Patents by Inventor Sang Youl YI

Sang Youl YI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cylinder comprising fluid pressure adjustment valve having improved storage capability
    Patent number: 10927970
    Abstract: A cylinder container for storing and transporting a fluid, which is configured such that the same can store and transport a fluid, and can discharge the stored fluid at a configured discharge pressure under a configured condition. More specifically, the cylinder can have a fluid pressure adjustment valve installed on the cylinder container for storing and transporting a fluid such that a stored fluid can be discharged at a configured discharge pressure under a configured condition, the fluid pressure adjustment valve being configured such that the fluid storage capability of the cylinder container for storing and transporting a fluid can be improved.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: February 23, 2021
    Assignee: TEMC CO., LTD.
    Inventors: Weon Yang Yu, Sang Hoon Jeon, Kyoung Min Ma, Dae Yong Kwon, Sang Youl Yi, Ji Won Moon, In Joon Chang
  • CYLINDER COMPRISING FLUID PRESSURE ADJUSTMENT VALVE HAVING IMPROVED STORAGE CAPABILITY
    Publication number: 20200284364
    Abstract: A cylinder container for storing and transporting a fluid, which is configured such that the same can store and transport a fluid, and can discharge the stored fluid at a configured discharge pressure under a configured condition. More specifically, the cylinder can have a fluid pressure adjustment valve installed on the cylinder container for storing and transporting a fluid such that a stored fluid can be discharged at a configured discharge pressure under a configured condition, the fluid pressure adjustment valve being configured such that the fluid storage capability of the cylinder container for storing and transporting a fluid can be improved.
    Type: Application
    Filed: March 22, 2019
    Publication date: September 10, 2020
    Inventors: Weon Yang YU, Sang Hoon JEON, Kyoung Min MA, Dae Yong KWON, Sang Youl YI, Ji Won MOON, In Joon CHANG
  • Gap-fill polymer for filling fine pattern gaps and method for fabricating semiconductor device using the same
    Patent number: 9892964
    Abstract: A gap-fill polymer for filling fine pattern gaps, which has a low dielectric constant (low-k) and excellent gap filling properties, may consist of a compound formed by condensation polymerization of a first oligomer represented by the formula 1 and a second oligomer represented by the formula 2.
    Type: Grant
    Filed: March 27, 2017
    Date of Patent: February 13, 2018
    Assignee: SK Hynix Inc.
    Inventors: Ji Won Moon, Jin Wook Jang, Sang Youl Yi, Sung Jae Lee, Geun Su Lee, Young Sun Lee, Min Su Kim
  • GAP-FILL POLYMER FOR FILLING FINE PATTERN GAPS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20180033688
    Abstract: A gap-fill polymer for filling fine pattern gaps, which has a low dielectric constant (flow-k) and excellent gap filling properties may consist of a compound formed by condensation polymerization of a first oligomer represented by the formula 1 and a second oligomer represented by the formula 2.
    Type: Application
    Filed: March 27, 2017
    Publication date: February 1, 2018
    Inventors: Ji Won MOON, Jin Wook JANG, Sang Youl YI, Sung Jae LEE, Geun Su LEE, Young Sun LEE, Min Su KIM