Abstract: A storage station for unmanned vertical take-off and landing (VTOL) aircrafts includes a storage case (110) for accommodating an unmanned VTOL aircraft therein, a first coupling member (120) having one end pivotably coupled to an inner upper surface of the storage case and the other end protruding out of the storage case by a pivoting operation, and a second coupling member (130) provided at the other end of the first coupling member, in which one end of a main body of the unmanned VTOL aircraft is coupled to the second coupling member, and the second coupling member is rotatable about a rotation axis in a longitudinal direction of the first coupling member, whereby it is possible to provide an advantageous effect of simultaneously storing and charging multiple drones on sides, and it is particularly possible to provide an advantageous effect of charging and storing a large number of drones used in swarm flight technology, which has recently become increasingly useful.

Abstract: Embodiments of the inventive concept provide a substrate treating apparatus and a substrate treating method for not letting an irradiation region of a laser deviate from a target region, even if a shaking angle of a chemical deviates from an allowable range due to a vibration or an airflow. The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes: a substrate support unit configured to support a substrate having a chemical coated thereon; a laser generation unit configured to irradiate a laser to the substrate; and a light-transmitter positioned along a path at which the laser is irradiated.

Abstract: There are provided a method and a system for selecting an optimal synchronization broker for each workload. A system for selecting an optimal synchronization broker for each workload according to an embodiment includes: a storage unit including a database that contains specialist recommendation information including information on a correct protocol that is recommended by a specialist with respect to a service specification and data transmission requirements; and a processor configured to determine an optimal in-bound protocol and an optimal out-bound protocol according to the data transmission requirements through a decision tree model that is trained by using the specialist recommendation information as training data.

Abstract: There are provided a system and a method for setting a synchronization agent. A system for setting an optimal synchronization agent according to a workload according to an embodiment includes: a data integration device configured to integrate and store data which is collected through a collection agent; an agent management server configured to manage the collection agent that periodically polls data from a data source and transmits the data to the data integration device; and an agent setting automation device configured to set an optimal agent set value related to collection and transmission of data of the collection agent.

Abstract: A method for manufacturing a LiDAR device is proposed. The method may include providing a LiDAR module including a laser emitting module and a laser detecting module to a target region. The method may also include adjusting, on the basis of first detecting data obtained from the laser detecting module, a relative position of a detecting optic module with respect to the laser detecting module. The method may further include adjusting, on the basis of image data obtained from at least one image sensor, a relative position of an emitting optic module with respect to the laser emitting module.

Abstract: A vehicle cooling/heating system includes a coolant line in which coolant is circulated between a heat source component of a vehicle that provides waste heat and a chiller and a refrigerant line in which refrigerant is circulated through a compressor, a condenser, an expansion valve, and an evaporator. The refrigerant line performs indoor cooling through the evaporator. A controller controls the coolant line such that, during a drying mode in which it is necessary to dry the evaporator, the coolant in the coolant line is circulated or not circulated through the heat source component and the chiller, and such that the refrigerant in the refrigerant line flows, in order, through the compressor, the evaporator, and the chiller.

Abstract: Provided are a polyamideimide film, a window cover film, and a display panel including the same. More specifically, a polyamideimide film including an amideimide structure derived from a dianhydride, a diamine, and an aromatic diacid dichloride is provided, wherein a chlorine content in the film is 5 to 33 ppm and a yellow index change amount ?YI is 5 or less, the yellow index change amount being measured in accordance with ASTM E313 after repeating a process of irradiating 0.55 W/m2 of UVA at 340 nm at 40° C. for 20 hours and then blocking UVA for 4 hours three times.

Abstract: An embodiment is a thermal management system for a vehicle, the thermal management system including a main refrigerant line in which a compressor, an indoor condenser, a first expansion valve, an outdoor condenser, a second expansion valve, and an indoor evaporator are sequentially provided, a battery cooling water line in which a battery, the chiller for a battery, and a water pump for a battery are sequentially provided, a refrigerant heater disposed between the compressor and the indoor condenser on the main refrigerant line, and a controller configured to control operations of the compressor and the refrigerant heater, control opening and closing of the first expansion valve and the second expansion valve, control operations of the water pump for an electric component and the water pump for a battery, and control flow paths of the refrigerant, the cooling water for an electric component, and the cooling water for a battery.

Abstract: A semiconductor device including a first interlayer insulating film; a conductive pattern in the first interlayer insulating film; a resistance pattern on the conductive pattern; an upper etching stopper film spaced apart from the resistance pattern, extending in parallel with a top surface of the resistance pattern, and including a first metal; a lower etching stopper film on the conductive pattern, extending in parallel with a top surface of the first interlayer insulating film, and including a second metal; and a second interlayer insulating film on the upper etching stopper film and the lower etching stopper film, wherein a distance from a top surface of the second interlayer insulating film to a top surface of the upper etching stopper film is smaller than a distance from the top surface of the second interlayer insulating film to a top surface of the lower etching stopper film.

Abstract: Provided are a separator coating composition for a secondary battery including inorganic particles and a silane salt compound having a specific structure, a separator using the same, and an electrochemical device including the same. Specifically, a separator coating composition for a secondary battery which implements adhesion between an inorganic material layer and a porous substrate without including an acid/polymer-based organic binder in a coating composition for forming the inorganic material layer on one or both surfaces of the porous substrate and does not need a separate dispersing agent for dispersing the inorganic particles, a separator manufactured using the same, and an electrochemical device including the separator are provided.

Abstract: A hard coating film may include a cured product of a polyester polyol modified hyperbranched (meth)acrylate represented by Formula 1:

Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.

Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.

Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.

Abstract: A hard coating film may include a cured product of a polyester polyol modified hyperbranched (meth)acrylate represented by Formula 1:

Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.

Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.

Abstract: Provided are a method and apparatus for providing and using content advisory (CA) information on Internet contents. A method of providing CA information by using a CA information server, includes receiving a request for the CA information on a content, from an Internet Protocol television (IPTV); searching for CA information on the content; and transmitting the found CA information to the IPTV. A method of using CA information when an IPTV reproduces a content not having the CA information, according to the present invention, includes transmitting a request for CA information, to a CA information server; receiving the CA information from the CA information server; analyzing the CA information; and applying the CA information.