Abstract: A gap-filling method for a semiconductor device and method of manufacturing the semiconductor device using the same, are provided. The gap-filling method may include: preparing a substrate with a hole pattern; supplying a process gas to the substrate and applying a first VHF power source to form a pulse wave plasma to form a first silicon nitride layer in the hole pattern; and supplying the process gas to the substrate and applying a second VHF power source to form a continuous wave plasma to form a second silicon nitride layer on the first silicon nitride layer.

Abstract: An apparatus for treating the substrate includes a process chamber having a first body and a second body which are combined with each other to have a treating space in which a substrate is treated, and a friction prevention member placed on a contact surface between the first body and the second body. The friction prevention member may have a groove formed at a surface corresponding to the contact surface. An adhesive for adhering the friction prevention member to the first body or adhering the friction prevention member to the second body may be provided in the groove. The groove may form an open-end pattern in which a first end of the open-end pattern is adjacent to a second end of the open-end pattern.

Abstract: The present invention relates to a composition for surface modification. The composition for surface modification according to the present invention contains a particular carbodiimide-based compound, thus forms a covalent bond without damaging skin, hair, or fabric, and semipermanently provides desired skin or hair surface modification effects or fabric care effects.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing for providing a treating space for treating a substrate within; a support unit for supporting the substrate in the treating space; a bottom supply port for supplying a process fluid to the treating space; and a filler member positioned below the substrate supported on the support unit in the treating space, and wherein the filler member forms a buffer space facing the bottom supply port, and a passage is formed between the filler member and an inner wall of the housing and flows the process fluid which is introduced to the buffer space in a direction of the substrate.

Abstract: A method according to an example embodiment of the present disclosure may comprise: when a vehicle being performing a driving negotiation moves, receiving, by an RSU, a first message including a first temporary identification (ID) of the vehicle from a first RSU on a past route of the vehicle; receiving, by the RSU, a second message including a second temporary ID of the vehicle identified by a closed-circuit television (CCTV) in a communicable area of the RSU from the CCTV; checking, by the RSU, the second temporary ID of the vehicle based on the second message received from the CCTV; and identifying, by the RSU, the vehicle as a target to extend the driving negotiation and performing the driving negotiation with the identified vehicle.

Abstract: Disclosed herein is a method for moving magic states through boundary extension in a rotated surface code. The method for moving magic states includes identifying logical data and an ancilla qubit constituting a logical qubit block, and an available magic state logical qubit from a magic state storage space, identifying a type of a movement operation and a bending location during movement by analyzing a path through which the magic state logical qubit is moved to a location of a desired logical ancilla qubit, defining a movement operation process based on boundary extension in consideration of the type of the movement operation and the bending location during the movement, and moving the magic state logical qubit to the location of the logical ancilla qubit in conformity with the movement operation process.

Abstract: Proposed is a substrate processing apparatus for processing a substrate, substrate processing apparatus including: a liquid processing chamber performing liquid processing on a substrate by supplying processing liquid to the substrate; a drying chamber drying the substrate; a transferring robot transferring the substrate from the liquid processing chamber to the drying chamber; and an inspection unit inspecting a state of the drying chamber.

Abstract: A method of providing differential security services for a ship network by a service provider connected to a client performing the differential security services may comprise: receiving a service request from a user terminal by an authentication performing unit of a service provider including a processor; returning or issuing, by the authentication performing unit, an ID token and an authentication code to the user terminal in response to the service request; receiving, by the client, the ID token and the authentication code from the user terminal; verifying, by the client, validity of the ID token; setting, by the client, a session cookie for the service request when the validity is verified; transmitting, by the client, an access token request including the authentication code to a token issuing unit of the service provider; and receiving, by the client, an access token from the token issuing unit.

Abstract: Provided is a heterojunction structure device. The heterojunction structure device includes: a gate electrode disposed on a substrate; a ferroelectric layer disposed on the gate electrode and including a material having ferroelectric characteristics; a channel layer disposed on the ferroelectric layer and including a material having ferroelectric and semiconductor characteristics; and a source electrode and a drain electrode disposed on the channel layer while being spaced apart from each other.

Abstract: A circuit board including an insulating layer burying at least one wiring layer and at least one via layer, and having first and second surfaces facing each other in a first direction, and a pad including a protruding portion protruding from the first surface of the insulating layer and an embedded portion embedded in the insulating layer, and electrically connected to the wiring layer. The protruding portion includes a first portion positioned at the outermost part along the first direction and parallel to a second direction parallel to the first surface, and a second portion connected to the embedded portion and adjacent to the first surface, and in the width along the second direction, the width of the first portion is different from the width of the second portion.

Abstract: Provided is a ferroelectric structure. The ferroelectric structure includes: a substrate; a lower electrode disposed on the substrate; a ferroelectric layer disposed on the lower electrode including a two-dimensional ferroelectric material; and an upper electrode disposed on the ferroelectric layer, in which a current value of random intensity is obtained for the same voltage being applied.

Abstract: Provided is a method for manufacturing a stack structure. The method for manufacturing a stack structure includes: preparing a substrate; forming a two-dimensional semiconductor material on the substrate; and oxidizing the two-dimensional semiconductor material using oxygen plasma to form a high-k material layer including the high-k material. The stack structure manufactured through the above-described method may be easily applied to a MOS capacitor, a field effect transistor (FET), an impact ionization super-tilt switching device, a dye-sensitized solar cell, an architectural film (particularly, a film used for window coating), and the like.

Abstract: An information protection method based on software-defined perimeter (SDP) for Internet of Things (IoT) cloud security may comprise: receiving, at an SDP controller, an onboarding request message with an identity (ID) token from an SDP client acting as an initiating host, the onboarding request message comprising information requesting authentication of the SDP client and a handshake parameter specifying a handshake protocol for use in an SDP access process; and issuing, at the SDP controller, an SDP client credential corresponding to the handshake parameter.

Abstract: Disclosed is a substrate treating apparatus including: a chamber providing a treatment space therein; a substrate support member located inside the chamber and for supporting a substrate; a supply port for supplying a treatment fluid into the treatment space of the chamber; a filler member located between the supply port and the substrate to fill a portion of a volume of the treatment space, in which the filler member has perforations, and the perforations are provided in a collision shape such that treatment fluids passing through the perforations collide each other.

Abstract: A delivery robot includes: an inner box provided with a receiving space whose upper part is opened; a hinge bracket fixed to one side of the inner box; an actuator placed on one side of the inner box and configured to lift the rod up and down; a rail arranged vertically outside the inner box; a cover assembly partially connected to the rod, installed on the hinge bracket, and configured to rotate around a first axis according to a lifting operation of the rod to open an upper part of the inner box; a tray placed in a receiving space of the inner box; a lift wheel unit fixed to the tray and configured to move up and down along the rail; a first link installed on the lift wheel unit to rotate around the second axis; and a second link whose one side is connected to the first link to rotate around a third axis and whose other side is connected to the cover assembly to rotate around a fourth axis.

Abstract: Provided is to an epoxy coating composition having excellent acid resistance and workability. The epoxy coating composition of the present invention has excellent acid resistance and appearance, and at the same time, is capable of being coated into a thin film by using a roller, and thus, has excellent workability and enables easy repair coating. The epoxy coating composition of the present invention is applicable as a coating for buildings, such as concrete flooring, and the like.

Abstract: A negative electrode active material and a rechargeable lithium battery including the negative electrode active material, the negative electrode active material includes a core including a carbon material; vanadium oxide on a surface of the core; and a fluorine (F)-containing carbon layer on the surface of the core and on a surface of the vanadium oxide.

Abstract: A linear motor design variable verification method and a linear motor design variable optimization method are disclosed. The linear motor design variable verification method includes a first step of deriving a magnetic permeability matrix of a linear motor from a linear motor design variable; a second step of deriving a Maxwell matrix of the linear motor from the magnetic permeability matrix of the linear motor via LU decomposition; a third step of deriving, from the Maxwell matrix of the linear motor, at least one verification target physical quantity selected from a group including a force of the linear motor, a magnetic flux linkage passing through each of coils of a stator of the linear motor, a counter electromotive force of the linear motor, and an inductance of the linear motor; and a fourth step of comparing the derived verification target physical quantity with a predetermined reference value, and determining whether a target verification condition is satisfied, based on the comparing result.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber providing an inner space; a fluid supply unit configured to supply a treating fluid to the inner space; and a fluid exhaust unit configured to exhaust the treating fluid from the inner space, and wherein the fluid exhaust unit includes: an exhaust line connected to the chamber; and a pressure adjusting member installed at the exhaust line and configured to maintain a pressure of the inner space to a set pressure, and wherein the fluid supply unit includes: a fluid supply source; and a supply line provided between the fluid supply source and the chamber, and wherein at the supply line or the exhaust line a flow rate measuring member configured to measure a flow rate per unit time of the treating fluid flowing at the inner space is installed.