Patents by Inventor Sangjine Park PARK

Sangjine Park PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220415643
    Abstract: In a substrate processing method, a rinse process using a rinse solution is performed on a development-processed photoresist pattern on a substrate. A substitution process including a first substitution step using a mixed solution of a non-polar organic solvent and a surfactant and a second substitution step using the non-polar organic solvent is performed on the substrate. The substitution process is performed a plurality of times until the rinse solution remaining on the substrate is less than a predetermined value. A supercritical fluid drying process is performed on the substrate to dry the non-polar organic solvent remaining on the substrate.
    Type: Application
    Filed: April 25, 2022
    Publication date: December 29, 2022
    Applicants: Semes Co., Ltd., Samsung Electronics Co., Ltd.
    Inventors: Hae-Won CHOI, Anton KORIAKIN, Sangjine Park PARK, Keonyoung KIM, Sukhoon KIM, Seohyun KIM, Young-Hoo KIM, Kuntack LEE, Jihoon JEONG