Patents by Inventor Sangjun Han

Sangjun Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11665781
    Abstract: The disclosure relates to a 5th generation (5G) or pre-5G communication system for supporting a higher data transmission rate than a 4G communication system such as LTE. An operating method of a network node in a wireless communication system is provided. The method includes receiving, from a session management function (SMF), information on at least one device side TSN translator port (DS-TT port) number of at least one DS-TT port for at least one packet data unit (PDU) session, generating at least one of a port management information container and a bridge management information container based on the at least one DS-TT port number, and transmitting, to a centralized network controller (CNC), the at least one of the port management information container and the bridge management information container.
    Type: Grant
    Filed: April 9, 2021
    Date of Patent: May 30, 2023
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sangjun Moon, Yoonseon Han
  • Publication number: 20200341346
    Abstract: Provided are an optical device and a method of manufacturing the optical device including a lower electrode; an insulating layer provided on the lower electrode; upper electrodes provided on the insulating layer; and variable conductivity patterns provided to be adjacent to the upper electrodes, respectively, on the insulating layer. The upper electrodes include first and second electrodes that are alternately provided, a pitch between the first electrodes is identical to a pitch between the second electrodes, the second electrode is provided between the adjacent first electrodes, a distance between one of the adjacent first electrodes and the second electrode is a first length, a distance between another one of the adjacent first electrodes and the second electrode is a second length, and the second length differs from the first length.
    Type: Application
    Filed: November 18, 2019
    Publication date: October 29, 2020
    Applicant: Korea Advanced Institute of Science and Technology
    Inventors: Min Seok Jang, Sangjun Han, Shinho Kim
  • Patent number: 7030039
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Grant
    Filed: June 30, 2001
    Date of Patent: April 18, 2006
    Assignee: ASML Holding N.V.
    Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward, Jung-Hoon Chun, Sangjun Han
  • Publication number: 20020098283
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Application
    Filed: June 30, 2001
    Publication date: July 25, 2002
    Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Dettes, Donald R. Sauer, Edmond R. Ward, Jung-Hoon Chun, Sangjun Han
  • Publication number: 20010001746
    Abstract: An improved method and apparatus for coating semiconductor substrates with organic photoresist polymers by extruding a ribbon of photoresist in a spiral pattern which covers the entire top surface of the wafer. The invention provides a more uniform photoresist layer and is much more efficient than are current methods in the use of expensive photoresist solutions. A wafer is mounted on a chuck, aligned horizontally and oriented upward. An extrusion head is positioned adjacent to the outer edge of the wafer and above the top surface of the wafer with an extrusion slot aligned radially with respect to the wafer. The wafer is rotated and the extrusion head moved radially toward the center of the wafer while photoresist is extruded out the extrusion slot. The rotation rate of the wafer and the radial speed of the extrusion head are controlled so that the tangential velocity of the extrusion head with respect to the rotating wafer is a constant.
    Type: Application
    Filed: December 20, 2000
    Publication date: May 24, 2001
    Inventors: Jung-Hoon Chun, James Derksen, Sangjun Han
  • Patent number: 6191053
    Abstract: An improved method and apparatus for coating semiconductor substrates with organic photoresist polymers by extruding a ribbon of photoresist in a spiral pattern which covers the entire top surface of the wafer. The invention provides a more uniform photoresist layer and is much more efficient than are current methods in the use of expensive photoresist solutions. A wafer is mounted on a chuck, aligned horizontally and oriented upward. An extrusion head is positioned adjacent to the outer edge of the wafer and above the top surface of the wafer with an extrusion slot aligned radially with respect to the wafer. The wafer is rotated and the extrusion head moved radially toward the center of the wafer while photoresist is extruded out the extrusion slot. The rotation rate of the wafer and the radial speed of the extrusion head are controlled so that the tangential velocity of the extrusion head with respect to the rotating wafer is a constant.
    Type: Grant
    Filed: June 10, 1998
    Date of Patent: February 20, 2001
    Assignee: Silicon Valley Group, Inc.
    Inventors: Jung-Hoon Chun, James Derksen, Sangjun Han