Abstract: An infrared detector includes thermocouples configured to generate electromotive force upon receiving thermal energy and an absorber configured to absorb infrared light and disposed on a surface of each of the thermocouples. The thermocouples are arranged radially and the absorber is provided at first ends of respective thermocouples, the first end configured to be a hot junction.

Abstract: An electron beam exposure apparatus includes an electron beam source, a stage, and an error detection device. The electron beam source radiates a first electron beam corresponding to first input data and a second electron beam corresponding to second input data. The stage includes a mask on which the first electron beam is radiated. The stage may be configured to move the mask. The error detection device detects an error of the second electron beam and outputs error detection information.

Abstract: An electron beam exposure apparatus includes an electron beam source, a stage, and an error detection device. The electron beam source radiates a first electron beam corresponding to first input data and a second electron beam corresponding to second input data. The stage includes a mask on which the first electron beam is radiated. The stage may be configured to move the mask. The error detection device detects an error of the second electron beam and outputs error detection information.

Abstract: The present invention relates to a multi-channel luminous energy sensing unit, an apparatus for measuring light energy of an exposure device and a method for measuring light energy by channel. In accordance with one embodiment of the present invention, a multi-channel luminous energy sensing unit to sense an amount of light illuminated from a light source, which includes a board; and a plurality of light sensor modules arranged on the board for sensing at least two channel light with bandwidths different from each other among the light illuminated from the light source, is provided. And also, an apparatus for measuring light energy of an exposure device including the same and a method for measuring light energy by channel are provided.

Abstract: Disclosed herein is a calibration device for a light measuring equipment, the calibration device including: a standard illuminant emitting light for calibration; and a universal jig fixing target light measuring equipments to be calibrated having various sizes and moving in a direction in parallel with an optical axis of the standard illuminant. Therefore, it is possible to use both of a method of performing calibration by changing a distance between the standard illuminant and the target light measuring equipment to be calibrated and a method of performing calibration by changing a current applied to the standard illuminant. In addition, it is possible to perform calibration for the light measuring equipment having a plurality of sensors and to significantly improve accuracy of calibration.

Abstract: The method of forming a pattern includes forming a first photosensitive layer pattern including a first pattern in a first region of a substrate and a second pattern in a second region of the substrate, by performing a first photolithography process using a photomask having a first mask region and a second mask region. The first pattern is transferred from the first mask region, and the second pattern is transferred from the second mask region. The method further includes forming a second photosensitive layer pattern including a third pattern in the second region of the substrate and a fourth pattern in the first region of the substrate, by performing a second photolithography process using the photomask. The third pattern is transferred from the first mask region, and the fourth pattern is transferred from the second mask region.

Abstract: A method of manufacturing a multilayer ceramic capacitor includes forming a base dielectric layer, forming a unit ceramic capacitor by alternately depositing internal dielectric layers and internal electrode layers on a top surface of the base dielectric layer, and stacking another unit ceramic capacitor on the unit ceramic capacitor, wherein the number of unit ceramic capacitors being stacked is two or more.

Abstract: The method of forming a pattern includes forming a first photosensitive layer pattern including a first pattern in a first region of a substrate and a second pattern in a second region of the substrate, by performing a first photolithography process using a photomask having a first mask region and a second mask region. The first pattern is transferred from the first mask region, and the second pattern is transferred from the second mask region. The method further includes forming a second photosensitive layer pattern including a third pattern in the second region of the substrate and a fourth pattern in the first region of the substrate, by performing a second photolithography process using the photomask.

Abstract: A photomask cleaning apparatus including a stage supporting a photomask, a cleaning fluid supplying unit configured to supply a cleaning fluid to remove contaminants from the photomask, a cleaning fluid absorbing unit configured to absorb the cleaning fluid supplied from the cleaning fluid supplying unit; and a contaminant removing structure configured to provide a path through which the cleaning fluid flows between the cleaning fluid supplying unit and the cleaning fluid absorbing unit through a surface of the photomask on the stage, and to have an opening aperture through which the cleaning fluid is exposed onto the surface of the photomask so as to remove at least some of the contaminants is provided. Methods of cleaning a photomask are also provided.

Abstract: A system for measuring dimension of photomasks comprises a light source emitting measuring light having a wavelength, a transmission detector for receiving the measuring light, a stage on which a photomask having circuit patterns is placed, the stage being disposed between the light source and the transmission detector, and a controller having a dimension-deciding algorithm to determine a dimension of the circuit patterns from a spectroscopic characteristic of the received measuring light, the controller being connected to the transmission detector.

Abstract: A system for measuring dimension of photomasks comprises a light source emitting measuring light having a wavelength, a transmission detector for receiving the measuring light, a stage on which a photomask having circuit patterns is placed, the stage being disposed between the light source and the transmission detector, and a controller having a dimension-deciding algorithm to determine a dimension of the circuit patterns from a spectroscopic characteristic of the received measuring light, the controller being connected to the transmission detector.