Patents by Inventor Sang Soo Choi
Sang Soo Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180256002Abstract: Provided are a dish washing machine capable of effectively removing garbage which remains at the bottom of a washing tub and a filter and a method of controlling the same. When washing water is sprayed from a nozzle while a vane is positioned at a reference position during a drainage operation, since a deflection angle of the vane is bent back and the washing water is strongly sprayed toward a rear wall of a washing tub, the washing water may form a fast and strong water current over a bottom plate of the washing tub, and the fast and strong water current may remove garbage which remains at a filter while flowing over the bottom of the washing tub. Also, even when an excessive amount of garbage is accumulated at a filter at a top end of a sump and blocks the filter during a washing operation such as preliminary washing, main washing, etc., the filter is automatically washed using a small amount of water, thereby eliminating inconvenience of a user to directly separate and wash the filter.Type: ApplicationFiled: May 11, 2018Publication date: September 13, 2018Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jung Chan RYU, Woo Jin SHIN, Soo Hyung YOO, So Jeong KIM, Jun Ho LEE, Jae Man JOO, Sang Soo CHOI
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Patent number: 10034595Abstract: A dishwasher includes a tub that accommodates dishes; a nozzle assembly that sprays washing water; a vane assembly that is moved between a first position and a second position of an inside of the tub and changes a progression path of the washing water so that the sprayed washing water can be directed toward the dishes; and a controller that moves the vane assembly to the second position if the vane assembly is disposed at the first position. When a linear washing portion washes a small quantity of dishes by spraying washing water while making a reciprocal motion in part of an inside of a washing chamber, a washing time can be reduced, and concentrated washing can also be performed.Type: GrantFiled: September 30, 2014Date of Patent: July 31, 2018Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Chan Young Park, Chang Wook Lee, Seung Gee Hong, Soo Hyung Yoo, Min Ho Jung, Sang Soo Choi
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Patent number: 9986884Abstract: Provided are a dish washing machine and a controlling method thereof. When water is sprayed from a nozzle while a vane is positioned at a reference position during a drainage operation, since a deflection angle of the vane is bent back and the water is sprayed toward a rear wall of a washing tub, the water forms a fast and strong water current over a bottom plate of the washing tub to remove garbage which remains at a filter while flowing over the bottom of the washing tub. Accumulation at a filter at a top end of a sump and that may block the filter during washing such as preliminary washing, main washing, etc., is washed, thereby eliminating the inconvenience of having to separate and wash the filter, and effectively improves performance by avoiding poor circulation of water that may occur due to a filter blockage or generation of bubbles.Type: GrantFiled: December 23, 2014Date of Patent: June 5, 2018Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jung Chan Ryu, Woo Jin Shin, Soo Hyung Yoo, So Jeong Kim, Jun Ho Lee, Jae Man Joo, Sang Soo Choi
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Publication number: 20160316990Abstract: Provided are a dish washing machine capable of effectively removing garbage which remains at the bottom of a washing tub and a filter and a method of controlling the same. When washing water is sprayed from a nozzle while a vane is positioned at a reference position during a drainage operation, since a deflection angle of the vane is bent back and the washing water is strongly sprayed toward a rear wall of a washing tub, the washing water may form a fast and strong water current over a bottom plate of the washing tub, and the fast and strong water current may remove garbage which remains at a filter while flowing over the bottom of the washing tub. Also, even when an excessive amount of garbage is accumulated at a filter at a top end of a sump and blocks the filter during a washing operation such as preliminary washing, main washing, etc., the filter is automatically washed using a small amount of water, thereby eliminating inconvenience of a user to directly separate and wash the filter.Type: ApplicationFiled: December 23, 2014Publication date: November 3, 2016Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jung Chan RYU, Woo Jin SHIN, Soo Hyung YOO, So Jeong KIM, Jun Ho LEE, Jae Man JOO, Sang Soo CHOI
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Publication number: 20160316992Abstract: Disclosed is a dishwasher comprising: a tub for containing dishes; a nozzle assembly for ejecting washing water; a vane assembly for changing the path of the washing water, while moving from a first position to a second position inside the tub, such that the ejected washing water is directed towards the dishes; and a controller for stopping the vane assembly, changing the movement speed of the vane assembly, or changing the movement direction of the vane assembly while the vane assembly moves from the first position to the second position, wherein the washing water can also be ejected to corner portions of the tub.Type: ApplicationFiled: December 30, 2014Publication date: November 3, 2016Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Chang Wook LEE, Sang Soo CHOI, Seung Gee HONG, Jun Ho LEE
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Publication number: 20150128999Abstract: A dishwasher includes a tub that accommodates dishes; a nozzle assembly that sprays washing water; a vane assembly that is moved between a first position and a second position of an inside of the tub and changes a progression path of the washing water so that the sprayed washing water can be directed toward the dishes; and a controller that moves the vane assembly to the second position if the vane assembly is disposed at the first position. When a linear washing portion washes a small quantity of dishes by spraying washing water while making a reciprocal motion in part of an inside of a washing chamber, a washing time can be reduced, and concentrated washing can also be performed.Type: ApplicationFiled: September 30, 2014Publication date: May 14, 2015Applicant: Samsung Electronics Co., Ltd.Inventors: Chan Young PARK, Chang Wook LEE, Seung Gee HONG, Soo Hyung YOO, Min Ho JUNG, Sang Soo CHOI
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Patent number: 8636849Abstract: Disclosed herein are a dish washer which is capable of finishing a rinse mode within a predetermined time by changing an operation start time of a heater according to the temperature of washing water at the time of a final rinse mode of the dish washer, and a method of controlling the same. The method of controlling the dish washer including a washing tub for containing dishes to be washed using washing water and a heater for heating the washing water includes sensing a temperature of the washing water, determining an operation start time of the heater on the basis of the sensed temperature of the washing water, and operating the heater according to the determined operation start time of the heater.Type: GrantFiled: January 10, 2008Date of Patent: January 28, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Sang Soo Choi, Shimotera Kennichi
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Patent number: 8297101Abstract: An apparatus and method for forming at least one end turn and one slot segment of a coil for a stator of a dynamoelectric machine includes the utilization of a plurality of forming dies. Each forming die includes two lateral surfaces extending from a base and an end turn surface disposed substantially between and connecting the two lateral surfaces. Each forming die is disposed and pivotable into an arrangement where at least one lateral surface of a first forming die is substantially adjacent and parallel to at least one lateral surface of a second forming die, a slot segment thereby formable between lateral surfaces of adjacent forming dies and an end turn is at least partially formable between an end turn surface and a base of adjacent forming dies.Type: GrantFiled: March 11, 2008Date of Patent: October 30, 2012Assignee: Remy Technologies, L.L.C.Inventors: Daniel J. Bowman, David M. Kroll, Sang-Soo Choi, Richard E. Trammell
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Patent number: 8082770Abstract: An apparatus and method for forming at least one end turn and at least one stator slot segment of a conductor for a stator of a dynamoelectric machine comprising at least two forming die sets. The forming die sets are disposed having a space substantially equal to a width of the conductor between adjacent die sets and include a female forming die and a male forming die linearly slideable to the female forming die. The die sets are disposed such that both at least one end turn and at least one stator slot segment are formable between the male forming dies and the female forming dies when the male forming dies are sequentially actuated to the female forming dies.Type: GrantFiled: March 21, 2008Date of Patent: December 27, 2011Assignee: Remy Technologies, L.L.C.Inventors: Daniel J. Bowman, David M. Kroll, Sang-Soo Choi, Richard A. Vansickle
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Publication number: 20090236005Abstract: An apparatus and method for forming at least one end turn and at least one stator slot segment of a conductor for a stator of a dynamoelectric machine comprising at least two forming die sets. The forming die sets are disposed having a space substantially equal to a width of the conductor between adjacent die sets and include a female forming die and a male forming die linearly slideable to the female forming die. The die sets are disposed such that both at least one end turn and at least one stator slot segment are formable between the male forming dies and the female forming dies when the male forming dies are sequentially actuated to the female forming dies.Type: ApplicationFiled: March 21, 2008Publication date: September 24, 2009Applicant: REMY TECHNOLOGIES, LLCInventors: Daniel J. Bowman, David M. Kroll, Sang-Soo Choi, Richard A. Vansickle
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Publication number: 20090229337Abstract: An apparatus and method for forming at least one end turn and one slot segment of a coil for a stator of a dynamoelectric machine includes the utilization of a plurality of forming dies. Each forming die includes two lateral surfaces extending from a base and an end turn surface disposed substantially between and connecting the two lateral surfaces. Each forming die is disposed and pivotable into an arrangement where at least one lateral surface of a first forming die is substantially adjacent and parallel to at least one lateral surface of a second forming die, a slot segment thereby formable between lateral surfaces of adjacent forming dies and an end turn is at least partially formable between an end turn surface and a base of adjacent forming dies.Type: ApplicationFiled: March 11, 2008Publication date: September 17, 2009Applicant: REMY TECHNOLOGIES, L.L.C.Inventors: Daniel J. Bowman, David M. Kroll, Sang-Soo Choi, Richard E. Trammell
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Publication number: 20080314410Abstract: Disclosed herein are a dish washer which is capable of finishing a rinse mode within a predetermined time by changing an operation start time of a heater according to the temperature of washing water at the time of a final rinse mode of the dish washer, and a method of controlling the same. The method of controlling the dish washer including a washing tub for containing dishes to be washed using washing water and a heater for heating the washing water includes sensing a temperature of the washing water, determining an operation start time of the heater on the basis of the sensed temperature of the washing water, and operating the heater according to the determined operation start time of the heater.Type: ApplicationFiled: January 10, 2008Publication date: December 25, 2008Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Sang Soo Choi, Shimotera Kennichi
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Publication number: 20080128001Abstract: A washing control apparatus and method of a dish washing machine capable of determining a course selection in each operation through the detection of the turbidity of wash water at a preceding operation. The washing control method includes determining whether an automatic washing course has been selected according to a command of a user, when the automatic washing course has been selected, detecting a turbidity of wash water during washing, and selecting a course of a next operation based on the detected turbidity of the wash water.Type: ApplicationFiled: September 10, 2007Publication date: June 5, 2008Applicant: Samsung Electronics Co., Ltd.Inventors: Shimotera Kennichi, Bong Jin Park, Jang Woo Lee, Sang Soo Choi, Jung Chan Ryu
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Publication number: 20080128000Abstract: A washing control apparatus and method of a dish washing machine capable of detecting the turbidity of wash water during washing to determine a next washing operation. The washing control method includes detecting a turbidity of wash water while performing washing using the wash water, and determining a washing operation to be performed based on the detected turbidity of the wash water.Type: ApplicationFiled: September 4, 2007Publication date: June 5, 2008Applicant: Samsung Electronics Co., Ltd.Inventors: Shimotera Kennichi, Sang Soo Choi
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Patent number: 7377984Abstract: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: GrantFiled: January 18, 2007Date of Patent: May 27, 2008Assignee: PKL Co., Ltd.Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
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Publication number: 20070215181Abstract: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: ApplicationFiled: January 18, 2007Publication date: September 20, 2007Applicant: PKL CO., LTD.Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
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Publication number: 20070215188Abstract: Disclosed herein is a device for cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: ApplicationFiled: January 18, 2007Publication date: September 20, 2007Applicant: PKL CO., LTD.Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI
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Patent number: 7186301Abstract: Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: GrantFiled: March 20, 2006Date of Patent: March 6, 2007Assignee: PKL Co., Ltd.Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
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Publication number: 20060257752Abstract: Disclosed is a phase shift mask. Residual ions, which are considered a factor of occurrence of haze which is a growth defect of a surface of a photomask during a photolithography step of a wafer process, are controlled in order to change the content of a surface of the phase shift mask. Diffusion of the residual ions into the surface of the mask is suppressed during a photomask wet cleaning process in order to prevent the haze.Type: ApplicationFiled: March 22, 2006Publication date: November 16, 2006Applicant: PKL CO., Ltd.Inventors: Yong Dae Kim, Jong Min Kim, Han Byul Kang, Hyun Joon Cho, Sang Soo Choi
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Publication number: 20060207633Abstract: Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.Type: ApplicationFiled: March 20, 2006Publication date: September 21, 2006Applicant: PKL CO., Ltd.Inventors: Yong Dae KIM, Jong Min KIM, Han Byul KANG, Hyun Joon CHO, Sang Soo CHOI