Abstract: An optical transmitter, an optical receiver, a method of operating the optical transmitter, and a method of operating the optical receiver are provided. The optical transmitter includes a light source configured to output laser light, an intensity modulator configured to provide a pulse signal with a predetermined period using the laser light, an in-phase and quadrature (I/Q) modulator configured to generate a coherent modulated signal applying an I/Q signal to the pulse signal with the predetermined period, and a polarization controller configured to delay one of polarization components forming the coherent modulated signal.

Abstract: An apparatus for manufacturing a semiconductor device includes a substrate transfer unit configured to transfer a substrate, a rail unit including a driving rail extending in a first direction that the substrate transfer unit moves and a stopper on a side of the driving rail in a second direction crossing the first direction, and a lifting unit configured to move in the first direction and a third direction perpendicular to the first and second directions to remove the substrate transfer unit from the rail unit, wherein the lifting unit is configured to contact the stopper to move the stopper from a closed state to an open state.

Abstract: An anti-reflective coating composition includes a solvent and about 20 to about 35 percent by weight of a polymer prepared by a condensation reaction of an acrylate polymer including a hydroxyl group with a derivative of muramic acid and a derivative of mandelic acid.

Abstract: A resin solution usable for forming a protection layer, including an organic solvent and a resol resin. The resin solution may further include any combination of a cross-linking agene or agent(s), a photo active compound (PAC) or compounds(s), and/or development accelerator or accelerator(s) a method forming a cured resin layer, including applying a resin solution, including a resol resin, directly or indirectly on a substrate and hard baking the resin solution to form the cured resin layer. The resin solution may include a resol resin and/or a novolac resin.

Abstract: In a photoresist composition and a method of forming a photoresist pattern using the photoresist composition, the photoresist composition includes a photosensitive polymer having a first repeating unit of p-hydroxystyrene and a second repeating unit of an acrylate at a molar ratio of from about 40:60 to about 60:40, a photosensitive material and an organic solvent. The photoresist composition having good reproducibility and stability may form a photoresist film having a substantially uniform thickness, and may form a fine pattern with accuracy.

Abstract: An anti-reflective coating composition includes a solvent and about 20 to about 35 percent by weight of a polymer prepared by a condensation reaction of an acrylate polymer including a hydroxyl group with a derivative of muramic acid and a derivative of mandelic acid.

Abstract: In a photosensitive polymer, a photoresist composition including the photosensitive polymer and a method of forming a photoresist pattern using the photoresist composition, the photosensitive polymer has a weight average molecular weight of from about 1,000 up to about 100,000 and a repeating unit represented by the following chemical formula (1). wherein R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms, R2 represents an acid-labile hydrocarbon group having 3 to 12 carbon atoms, and n represents an integer greater than or equal to 1. The photoresist composition having good reproducibility and stability may form a photoresist film having a substantially uniform thickness, and may form a fine pattern with accuracy.

Abstract: A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.

Abstract: A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.

Abstract: A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.