected to a power supply, the other being grounded; a couple of dielectrics with a thickness of 25 &mgr;m-10 mm, positioned on the facing surfaces of the electrodes in such a way as to face each other, one of them having at least one discharge gap therein; and a conductor electrode having at least one tip positioned within the discharge gap, in which an electric field is applied at an intensity of 1-100 KV/cm through the power supply across the electrodes by use of a pulse direct current or an alternating current in a frequency bandwidth of 50 Hz-10 GHz while a reaction gas is fed between the electrodes, so as to induce a hollow cathode discharge, a capillary discharge or the high accumulation of charges from the discharge gap.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: August 27, 2002
    Assignee: SE Plasma Inc.
    Inventors: Kee-Seok Nam, Sang-Ro Lee, Jong-Ju Rha, Koo-Hyun Lee, Jong-Kuk Kim
  • Publication number: 20020063537
    Abstract: Disclosed is an apparatus for generating low-temp plasma at atmospheric pressure, comprising: a couple of electrodes facing each other at a distance, one of them being connected to a power supply, the other being grounded; a couple of dielectrics with a thickness of 25 &mgr;m-10 mm, positioned on the facing surfaces of the electrodes in such a way as to face each other, one of them having at least one discharge gap therein; and a conductor electrode having at least one tip positioned within the discharge gap, in which an electric field is applied at an intensity of 1-100 KV/cm through the power supply across the electrodes by use of a pulse direct current or an alternating current in a frequency bandwidth of 50 Hz-10 GHz while a reaction gas is fed between the electrodes, so as to induce a hollow cathode discharge, a capillary discharge or the high accumulation of charges from the discharge gap.
    Type: Application
    Filed: May 14, 2001
    Publication date: May 30, 2002
    Applicant: Korea Institute Of Machinery & Materials
    Inventors: Kee-Seok Nam, Sang-Ro Lee, Jong-Ju Rha, Koo-Hyun Lee, Jong-Kuk Kim
  • Patent number: 6346181
    Abstract: Disclosed is an Ni-plated layer of biaxial texture, which is formed by electroplating. In the Ni-plated layer,peaks measured on a &thgr;-rocking curve have a FWHM of 7° or less in terms of the misorientation on the c-axis; and peaks measured on &phgr;-scan have a FWHM of 21° or less in terms of the misorientation on the plane formed by the a-axis and the b-axis. Also, a process of electroplating a Ni layer are disclosed. The process comprises forming a Ni-plated layer of biaxial texture under a magnetic field by electroplating and subjecting the Ni-plated layer to thermal treatment to develop the biaxial texture. This electroplating process is expected to give a significant contribution to the development of the electroplating technology and to replace the vacuum deposition used for the preparation of thin film magnetic materials or thin film piezoelectric materials.
    Type: Grant
    Filed: May 16, 2000
    Date of Patent: February 12, 2002
    Assignee: Korea Institute of Machinery and Materials
    Inventors: Kyu Hwan Lee, Hyung-Sik Chung, Sang Ro Lee, Doyon Chang, Yongsoo Jeong, Jaimoo Yoo, Jae-Woong Ko, Hai-Doo Kim