Abstract: A refrigerator door includes a color module which displays various colors by using LEDs. Accordingly, when a consumer desires to change the color of the refrigerator door, the color of the refrigerator door can be changed to color desired by the consumer.

Abstract: A display device comprises a substrate; a driving transistor including a first active layer and a switching transistor including a second active layer, the first active layer and the second active layer being disposed on the substrate; a first gate insulating layer disposed on the first active layer of the driving transistor and the second active layer of the switching transistor; first and second gate electrodes disposed on the first gate insulating layer to overlap the first active layer of the driving transistor and the second active layer of the switching transistor, respectively; a first interlayer insulating layer disposed on the first gate electrode and the second gate electrode; and a second interlayer insulating layer disposed on the first interlayer insulating layer to overlap the first active layer without overlapping the second active layer in a plan view.

Abstract: A semiconductor device includes a semiconductor substrate and a connection terminal, including a base pillar, on the semiconductor substrate. An insulation layer is formed on the semiconductor substrate, the insulation layer including an opening in the insulation layer through which the base pillar extends, wherein a side wall of the insulation layer defining the opening includes a horizontal step at a level that is lower than an uppermost portion of the base pillar.

Abstract: A semiconductor device includes a semiconductor substrate and a connection terminal, including a base pillar, on the semiconductor substrate. An insulation layer is formed on the semiconductor substrate, the insulation layer including an opening in the insulation layer through which the base pillar extends, wherein a side wall of the insulation layer defining the opening includes a horizontal step at a level that is lower than an uppermost portion of the base pillar.

Abstract: A semiconductor device includes a semiconductor substrate and a connection terminal, including a base pillar, on the semiconductor substrate. An insulation layer is formed on the semiconductor substrate, the insulation layer including an opening in the insulation layer through which the base pillar extends, wherein a side wall of the insulation layer defining the opening includes a horizontal step at a level that is lower than an uppermost portion of the base pillar.

Abstract: A semiconductor device includes a semiconductor substrate and a connection terminal, including a base pillar, on the semiconductor substrate. An insulation layer is formed on the semiconductor substrate, the insulation layer including an opening in the insulation layer through which the base pillar extends, wherein a side wall of the insulation layer defining the opening includes a horizontal step at a level that is lower than an uppermost portion of the base pillar.

Abstract: A method of forming a pattern of a semiconductor device includes: forming a first mask pattern comprising first mask lines extending in a first direction in a cell region and second mask lines extending in the first direction in a first core region, the first mask pattern covering a second core region; forming, on the first mask pattern, a second mask pattern comprising third mask lines extending in a second direction in the cell region and fourth mask lines extending in the second direction in the second core region, the second mask pattern covering the first core region; and forming a third mask pattern by using the second mask pattern, the third mask pattern comprising island-type masks in the cell region, fifth mask lines extending in the first direction in the first core region, and sixth mask lines extending in the second direction in the second core region.

Abstract: The present invention relates to a dental implant fixture, and more particularly, to a dental implant fixture which rotates about a central axis thereof, and thus is inserted into a bone tissue constituted by a cortical bone and a spongy bone to form an artificial tooth root, wherein the dental implant fixture includes a first portion, a second portion, and a third portion. The first portion is inserted into the cortical bone and has an outer surface with a first screw thread whereon first vertices and first valleys are alternately arranged. The second portion is disposed beneath the first portion and inserted into the spongy bone, has an outer surface with a second screw thread whereon second vertices and second valleys are alternately arranged. The distance between the adjacent second vertices of the second screw thread is larger than the distance between the adjacent first vertices of the first screw thread.

Abstract: An implant fixture that is inserted into a bone tissue formed of a cortical bone and a cancellous bone while rotating on a central axis to thereby form an artificial tooth root, the implant fixture including a first portion that is inserted into the cortical bone and includes a first screw thread having first peaks and first roots alternating with one another on an outer surface of the first portion; and a second portion that is disposed below the first portion and inserted into the cancellous bone.

Abstract: A method of forming a pattern of a semiconductor device includes: forming a first mask pattern comprising first mask lines extending in a first direction in a cell region and second mask lines extending in the first direction in a first core region, the first mask pattern covering a second core region; forming, on the first mask pattern, a second mask pattern comprising third mask lines extending in a second direction in the cell region and fourth mask lines extending in the second direction in the second core region, the second mask pattern covering the first core region; and forming a third mask pattern by using the second mask pattern, the third mask pattern comprising island-type masks in the cell region, fifth mask lines extending in the first direction in the first core region, and sixth mask lines extending in the second direction in the second core region.

Abstract: A laser system according to an embodiment of the present invention includes an oscillation unit to generate a laser output, a connection unit to connect the oscillation unit with an optical fiber loop, an amplifying unit to amplify the laser output on the optical fiber loop, a conversion unit disposed on the optical fiber loop to convert pulsed wave laser output into continuous wave laser output, and an output unit disposed between the connection unit and the conversion unit to split a part of the laser output toward the conversion unit. The system for generating a high output pulsed wave laser and converting the pulsed wave laser into a continuous wave laser may be implemented in a simple structure and small size with high stability and high reproducibility. In addition, a high output laser may be obtained. Also, since conversion from the pulsed wave into the continuous wave is easy, both of the high output pulsed wave and the high output continuous wave may be obtained as necessary.

Abstract: A laser system according to an embodiment of the present invention includes an oscillation unit to generate a laser output, a connection unit to connect the oscillation unit with an optical fiber loop, an amplifying unit to amplify the laser output on the optical fiber loop, a conversion unit disposed on the optical fiber loop to convert pulsed wave laser output into continuous wave laser output, and an output unit disposed between the connection unit and the conversion unit to split a part of the laser output toward the conversion unit. The system for generating a high output pulsed wave laser and converting the pulsed wave laser into a continuous wave laser may be implemented in a simple structure and small size with high stability and high reproducibility. In addition, a high output laser may be obtained. Also, since conversion from the pulsed wave into the continuous wave is easy, both of the high output pulsed wave and the high output continuous wave may be obtained as necessary.

Abstract: A semiconductor device includes a plurality of cylindrical structures located at vertices and central points of a plurality of hexagons in a honeycomb pattern, and a unitary support having a plurality of openings. Each of the openings exposes a part each of four of the cylindrical structures. Each of the openings has the shape of a parallelogram or an oval substantially. A first distance between opposite cylindrical structures of a first pair of the four cylindrical structures exposed by each opening is shorter than a second distance between opposite cylindrical structures of a second pair of the four cylindrical structures exposed by the opening. The first distance is equal to a distance between the central point and each of the vertices of the hexagon.

Abstract: A semiconductor device includes a plurality of cylindrical structures located at vertices and central points of a plurality of hexagons in a honeycomb pattern, and a unitary support having a plurality of openings. Each of the openings exposes a part each of four of the cylindrical structures. Each of the openings has the shape of a parallelogram or an oval substantially. A first distance between opposite cylindrical structures of a first pair of the four cylindrical structures exposed by each opening is shorter than a second distance between opposite cylindrical structures of a second pair of the four cylindrical structures exposed by the opening. The first distance is equal to a distance between the central point and each of the vertices of the hexagon.

Abstract: An implant fixture that is inserted into a bone tissue formed of a cortical bone and a cancellous bone while rotating on a central axis to thereby form an artificial tooth root, the implant fixture including a first portion that is inserted into the cortical bone and includes a first screw thread having first peaks and first roots alternating with one another on an outer surface of the first portion; and a second portion that is disposed below the first portion and inserted into the cancellous bone.

Abstract: The present invention relates to a dental implant fixture, and more particularly, to a dental implant fixture which rotates about a central axis thereof, and thus is inserted into a bone tissue constituted by a cortical bone and a spongy bone to form an artificial tooth root, wherein the dental implant fixture includes a first portion, a second portion, and a third portion. The first portion is inserted into the cortical bone and has an outer surface with a first screw thread whereon first vertices and first valleys are alternately arranged. The second portion is disposed beneath the first portion and inserted into the spongy bone, has an outer surface with a second screw thread whereon second vertices and second valleys are alternately arranged. The distance between the adjacent second vertices of the second screw thread is larger than the distance between the adjacent first vertices of the first screw thread.

Abstract: An apparatus for cleaning semiconductor substrates includes a chamber having a cleaning room and a drying room disposed over the cleaning room. The cleaning room and the drying room are separated or placed in communication with one another by a separation plate. An exhaust path is formed at a central portion of the separation plate. As de-ionized water (DI water) filling the cleaning room is drained during a dry process, the inside of the drying room is decompressed, and a drying fluid in the drying room flows from the drying room to the cleaning room along the exhaust path.

Abstract: A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.

Abstract: A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially uniformly dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.

Abstract: A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in a drying chamber disposed over the cleaning tank. A shutter separates the cleaning tank from the drying tank. A wafer boat moves the wafer vertically between the cleaning tank and the drying tank. Nozzles for providing the cleaning solution onto the wafer are disposed at both inner sides of the drying tank. The nozzles are connected to a drying gas supply unit to alternately and periodically provide the drying gas onto the wafer.