Patents by Inventor Sang-Shin Kim
Sang-Shin Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240375484Abstract: A refrigerant circuit includes an auxiliary heat exchanger for adjusting the temperature of refrigerant, a compressor, a condenser, an expansion valve, and an evaporator. The auxiliary heat exchanger selectively operates through a plurality of switch valves. Thus, the temperature of the refrigerant is efficiently managed according to situations, thereby improving cooling and warming performance. An integrated thermal management system includes the auxiliary heat exchanger configured to exchange heat with outside air, thereby efficiently managing the temperature of the refrigerant and simplifying the structure thereof.Type: ApplicationFiled: November 21, 2023Publication date: November 14, 2024Inventors: Sang Shin LEE, Ki Mok KIM, Man Ju OH
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Patent number: 12142090Abstract: An apparatus for a vehicle may determine one or more abnormalities of battery cells of a battery of a vehicle and may control a normal operation by managing the one or more abnormalities. The battery diagnosis apparatus for the vehicle includes a communication device that provides a communication interface with a plurality of vehicles, and a controller that collects vehicle state information and battery state information from the plurality of vehicles, manages a maximum voltage difference change rate of battery cells for each cumulative mileage with respect to the plurality of vehicles, and diagnoses abnormalities in batteries provided in the plurality of vehicles based on the maximum voltage difference change rate of the battery cells for each cumulative mileage.Type: GrantFiled: July 27, 2022Date of Patent: November 12, 2024Assignees: Hyundai Motor Company, Kia CorporationInventors: Jae Shin Yi, Sang Jin Park, Hyun Jun Jang, Tae Kyu Kang, Byung Soo Park, Woo Sung Kim, Soo Youn Park
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Patent number: 12127841Abstract: The present disclosure relates to an upper limb multi-joint impedance measurement method and an apparatus using the same.Type: GrantFiled: September 27, 2017Date of Patent: October 29, 2024Assignee: Ulsan National Institute of Science and TechnologyInventors: Sang Hoon Kang, Sung Shin Kim, Hyunah Kang
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Patent number: 12128733Abstract: An integrated thermal management circuit for a vehicle includes an electrical component line having a first radiator, a battery line having a second radiator, an integration line branching from the electrical component line and the battery line and joined to the electrical component line and the battery line, a refrigerant line having a cooling core and in which a refrigerant flows, a chiller connected to the integration line and the refrigerant line, and a control valve provided to control a flow of coolant from the integration line through the chiller.Type: GrantFiled: April 8, 2020Date of Patent: October 29, 2024Assignees: Hyundai Motor Company, Kia Corporation, Hyundai Wia CorporationInventors: Man Hee Kim, Man Ju Oh, Sang Shin Lee
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Publication number: 20240357852Abstract: A light emitting element includes a first electrode, a hole transport region on the first electrode, an emission layer on the hole transport region, an electron transport region on the emission layer, and a second electrode on the electron transport region. The electron transport region includes an electron transport layer on the emission layer, a first electron injection layer on the electron transport layer, and a second electron injection layer on the first electron injection layer, the thicknesses of the first and second electron injection layers are each about 1 nm to about 5 nm, the first electron injection layer includes a phenanthroline derivative and/or a phosphine oxide derivative, and the second electron injection layer includes a metal material.Type: ApplicationFiled: February 26, 2024Publication date: October 24, 2024Inventors: SUNG-SOO BAE, TSUYOSHI NAIJO, SANG GYUN KIM, HOJUNG SYN, HYOSUP SHIN, JIYOUNG LEE, CHANGWOONG CHU
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Publication number: 20240326558Abstract: An embodiment thermal management system for a vehicle includes a compressor on a first refrigerant line that compresses a refrigerant circulated therein, an external condenser on the first refrigerant line downstream of the compressor that releases heat of the refrigerant, a front evaporator on the first refrigerant line downstream of the external condenser that evaporates the refrigerant, a second refrigerant line connected to the first refrigerant line that allows the refrigerant to be introduced thereinto and then to be discharged upstream of the compressor, a rear evaporator on the second refrigerant line that selectively releases heat of the refrigerant, a first flow control valve on the first refrigerant line that allows the refrigerant to be introduced into the rear evaporator or the external condenser, and a second flow control valve on the second refrigerant line that allows the refrigerant to be introduced into the compressor or the external condenser.Type: ApplicationFiled: August 23, 2023Publication date: October 3, 2024Inventors: Jong Won Kim, Sang Shin Lee
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Patent number: 12107258Abstract: A cathode active material for a lithium secondary battery includes a lithium metal oxide particle, and an organic poly-phosphate or an organic poly-phosphonate formed on at least portion of a surface of the lithium metal oxide particle. Chemical stability of the lithium metal oxide particle may be improved and surface residues may be reduced by the organic poly-phosphate or the organic poly-phosphonate.Type: GrantFiled: October 5, 2022Date of Patent: October 1, 2024Assignee: SK ON CO., LTD.Inventors: Sang Bok Kim, Jik Soo Kim, Hyo Shin Kwak, Myoung Lae Kim
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Patent number: 12107272Abstract: A cathode active material for a lithium secondary battery includes a lithium metal oxide particle, and an organic poly-phosphate or an organic poly-phosphonate formed on at least portion of a surface of the lithium metal oxide particle. Chemical stability of the lithium metal oxide particle may be improved and surface residues may be reduced by the organic poly-phosphate or the organic poly-phosphonate.Type: GrantFiled: October 5, 2022Date of Patent: October 1, 2024Assignee: SK ON CO., LTD.Inventors: Sang Bok Kim, Jik Soo Kim, Hyo Shin Kwak, Myoung Lae Kim
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Patent number: 12097746Abstract: An embodiment heat exchanger includes a first flow path through which a refrigerant discharged from a condenser and drawn into an expansion valve flows and a second flow path through which the refrigerant discharged from a vapor-liquid separator and drawn into a compressor flows, wherein the heat exchanger is configured to perform a heat exchange between the refrigerant flowing through the first flow path and the refrigerant flowing through the second flow path.Type: GrantFiled: October 20, 2022Date of Patent: September 24, 2024Assignees: Hyundai Motor Company, Kia Corporation, Hyundai WIA CorporationInventors: Sang Shin Lee, Ki Mok Kim, Man Ju Oh, Man Hee Kim, Se Min Lee, Bong Jun Park
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Publication number: 20240270049Abstract: Proposed is an integrated thermal management system of which the cooling performance is secured because the entire area of a radiator is used when cooling a PE part and a battery. In particular, heat of the PE part and heat of the battery are selectively shared and thus the entire circuit of the system becomes compact and the energy efficiency is improved.Type: ApplicationFiled: July 6, 2023Publication date: August 15, 2024Applicants: HYUNDAI MOTOR COMPANY, KIA CORPORATIONInventors: Man Ju Oh, Ki Mok Kim, Sang Shin Lee
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Publication number: 20240263293Abstract: A mask including a sensor area including at least one half-etched area, a first deposition area disposed external to the sensor area, and a second deposition area disposed in the sensor area. The mask, a mask assembly including the mask, a display panel manufacturing apparatus including the mask assembly, and a method of manufacturing a display panel using the display panel manufacturing apparatus in accordance with embodiments of the disclosure may improve deposition quality.Type: ApplicationFiled: November 16, 2023Publication date: August 8, 2024Applicant: Samsung Display Co., LTD.Inventors: Sang Hoon KIM, Seung Jin LEE, Yeon Ju KANG, Sang Shin LEE
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Patent number: 9187672Abstract: A hard coating film may include a cured product of a polyester polyol modified hyperbranched (meth)acrylate represented by Formula 1:Type: GrantFiled: November 9, 2012Date of Patent: November 17, 2015Assignee: CHEIL INDUSTRIES, INC.Inventors: Sang Shin Kim, Dong Yoon Shin, Hae Ryong Chung
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Patent number: 8936834Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.Type: GrantFiled: July 3, 2013Date of Patent: January 20, 2015Assignee: Poongsan Microtec CorporationInventors: Sang-Shin Kim, Manuel Scott Rivera, Suk-Dong Hong
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Publication number: 20130302916Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.Type: ApplicationFiled: July 3, 2013Publication date: November 14, 2013Inventors: Sang-Shin Kim, Manuel Scott Rivera, Suk-Dong Hong
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Patent number: 8481123Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.Type: GrantFiled: February 4, 2009Date of Patent: July 9, 2013Assignee: Poongsan Microtec CorporationInventors: Sang-Shin Kim, Manuel Scott Rivera, Suk-Dong Hong
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Publication number: 20130120838Abstract: A hard coating film may include a cured product of a polyester polyol modified hyperbranched (meth)acrylate represented by Formula 1:Type: ApplicationFiled: November 9, 2012Publication date: May 16, 2013Inventors: Sang Shin KIM, Dong Yoon SHIN, Hae Ryong CHUNG
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Publication number: 20090148965Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.Type: ApplicationFiled: February 4, 2009Publication date: June 11, 2009Applicant: POONGSAN MICROTEC CORPORATIONInventors: Sang-Shin Kim, Manuel Scott Rivera, Suk-Dong Hong
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Publication number: 20070187386Abstract: Novel methods and apparatuses for annealing semiconductor devices in a high pressure gas environment. According to an embodiment, the annealing vessel has a dual chamber structure, and potentially toxic, flammable, or otherwise reactive gas is confined in an inner chamber which is protected by pressures of inert gas contained in the outer chamber. The incoming gas delivery system and exhaust gas venting system are likewise protected by various methods. Embodiments of the present invention can be used, for example, for high-K gate dielectric anneal, post metallization sintering anneal, and forming gas anneal in the semiconductor manufacturing process.Type: ApplicationFiled: February 10, 2006Publication date: August 16, 2007Applicant: POONGSAN MICROTEC CORPORATIONInventors: Sang-Shin Kim, Manuel Rivera, Suk-Dong Hong