Patents by Inventor Sang Min Hwang

Sang Min Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11256941
    Abstract: An electronic device according to one example of the present invention comprises: a proximity sensor for generating proximity information on an object which approaches the electronic device; an iris sensor for detecting an iris; and a first processor for controlling the electronic device, wherein the first processor can be set to: determine the distance between the electronic device and the object on the basis of the proximity information generated by the proximity sensor; detect the iris by using the iris sensor when the distance between the electronic device and the object is greater than a first reference value; and inactivate the iris sensor when the distance between the electronic device and the object is less than or equal to the first reference value. In addition, other examples are possible.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: February 22, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-Min Hwang, Hee-Jun Choi, Yoo-Mi Tak, Woo-Yong Lee, Jeong-Ho Cho, Jeong-Min Park, Ki-Huk Lee, Cheol-Ho Cheong
  • Publication number: 20210192249
    Abstract: An electronic device according to one example of the present invention comprises: a proximity sensor for generating proximity information on an object which approaches the electronic device; an iris sensor for detecting an iris; and a first processor for controlling the electronic device, wherein the first processor can be set to: determine the distance between the electronic device and the object on the basis of the proximity information generated by the proximity sensor; detect the iris by using the iris sensor when the distance between the electronic device and the object is greater than a first reference value; and inactivate the iris sensor when the distance between the electronic device and the object is less than or equal to the first reference value. In addition, other examples are possible.
    Type: Application
    Filed: July 28, 2017
    Publication date: June 24, 2021
    Inventors: Sang-Min HWANG, Hee-Jun CHOI, Yoo-Mi TAK, Woo-Yong LEE, Jeong-Ho CHO, Jeong-Min PARK, Ki-Huk LEE, Cheol-Ho CHEONG
  • Patent number: 9342736
    Abstract: A method for operating an electronic device including a sensor unit that uses infrared rays is provided. In the method, a light source is illuminated using at least one light emitting device. Whether the illuminated light source is received by a light receiving device including at least one light receiving channel is determined. A relevant function corresponding to an amount of light of the light source received by the at least one light receiving channel is performed.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: May 17, 2016
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Sang-Min Hwang, Jeong-Ho Cho, Dong-Han Lee
  • Publication number: 20150062594
    Abstract: A method for operating an electronic device including a sensor unit that uses infrared rays is provided. In the method, a light source is illuminated using at least one light emitting device. Whether the illuminated light source is received by a light receiving device including at least one light receiving channel is determined. A relevant function corresponding to an amount of light of the light source received by the at least one light receiving channel is performed.
    Type: Application
    Filed: March 27, 2014
    Publication date: March 5, 2015
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sang-Min HWANG, Jeong-Ho Cho, Dong-Han Lee
  • Patent number: 8945949
    Abstract: A method for fabricating a variable resistance memory device in accordance with an embodiment of the present invention includes: sequentially forming a first conductive layer and a variable resistance layer on a substrate; forming stacked structures in which first conductive lines and variable resistance lines are sequentially stacked by selectively etching the variable resistance layer and the first conductive layer; forming an insulating layer to fill a space between the stacked structures; forming a second conductive layer on the insulating layer and the stacked structures; and forming a second conductive line and a variable resistance pattern by etching the second conductive layer and the variable resistance line using mask patterns in a line type extending in a direction intersecting the stacked structures.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: February 3, 2015
    Assignee: SK Hynix Inc.
    Inventor: Sang Min Hwang
  • Patent number: 8542543
    Abstract: A memory device including variable resistance elements comprises a plurality of memory cells configured to store data; a first signal transmission/reception unit and a second signal transmission/reception unit configured to transmit a signal to the memory cells or receive a signal from the memory cells; a first transmission line arranged to couple first ends of the memory cells to the first signal transmission/reception unit; and a second transmission line configured to couple second ends of the memory cells to the second signal transmission/reception unit, wherein a first resistance of a first signal path coupled between the first and second signal transmission/reception units through a first memory cell of the memory cells is substantially equal to a second electrical resistance of a second signal path coupled between a second memory cell and the first and second signal transmission/reception units through a second memory cell of the memory cells.
    Type: Grant
    Filed: March 16, 2013
    Date of Patent: September 24, 2013
    Assignee: SK hynix Inc.
    Inventor: Sang-Min Hwang
  • Publication number: 20130168628
    Abstract: A variable resistance memory device includes a first trench extending in a first direction formed in a first insulation layer, a first conductive layer in the first trench, a protective layer over the first conductive layer in the first trench, a second insulation layer over the first insulation layer and the protective layer, a second trench formed in the second insulation layer and extending in a second direction that crosses the first direction, a gap formed in the protective layer exposing the first conductive layer at an intersection between the first trench and the second trench, a variable resistance layer positioned in the gap and coupled to the first conductive layer, and a second conductive layer formed in the second trench and coupled to the variable resistance layer.
    Type: Application
    Filed: August 27, 2012
    Publication date: July 4, 2013
    Inventor: Sang Min HWANG
  • Publication number: 20130171741
    Abstract: A method for fabricating a variable resistance memory device in accordance with an embodiment of the present invention includes: sequentially forming a first conductive layer and a variable resistance layer on a substrate; forming stacked structures in which first conductive lines and variable resistance lines are sequentially stacked by selectively etching the variable resistance layer and the first conductive layer; forming an insulating layer to fill a space between the stacked structures; forming a second conductive layer on the insulating layer and the stacked structures; and forming a second conductive line and a variable resistance pattern by etching the second conductive layer and the variable resistance line using mask patterns in a line type extending in a direction intersecting the stacked structures.
    Type: Application
    Filed: August 27, 2012
    Publication date: July 4, 2013
    Inventor: Sang-Min HWANG
  • Patent number: 8456930
    Abstract: A memory device including variable resistance elements comprises a plurality of memory cells configured to store data; a first signal transmission/reception unit and a second signal transmission/reception unit configured to transmit a signal to the memory cells or receive a signal from the memory cells; a first transmission line arranged to couple first ends of the memory cells to the first signal transmission/reception unit; and a second transmission line configured to couple second ends of the memory cells to the second signal transmission/reception unit, wherein a first resistance of a first signal path coupled between the first and second signal transmission/reception units through a first memory cell of the memory cells is substantially equal to a second electrical resistance of a second signal path coupled between a second memory cell and the first and second signal transmission/reception units through a second memory cell of the memory cells.
    Type: Grant
    Filed: October 7, 2010
    Date of Patent: June 4, 2013
    Assignee: Hynix Semiconductor Inc.
    Inventor: Sang Min Hwang
  • Publication number: 20120175581
    Abstract: A semiconductor memory device using a diode as a switching device is disclosed. The switching device may enhance on and off characteristics at the same time. The switching device includes a diode including a first conductive layer and a second conductive layer stacked therein, where the first conductive layer and the second conductive layer have complementary conductive types to each other, a control electrode surrounding the first conductive layer, and an insulation layer disposed between the first conductive layer and the control electrode.
    Type: Application
    Filed: December 21, 2011
    Publication date: July 12, 2012
    Inventor: Sang-Min HWANG
  • Publication number: 20120087168
    Abstract: A memory device including variable resistance elements comprises a plurality of memory cells configured to store data; a first signal transmission/reception unit and a second signal transmission/reception unit configured to transmit a signal to the memory cells or receive a signal from the memory cells; a first transmission line arranged to couple first ends of the memory cells to the first signal transmission/reception unit; and a second transmission line configured to couple second ends of the memory cells to the second signal transmission/reception unit, wherein a first resistance of a first signal path coupled between the first and second signal transmission/reception units through a first memory cell of the memory cells is substantially equal to a second electrical resistance of a second signal path coupled between a second memory cell and the first and second signal transmission/reception units through a second memory cell of the memory cells.
    Type: Application
    Filed: October 7, 2010
    Publication date: April 12, 2012
    Inventor: Sang Min HWANG
  • Publication number: 20120045872
    Abstract: Disclosed herein is a semiconductor memory device for reducing a junction resistance and increasing amount of current throughout the unit cell. A semiconductor memory device comprises plural unit cells, each coupled to contacts formed in different shape at both sides of a word line in a cell array.
    Type: Application
    Filed: October 31, 2011
    Publication date: February 23, 2012
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Sang Min Hwang
  • Patent number: 8072077
    Abstract: Disclosed herein is a semiconductor memory device for reducing a junction resistance and increasing amount of current throughout the unit cell. A semiconductor memory device comprises plural unit cells, each coupled to contacts formed in different shape at both sides of a word line in a cell array.
    Type: Grant
    Filed: December 29, 2008
    Date of Patent: December 6, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventor: Sang Min Hwang
  • Patent number: 8022499
    Abstract: Disclosed herein is a semiconductor memory device including floating body cells. The semiconductor memory device includes memory cell active regions formed on a Silicon-On Isolator (SOI) semiconductor substrate, a plurality of floating body cell transistors formed in the memory cell active regions, and “inactive transistors” for providing cell isolation that are formed between the plurality of floating body cell transistors. Here, the inactive transistors for providing cell isolation are controlled so that they always are in an OFF state while the semiconductor memory device is operating.
    Type: Grant
    Filed: July 8, 2009
    Date of Patent: September 20, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventor: Sang Min Hwang
  • Publication number: 20100155798
    Abstract: Disclosed herein is a semiconductor memory device including floating body cells. The semiconductor memory device includes memory cell active regions formed on a Silicon-On Isolator (SOI) semiconductor substrate, a plurality of floating body cell transistors formed in the memory cell active regions, and inactive transistors for providing cell isolation that are formed between the plurality of floating body cell transistors. Here, the inactive transistors for providing cell isolation are controlled so that they always are in an OFF state while the semiconductor memory device is operating.
    Type: Application
    Filed: July 8, 2009
    Publication date: June 24, 2010
    Inventor: Sang Min Hwang
  • Publication number: 20100109162
    Abstract: Disclosed herein is a semiconductor memory device for reducing a junction resistance and increasing amount of current throughout the unit cell. A semiconductor memory device comprises plural unit cells, each coupled to contacts formed in different shape at both sides of a word line in a cell array.
    Type: Application
    Filed: December 29, 2008
    Publication date: May 6, 2010
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Sang Min Hwang
  • Publication number: 20100019297
    Abstract: A spin transfer torque magnetic random access memory (STT-MRAM) device comprises adjacent magnetic tunneling junctions (MTJ), respectively, formed in different layers, thereby preventing interference between the MTJs and securing thermal stability.
    Type: Application
    Filed: November 5, 2008
    Publication date: January 28, 2010
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Sang Min Hwang
  • Publication number: 20090273088
    Abstract: A method for fabricating a semiconductor device includes forming a metal word line additionally over a vertical transistor to obtain a multi-layered structure, thereby preventing degradation of the operating speed of the semiconductor device by preventing an increase of resistance of a damascene word line that connects a surrounding gate of a vertical transistor. As a result, the yield and reliability of the semiconductor device can be improved.
    Type: Application
    Filed: November 6, 2008
    Publication date: November 5, 2009
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventors: Sung Woong Chung, Sang Min Hwang, Hyun Jung Kim
  • Publication number: 20090230447
    Abstract: A semiconductor device may include a capacitor and a transistor on a silicon-on-insulator (SOI) substrate and a method for manufacturing the semiconductor device may include forming such a structure. A semiconductor device, formed on a silicon-on-insulator structure including first and second silicon layers and a insulating layer buried between the first and the second silicon layers, may include a capacitor including one electrode formed in a doped region of the first silicon layer and the other electrode formed in a well region of the second silicon layer.
    Type: Application
    Filed: June 27, 2008
    Publication date: September 17, 2009
    Applicant: HYNIX SEMICONDUCTOR INC.
    Inventor: Sang Min Hwang