Patents by Inventor Sangkyo Lim

Sangkyo Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Scanning electron microscope apparatus and operation method thereof
    Patent number: 11183363
    Abstract: A scanning electron microscope apparatus including an electron gun configured to generate an electron beam, a focusing lens configured to concentrate the electron beam from the electron gun, an electron detector configured to detect signals emitted from a sample in response to the electron beam incident on the sample, a stage configured to receive the sample thereon, and a focus calibration structure on an upper part of the stage.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: November 23, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yongmin Cho, Taeyong Lee, Sangkyo Lim
  • SCANNING ELECTRON MICROSCOPE APPARATUS AND OPERATION METHOD THEREOF
    Publication number: 20210066034
    Abstract: A scanning electron microscope apparatus including an electron gun configured to generate an electron beam, a focusing lens configured to concentrate the electron beam from the electron gun, an electron detector configured to detect signals emitted from a sample in response to the electron beam incident on the sample, a stage configured to receive the sample thereon, and a focus calibration structure on an upper part of the stage.
    Type: Application
    Filed: March 17, 2020
    Publication date: March 4, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yongmin CHO, Taeyong LEE, Sangkyo LIM
  • Inspection method and system and a method of inspecting a semiconductor device using the same
    Patent number: 10198827
    Abstract: A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: February 5, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Woongkyu Son, Sangkyo Lim, Sunhee Shim, MiJung Jeon
  • INSPECTION METHOD AND SYSTEM AND A METHOD OF INSPECTING A SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20170256070
    Abstract: A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.
    Type: Application
    Filed: January 19, 2017
    Publication date: September 7, 2017
    Inventors: Woongkyu Son, Sangkyo Lim, Sunhee Shim, MiJung Jeon