Abstract: Disclosed therein is a vacuum deposition method for forming gradient patterns using a vacuum device. The vacuum device comprises vacuum chambers (8) containing a substrate (4) and metal targets (1) therein and a blocking member (7) interposed between the substrate (4) and the metal targets (1). When voltage is applied to the metal targets (1), atoms (5) popping out from the metal targets (1) are deposited onto the substrate (4) in such a way that the amount of atoms deposited on the substrate (4) is gradually decreased from the edge toward the center of the blocking member (7) due to interruption of the blocking member (7).