Abstract: The present disclosure relates to an organic electroluminescent compound and an organic electroluminescent device comprising the same. By comprising the compound according to the present disclosure, it is possible to produce an organic electroluminescent device having improved driving voltage, power efficiency, and/or lifetime properties compared to the conventional organic electroluminescent devices.

Abstract: Disclosed herein is a plasma chamber setting method for generating plasma in a plasma chamber. A plurality of plasma source coils, including a first plasma source coil, a second plasma source coil having an etching rate at the center part thereof higher than that of the first plasma source coil, and a third plasma source coil having an etching rate at the edge part thereof higher than that of the first plasma source coil, are prepared. The first plasma source coil is disposed on the plasma chamber, and a test wafer is etched. The etching rate for each position of the test wafer is analyzed, and first plasma source coil is replaced with the second plasma source coil or the third plasma source coil based on the analysis results.

Abstract: Disclosed is method for manufacturing a semiconductor device, wherein a photosensitive layer and a natural oxidation layer on a cell area and a peripheral circuit area are removed by dry etching while a capacitor of a DRAM device is manufactured, and a polysilicon layer which is not used in the following process is removed by controlling the composition ratio of CF4 gas and O2 gas and the change of pressure and electrical power in two steps so as to reduce the etching selection ratio of the photosensitive layer and the natural oxidation layer with respect to the polysilicon, whereby the remaining polysilicon is prevented regardless of the etching time and etching amount.

Abstract: Disclosed is plasma etching method and apparatus for manufacturing a semiconductor device. The plasma etching apparatus includes a chamber in which a wafer to be etched is loaded, at least one CCD, at least one gas supply unit for supplying etching gases into the chamber; and at least one state control unit. The state control unit comprises a light component extractor, a estimator, a comparator, a controller, and a timer. The plasma etching apparatus also comprises a chamber in which a wafer to be etched is loaded; a first dome sealing an upper end of the chamber; a coil winded on the dome and generation electric field into the chamber; at least one light emission tip disposed through a predetermined portion of the dome, so as to emit light toward the wafer and receive light reflected by the wafer; and a plurality of nozzles, each of which is disposed around light emission tip and through the, predetermined portion of the dome, so as to supply gases into the chamber.

Abstract: Disclosed is method for manufacturing a semiconductor device, wherein a photosensitive layer and a natural oxidation layer on a cell area and a peripheral circuit area are removed by dry etching while a capacitor of a DRAM device is manufactured, and a polysilicon layer which is not used in the following process is removed by controlling the composition ratio of CF4 gas and O2 gas and the change of pressure and electrical power in two steps so as to reduce the etching selection ratio of the photosensitive layer and the natural oxidation layer with respect to the polysilicon, whereby the remaining polysilicon is prevented regardless of the etching time and etching amount.