Patents by Inventor Sang-Hyuk Chung

Sang-Hyuk Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for reducing PFC emission during semiconductor manufacture
    Patent number: 6602323
    Abstract: A method of reducing PFC emissions during a semiconductor manufacturing process that includes a set of sub-processes each of which produces at least one PFC includes the steps of exhausting PFC's produced by each sub-process to a common line to form a combined exhaust stream, treating the combined exhaust stream from each sub-process using a separate PFC abatement system, combining the treated exhaust streams to form a combined treated stream, and wet scrubbing the combined treated stream.
    Type: Grant
    Filed: September 6, 2001
    Date of Patent: August 5, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-Ki Chae, Sang-Gon Lee, Sang-Hyuk Chung, Seong-Jin Heo
  • Method and apparatus for reducing PFC emission during semiconductor manufacture
    Publication number: 20020134233
    Abstract: A method of reducing PFC emissions during a semiconductor manufacturing process that includes a set of sub-processes each of which produces at least one PFC includes the steps of exhausting PFC's produced by each sub-process to a common line to form a combined exhaust stream, treating the combined exhaust stream from each sub-process using a separate PFC abatement system, combining the treated exhaust streams to form a combined treated stream, and wet scrubbing the combined treated stream.
    Type: Application
    Filed: September 6, 2001
    Publication date: September 26, 2002
    Inventors: Seung-Ki Chae, Sang-Gon Lee, Sang-Hyuk Chung, Seong-Jin Heo