Patents by Inventor Sang-Yu Lee

Sang-Yu Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11795549
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Grant
    Filed: March 7, 2022
    Date of Patent: October 24, 2023
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
  • Patent number: 11732364
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: August 22, 2023
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
  • Publication number: 20220190250
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Application
    Filed: March 7, 2022
    Publication date: June 16, 2022
    Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
  • Patent number: 11335854
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Grant
    Filed: March 27, 2020
    Date of Patent: May 17, 2022
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
  • Publication number: 20220149283
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Application
    Filed: January 12, 2022
    Publication date: May 12, 2022
    Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
  • Patent number: 10727409
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: July 28, 2020
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
  • Publication number: 20200227640
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Application
    Filed: March 27, 2020
    Publication date: July 16, 2020
    Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
  • Publication number: 20190259951
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Application
    Filed: August 22, 2017
    Publication date: August 22, 2019
    Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
  • Patent number: 9681540
    Abstract: Disclosed is an electrode member. The electrode member includes a substrate, and an electrode provided in the shape of a mesh on the substrate.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: June 13, 2017
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Soo Jin Lee, Jae Wan Park, Sang Yu Lee, Jae Hong Lee, Yeong Soo Choi
  • Patent number: 9209108
    Abstract: A method for forming a fine pattern using isotropic etching, includes the steps of forming an etching layer on a semiconductor substrate, and coating a photoresist layer on the etching layer, performing a lithography process with respect to the etching layer coated with the photoresist layer, and performing a first isotropic etching process with respect to the etching layer including a photoresist pattern formed through the lithography process, depositing a passivation layer on the etching layer including the photoresist pattern, and performing a second isotropic etching process with respect to the passivation layer. The second isotropic etching process is directly performed without removing the predetermined portion of the passivation layer.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: December 8, 2015
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Sang-Yu Lee, Jee-Heum Paik, Soo-Hong Kim, Chang-Woo Yoo, Sung-Woon Yoon
  • Publication number: 20130299964
    Abstract: A method for forming a fine pattern using isotropic etching, includes the steps of forming an etching layer on a semiconductor substrate, and coating a photoresist layer on the etching layer, performing a lithography process with respect to the etching layer coated with the photoresist layer, and performing a first isotropic etching process with respect to the etching layer including a photoresist pattern formed through the lithography process, depositing a passivation layer on the etching layer including the photoresist pattern, and performing a second isotropic etching process with respect to the passivation layer. The second isotropic etching process is directly performed without removing the predetermined portion of the passivation layer.
    Type: Application
    Filed: June 13, 2013
    Publication date: November 14, 2013
    Inventors: Sang-Yu Lee, Jee-Heum Paik, Soo-Hong Kim, Chang-Woo Yoo, Sung-Woon Yoon
  • Publication number: 20130299222
    Abstract: Disclosed is an electrode member. The electrode member includes a substrate, and an electrode provided in the shape of a mesh on the substrate.
    Type: Application
    Filed: May 9, 2013
    Publication date: November 14, 2013
    Applicant: LG Innotek Co., Ltd
    Inventors: Soo Jin LEE, Jae Wan PARK, Sang Yu LEE, Jae Hong LEE, Yeong Soo CHOI
  • Patent number: 8486838
    Abstract: A method for forming a fine pattern using isotropic etching, includes the steps of forming an etching layer on a semiconductor substrate, and coating a photoresist layer on the etching layer, performing a lithography process with respect to the etching layer coated with the photoresist layer, and performing a first isotropic etching process with respect to the etching layer including a photoresist pattern formed through the lithography process, depositing a passivation layer on the etching layer including the photoresist pattern, and performing a second isotropic etching process with respect to the passivation layer. The second isotropic etching process is directly performed without removing the predetermined portion of the passivation layer.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: July 16, 2013
    Assignee: LG Innotek Co., Ltd.
    Inventors: Sang-Yu Lee, Jee-Heum Paik, Soo-Hong Kim, Chang-Woo Yoo, Sung-Woon Yoon
  • Patent number: 8368846
    Abstract: A two-dimensional light source includes a base substrate having holes, wires disposed on a lower surface of the base substrate, a light emitting diode (LED) chip disposed on an upper surface of the base substrate, plugs that connect two electrodes of the LED chip to the wires through the holes, a buffer layer covering the LED chip, and an optical layer that is disposed on the buffer layer and has an optical pattern formed at a portion of the optical layer corresponding to the LED chip.
    Type: Grant
    Filed: March 21, 2011
    Date of Patent: February 5, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Gi-Cherl Kim, Se-Ki Park, Ju-Young Yoon, Byung-Choon Yang, Seok-Hyun Nam, Sang-Yu Lee
  • Patent number: 8129918
    Abstract: A power supply is provided, which includes a DC-DC converter being supplied with an external DC input voltage and a first switching control signal and outputting a duty sensing signal of which a magnitude is varied in accordance with the first switching control signal, the duty sensing signal being indicative of a duty ratio of the first switching control signal, and the DC-DC converter converting the input voltage into a DC output voltage of a predetermined magnitude based on the first switching control signal; and a feedback controlling unit comparing the duty sensing signal with a first reference signal to adjust the duty ratio of the first switching control signal.
    Type: Grant
    Filed: June 19, 2009
    Date of Patent: March 6, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-Gil Lee, Ju-Young Yoon, Jong-Seo Lee, Gi-Cherl Kim, Sang-Yu Lee
  • Patent number: 8118458
    Abstract: An optical lens refracts and reflects a light to increase a luminance in a top direction of the optical lens and to decrease a luminance in a horizontal direction of the optical lens. The optical lens includes a central portion and a peripheral portion. The central portion has a convex shape. The peripheral portion has a concave shape. The peripheral portion surrounds the central portion. Therefore, power consumption and manufacturing cost are decreased.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: February 21, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Se-Ki Park, Sang-Yu Lee, Gi-Cherl Kim, Seok-Hyun Nam, Ju-Young Yoon
  • Patent number: 8002421
    Abstract: A light-generating device includes a driving substrate and a plurality of light source arrays. The driving substrate has a rectangular planar shape. The plurality of light source arrays is formed on the driving substrate. The light source arrays include at least one light emitting diode to generate light in response to power being applied through the substrate, and the light source arrays are spaced apart from each other. Thus, heat generated from the light-generating device is rapidly dissipated from the light-generating device, improving brightness of the light, brightness uniformity of the light and color reproducibility of the light.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: August 23, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Chun-Ho Song, Sang-Yu Lee, Gi-Cherl Kim, Seoek-Hwan Kang, Sang-Gil Lee, Ju-Young Yoon
  • Publication number: 20110163343
    Abstract: A two-dimensional light source includes a base substrate having holes, wires disposed on a lower surface of the base substrate, a light emitting diode (LED) chip disposed on an upper surface of the base substrate, plugs that connect two electrodes of the LED chip to the wires through the holes, a buffer layer covering the LED chip, and an optical layer that is disposed on the buffer layer and has an optical pattern formed at a portion of the optical layer corresponding to the LED chip.
    Type: Application
    Filed: March 21, 2011
    Publication date: July 7, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Gi-Cherl KIM, Se-Ki PARK, Ju-Young YOON, Byung-Choon YANG, Seok-Hyun NAM, Sang-Yu LEE
  • Patent number: 7932970
    Abstract: A two-dimensional light source includes a base substrate having holes, wires disposed on a lower surface of the base substrate, a light emitting diode (LED) chip disposed on an upper surface of the base substrate, plugs that connect two electrodes of the LED chip to the wires through the holes, a buffer layer covering the LED chip, and an optical layer that is disposed on the buffer layer and has an optical pattern formed at a portion of the optical layer corresponding to the LED chip.
    Type: Grant
    Filed: September 9, 2008
    Date of Patent: April 26, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Gi-Cherl Kim, Se-Ki Park, Ju-Young Yoon, Byung-Choon Yang, Seok-Hyun Nam, Sang-Yu Lee
  • Patent number: RE45749
    Abstract: An optical unit includes a base, a light-condensing member disposed on the base to condense a first portion of light that is incident onto the base and protrusion members disposed on a surface of the light-condensing member to scatter a second portion of the light that is incident onto the base. A backlight assembly includes light sources, an optical unit receiving light from the light sources to condense and scatter the light, and may also include an optical member disposed over the optical unit to enhance the front luminance of the light. A display device includes light sources, an optical module and a display panel. Thus, display quality of the display device may be enhanced.
    Type: Grant
    Filed: March 16, 2012
    Date of Patent: October 13, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Seong-Yong Hwang, In-Sun Hwang, Joong-Hyun Kim, Hye-Eun Park, Sang-Yu Lee