Patents by Inventor Sang Won Cho

Sang Won Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8735027
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from a compound represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: May 27, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Seong-Ryong Nam, Taek-Jin Baek, Yeon-Soo Lee, Chang-Min Lee, Sang-Won Cho, Won-A Noh, Gyu-Seok Han, Han-Chul Hwang
  • Publication number: 20140103269
    Abstract: A photosensitive resin composition for a color filter includes (A) a dye polymer composite including a repeating unit derived from a compound represented by the following Chemical Formula 1, (B) an acrylic-based photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a solvent, and a color filter using the same. In Chemical Formula 1, each substituent is the same as described in the detailed description.
    Type: Application
    Filed: March 28, 2013
    Publication date: April 17, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Taek-Jin BAEK, Seong-Ryong NAM, Won-A NOH, Chang-Min LEE, Sang-Won CHO, Gyu-Seok HAN
  • Publication number: 20130164678
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from a compound represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: August 22, 2012
    Publication date: June 27, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Seong-Ryong NAM, Taek-Jin BAEK, Yeon-Soo LEE, Chang-Min LEE, Sang-Won CHO, Won-A NOH, Gyu-Seok HAN, Han-Chul HWANG
  • Publication number: 20130141810
    Abstract: Disclosed is a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from the compound represented by the following Chemical Formula 1, wherein each substituent is the same as defined in the detailed description; (B) an acryl-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent.
    Type: Application
    Filed: October 16, 2012
    Publication date: June 6, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Yeon-Soo LEE, Seong-Ryong NAM, Taek-Jin BAEK, Sang-Won CHO, Jae-Hyun KIM, Chang-Min LEE, Gyu-Seok HAN
  • Publication number: 20130137039
    Abstract: Disclosed are a photosensitive resin composition for a color filter that includes a colorant including a phthalocyanine-based compound represented by the following Chemical Formula 1 and a triarylmethane-based compound represented by the following Chemical Formula 2, wherein the substituents of Chemical Formulas 1 and 2 are the same as same as defined in the detailed description, and a color filter prepared using the same.
    Type: Application
    Filed: September 11, 2012
    Publication date: May 30, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Sang-Won CHO, Ji-Hong KIM, Seong-Ryong NAM, Won-A Noh, Taek-Jin BAEK, Chang-Min LEE, Gyu-Seok HAN
  • Patent number: 8361682
    Abstract: Disclosed is a blue resin composition for a color filter that includes a colorant including an azaporphyrin-based dye and a blue pigment, an acrylic-based binder resin, a reactive unsaturated compound, a polymerization initiator, and a solvent.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: January 29, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Nam-Gwang Kim, Sang-Won Cho, Tae-Gyu Chun, Noh-Seok Byon, Sun-Hee Jin, Jae-Hyun Kim, Gyu-Seok Han
  • Patent number: 8303862
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter including the same. The photosensitive resin composition for a color filter may include (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1 and a structural unit represented by the following Chemical Formula 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: November 6, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jae-Hyun Kim, Jun-Seok Kim, Sang-Won Cho, Gyu-Seok Han
  • Patent number: 8277701
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: October 2, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Seong-Yong Uhm, Sang-Won Cho
  • Publication number: 20120112140
    Abstract: A photosensitive resin composition for a color filter and a color filter using the same are provided. The photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: August 1, 2011
    Publication date: May 10, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Kil-Sung LEE, Jun-Seok KIM, Seong-Yong UHM, Sang-Won CHO
  • Publication number: 20120112141
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter including the same. The photosensitive resin composition for a color filter may include (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1 and a structural unit represented by the following Chemical Formula 2; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a pigment; and (E) a solvent. In Chemical Formula 1, each substituent is the same as defined in the detailed description. In Chemical Formula 2, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: September 21, 2011
    Publication date: May 10, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Kil-Sung LEE, Jae-Hyun KIM, Jun-Seok KIM, Sang-Won CHO, Gyu-Seok HAN
  • Publication number: 20110305980
    Abstract: Disclosed is a blue resin composition for a color filter that includes a colorant including an azaporphyrin-based dye and a blue pigment, an acrylic-based binder resin, a reactive unsaturated compound, a polymerization initiator, and a solvent.
    Type: Application
    Filed: December 20, 2010
    Publication date: December 15, 2011
    Applicant: Cheil Industries Inc.
    Inventors: Nam-Gwang KIM, Sang-Won CHO, Tae-Gyu CHUN, Noh-Seok BYON, Sun-Hee JIN, Jae-Hyun KIM, Gyu-Seok HAN
  • Publication number: 20100198181
    Abstract: The present invention relates to disposable hygiene products such as a diaper or a sanitary napkin applying an elastic spandex fiber with high power retention. A polyurethane-based spandex fiber is produced by reacting an organic diisocyanate with a polymer diol to prepare a prepolymer, dissolving the prepolymer in an organic solvent, and reacting the resulting solution with a diamine and a monoamine. A disposable hygiene product having better functionality and wearing comfort is provided by using a spandex fiber as an elastic yarn, wherein the spandex fiber has power retention of 70% or more.
    Type: Application
    Filed: June 20, 2008
    Publication date: August 5, 2010
    Applicant: HYOSUNG CORPORATION
    Inventors: Sang-Won Cho, Bo-Hyun Bang, Yeon-Soo Kang, Seung-Won Soe
  • Patent number: 7691915
    Abstract: Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity and excellent pattern-forming properties. Further disclosed is an organic insulating film formed using the composition. The organic insulating film has excellent resistance to solvents and chemicals.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: April 6, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Min Sung Kim, Sang Won Cho, Dong Ju Shin, Kil Sung Lee
  • Publication number: 20090155717
    Abstract: The present invention relates to a photosensitive resin composition for a color filter, which has an excellent stripper-resistance and is developed by an alkali aqueous solution, and a color filter formed of the photosensitive resin composition. The photosensitive resin composition includes: (A) a carboxyl-containing acryl-based binder resin; (B) a double bond-containing acryl carboxylate resin represented by the following Formula 1; (C) an acryl-based photopolymerization monomer; (D) a photopolymerization initiator; (E) a pigment; and (F) a solvent. The photosensitive resin composition has excellent stripper resistance, and thus can be used when a color filter is fabricated on a TFT array substrate in order to ensure a high aperture ratio. In the above formula, R1 is hydrogen or methyl, R2 is hydrogen, hydroxyl, C1 to C10 alkyl, or —CO—R5—COOH wherein R5 is a moiety derived from an acid anhydride, R3 is R6COO— wherein R6 is aryl, R4 is R7COO— wherein R7 is alkyl, 5?m?50, 1?n?20, and 10?o?100.
    Type: Application
    Filed: December 18, 2008
    Publication date: June 18, 2009
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Sang-Won CHO, Gyu-Seok HAN, Ho-Jeong PAEK, Myung-Jin LEE, Sun-Hee JIN, Cheon-Seok LEE
  • Publication number: 20080145786
    Abstract: Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity and excellent pattern-forming properties. Further disclosed is an organic insulating film formed using the composition. The organic insulating film has excellent resistance to solvents and chemicals.
    Type: Application
    Filed: October 26, 2007
    Publication date: June 19, 2008
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Min Sung KIM, Sang Won CHO, Dong Ju SHIN, Kil Sung LEE
  • Publication number: 20080145783
    Abstract: A photosensitive resin composition is provided. The composition includes an acrylic copolymer, a photoacid generator and a solvent. The acrylic copolymer includes structural units of Formulae 1, 2, 3 and 4, which are described in the specification. The composition exhibits excellent performance characteristics in terms of mechanical and thermal properties, transmittance, insulating properties, transparency, developability, residual film ratio, heat resistance, flatness and the like. Particularly, the use of the composition facilitates the formation of a pattern as an interlayer insulating film. The composition can also be used to produce a thick film with high transmittance. Therefore, the composition is effectively used as a material for an interlayer insulating layer in LCD fabrication processes. An organic insulating film produced using the composition is also provided.
    Type: Application
    Filed: December 6, 2007
    Publication date: June 19, 2008
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Sang Won CHO, Min Sung KIM, Dong Ju SHIN, Kil Sung LEE