Abstract: An embodiment device includes an input module including a motor configured to generate a rotational force, an output module configured to receive power from the input module to be rotatable, and a connection module having a first side coupled to the input module and a second side, opposite the first side, coupled to the output module, wherein the connection module is configured to transmit the power from the input module to the output module.

Abstract: The present invention relates to an aminosilane compound and a composition for a silicon-containing thin film comprising the same, and more particularly, to an aminosilane compound and a composition for a silicon-containing thin film comprising the same having suitable properties that can be used as a precursor for forming a silicon-containing thin film and capable of replacing chlorosilanes.

Abstract: A lumped element directional coupler having an asymmetrical structure. The lumped element directional coupler can be integrated while being compact by using lumped elements, instead of transmission lines, have broadband characteristics through the lumped elements being asymmetrically arranged, and further increase bandwidth by additionally providing a negative capacitor element or, more particularly, a negative capacitor element having loss.

Abstract: Disclosed is a wireless power transmission system including a microstrip patch antenna. More particularly, a microstrip patch antenna according to an embodiment of the present disclosure includes a substrate, a patch disposed on the substrate, and a plurality of protrusions with a conical shape disposed on the patch.

Abstract: This invention relates to an I-line negative photoresist composition having excellent etching resistance, which can exhibit superior etching resistance compared to conventional I-line negative photoresists and is thus suitable for use in semiconductor processing.

Abstract: Disclosed is a wireless power transmission system including a microstrip patch antenna. More particularly, a microstrip patch antenna according to an embodiment of the present disclosure includes a substrate, a patch disposed on the substrate, and a plurality of protrusions with a conical shape disposed on the patch.

Abstract: A lumped element directional coupler having an asymmetrical structure. The lumped element directional coupler can be integrated while being compact by using lumped elements, instead of transmission lines, have broadband characteristics through the lumped elements being asymmetrically arranged, and further increase bandwidth by additionally providing a negative capacitor element or, more particularly, a negative capacitor element having loss.

Abstract: Provided is a negative photoresist composition for a KrF laser for semiconductor pattern formation, which includes a predetermined compound in order to improve the properties of a conventional negative photoresist, thereby realizing high transparency, high resolution and an excellent profile, even in the presence of an exposure source having a short wavelength compared to the conventional negative photoresist, and is thus suitable for use in semiconductor processing.

Abstract: This invention relates to an I-line negative photoresist composition having excellent etching resistance, which can exhibit superior etching resistance compared to conventional I-line negative photoresists and is thus suitable for use in semiconductor processing.

Abstract: Provided is a negative photoresist composition for a KrF laser for semiconductor pattern formation, which includes a predetermined compound in order to improve the properties of a conventional negative photoresist, thereby realizing high transparency, high resolution and an excellent profile, even in the presence of an exposure source having a short wavelength compared to the conventional negative photoresist, and is thus suitable for use in semiconductor processing.

Abstract: Disclosed are a cleaning composition for photolithography and a method of forming a photoresist pattern using the same. The cleaning composition, necessary for forming a photoresist pattern having a high aspect ratio, includes water and a compound represented by Chemical Formula 1 below: wherein R is H or OH, x is an integer selected from 1 to 100, y is an integer selected from 0 to 100, and z is an integer selected from 0 to 100. This cleaning composition is useful for forming a pattern using any of a variety of light sources, and also, even when it is difficult to form a fine pattern as desired using a photoresist alone, a fine pattern can be realized at a desired level of fineness and production costs can be reduced.

Abstract: Disclosed are a cleaning composition for photolithography and a method of forming a photoresist pattern using the same. The cleaning composition, necessary for forming a photoresist pattern having a high aspect ratio, includes water and a compound represented by Chemical Formula 1 below: wherein R is H or OH, x is an integer selected from 1 to 100, y is an integer selected from 0 to 100, and z is an integer selected from 0 to 100. This cleaning composition is useful for forming a pattern using any of a variety of light sources, and also, even when it is difficult to form a fine pattern as desired using a photoresist alone, a fine pattern can be realized at a desired level of fineness and production costs can be reduced.

Abstract: A composition for forming a photosensitive organic anti-reflective layer includes about 0.5 to about 5 percent by weight of an acid-labile thermal cross-linking agent that is decomposed by an epoxy group and a photo-acid generator, about 10 to about 22 percent by weight of a copolymer resin that includes an acrylate monomer containing anthracene or a methacrylate monomer containing anthracene, about 0.1 to about 1 percent by weight of a photo-acid generator, and a solvent.

Abstract: Disclosed is an ultra wide band signal generator. The ultra wide band signal generator generates a signal of a required frequency using a harmonic signal having a frequency range of a ultra wide band (UWB). The ultra wide band signal generator includes an active inductor for generating harmonic signals having power strengths substantially equal to each other within a non-linear operation range, the tunable active inductor capable of tuning a value thereof, an oscillator for amplifying and outputting the harmonic signals generated from the active inductor by frequency-transiting the harmonic signals into high frequency bands, and a filter for selectively outputting one of the harmonic signals output from the oscillator.

Abstract: A composition for forming a photosensitive organic anti-reflective layer includes about 0.5 to about 5 percent by weight of an acid-labile thermal cross-linking agent that is decomposed by an epoxy group and a photo-acid generator, about 10 to about 22 percent by weight of a copolymer resin that includes an acrylate monomer containing anthracene or a methacrylate monomer containing anthracene, about 0.1 to about 1 percent by weight of a photo-acid generator, and a solvent.

Abstract: Disclosed is an ultra wide band signal generator. The ultra wide band signal generator generates a signal of a required frequency using a harmonic signal having a frequency range of a ultra wide band (UWB). The ultra wide band signal generator includes an active inductor for generating harmonic signals having power strengths substantially equal to each other within a non-linear operation range, the tunable active inductor capable of tuning a value thereof, an oscillator for amplifying and outputting the harmonic signals generated from the active inductor by frequency-transiting the harmonic signals into high frequency bands, and a filter for selectively outputting one of the harmonic signals output from the oscillator.

Abstract: A silicone hyper-branched polymer surfactant is included in a rinsing solution which may be used to remove photoresist residues.

Abstract: A composition for an anti-reflective layer capable of simultaneously being developed together with a photoresist layer after exposure of the photoresist layer in a photolithography process and a method for forming patterns in a semiconductor device using the composition, wherein the anti-reflective light absorbing layer composition includes a polymer having a (meth)acrylate repeating unit, a light-absorbing group of diazoquinones chemically bound to the (meth)acrylate repeating unit, a photoacid generator, a cross-linker which thermally cross-links the polymer and is decomposed from the polymer by an acid, and a catalyst for the cross-linking reaction of the polymer. The method for forming patterns in a semiconductor device involves forming an anti-reflective layer on a semiconductor substrate using the composition and simultaneously exposing the anti-reflective layer and a photoresist layer, thereby chemically transforming the anti-reflective layer so it is able to be developed.

Abstract: A silicone hyper-branched polymer surfactant is included in a rinsing solution which may be used to remove photoresist residues. The silicone hyper-branched polymer surfactant is prepared by polymerizing a monomer represented by the following chemical formula (1), where R1 denotes a vinyl group and R2 denotes hydrogen, and includes both a hydrophobic group and a hydrophilic group.

Abstract: A differential type VCO (Voltage Controllable Oscillator) is disclosed. The VCO has a differential amplifier having a couple of transistors and a couple of LC tanks. At each LC tank, a transformer is connected to form a buffer. An oscillating signal is output through the buffer with no power consumption. Additionally, a capacitor is connected to the secondary coil of the transformer to form a bandpass filter, thereby attenuating a harmonic signal included in the oscillating signal.