Patents by Inventor Sangwon Han
Sangwon Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12521726Abstract: The micronizing apparatus includes: a body having a transfer space where hydrogel is transferred, and a discharge space where ground hydrogel is discharged; a rotation shaft disposed in the transfer space, wherein at least one screw is formed on an outer perimeter surface of the first rotation shaft, to transfer the hydrogel along a longitudinal direction of the body; a rotor installed on the rotation shaft so as to rotate together with the rotation shaft, wherein a plurality of rotor blades and a plurality of rotor recesses are alternately formed along a circumferential direction on an outer perimeter part of the rotor; and a stator surrounding the rotor with an air gap between the rotor and the stator, which is a predetermined distance between an outside diameter of the rotor and an inside diameter of the stator, and is fixed to the body.Type: GrantFiled: June 20, 2022Date of Patent: January 13, 2026Assignee: LG CHEM, LTD.Inventors: Ui Seok Chung, Yoon Jae Min, Gicheul Kim, Tae Yun Kim, Heechang Woo, Sangwon Han
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Publication number: 20250382426Abstract: The present disclosure relates to a preparation method of a super absorbent polymer and a super absorbent polymer. More specifically, it relates to a preparation method of a super absorbent polymer exhibiting excellent absorption properties with significantly reduced generation of fine particles.Type: ApplicationFiled: December 15, 2023Publication date: December 18, 2025Applicant: LG Chem, Ltd.Inventors: Junwye Lee, Sung Soo Park, Tae Yun Kim, Heechang Woo, Seokhyeon Baek, Sangwon Han, Gicheul Kim, Yoon Jae Min, Jin Hyuck Ju, Taebin Ahn, Seul Ah Lee, Dong Hoon Park, Kwangin Shin, Se Yeol Park, Ui Seok Chung, Min Goo Jee
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Patent number: 12338331Abstract: This invention relates to a method for preparing a superabsorbent polymer, more specifically to a method for preparing a superabsorbent polymer that uses stearic acid or salts thereof in the process of reassembling fine powders, thereby improving processability in the preparation process of the superabsorbent polymer, and realizing excellent absorption properties.Type: GrantFiled: October 8, 2020Date of Patent: June 24, 2025Assignee: LG Chem, Ltd.Inventors: Se Yeol Park, Gicheul Kim, Yun Kyung Do, Sangwon Han
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Publication number: 20250177952Abstract: A preparation method for a super absorbent polymer is provided. The disclosed method provides is capable of improving the absorption rate and overall absorption properties of the super absorbent polymer. The disclosed method is also capable of effectively reducing extractable components and residual monomers by introducing a radical reaction system in a pulverization process.Type: ApplicationFiled: July 17, 2023Publication date: June 5, 2025Applicant: LG Chem, Ltd.Inventors: Seul Ah Lee, Sung Soo Park, Jin Hyuck Ju, Junwye Lee, Taebin Ahn, Tae Yun Kim, Dong Hoon Park, Kwangin Shin, Heechang Woo, Seokhyeon Baek, Sangwon Han, Min Goo Jee
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Publication number: 20240400770Abstract: Provided are a superabsorbent polymer composition and a preparation method thereof, wherein the method is capable of suppressing aggregation of a water-containing gel polymer and improving pulverization processability in a pulverization process by including an additive represented by Chemical Formula 1: wherein all the variables are described herein.Type: ApplicationFiled: October 28, 2022Publication date: December 5, 2024Applicant: LG Chem, Ltd.Inventors: Yu Jin Kim, Jaemoon Jun, Kiyoul Yoon, Gicheul Kim, Ui Seok Chung, Sangwon Han
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Publication number: 20240278211Abstract: This invention relates to a method for preparing super absorbent polymer and super absorbent polymer. More specifically, this invention relates to a method for preparing super absorbent polymer that can inhibit generation of fine particles during the preparation process, and simultaneously, realize excellent vortex time, by controlling the process conditions of a drying step to prepare base resin powder having relatively high moisture content, and super absorbent polymer.Type: ApplicationFiled: June 20, 2022Publication date: August 22, 2024Applicant: LG CHEM, LTD.Inventors: Sangwon HAN, Gicheul KIM, Se Yeol PARK, Tae Yun KIM
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Publication number: 20230381788Abstract: The micronizing apparatus includes: a body having a transfer space where hydrogel is transferred, and a discharge space where ground hydrogel is discharged; a rotation shaft disposed in the transfer space, wherein at least one screw is formed on an outer perimeter surface of the first rotation shaft, to transfer the hydrogel along a longitudinal direction of the body; a rotor installed on the rotation shaft so as to rotate together with the rotation shaft, wherein a plurality of rotor blades and a plurality of rotor recesses are alternately formed along a circumferential direction on an outer perimeter part of the rotor; and a stator surrounding the rotor with an air gap between the rotor and the stator, which is a predetermined distance between an outside diameter of the rotor and an inside diameter of the stator, and is fixed to the bodyType: ApplicationFiled: June 20, 2022Publication date: November 30, 2023Applicant: LG CHEM, LTD.Inventors: Ui Seok CHUNG, Yoon Jae MIN, Gicheul KIM, Tae Yun KIM, Heechang WOO, Sangwon HAN
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Publication number: 20230338925Abstract: A micronizing apparatus for hydrogel of super absorbent polymer includes: a body having a transfer space where hydrogel is transferred, and a discharge space where ground hydrogel is discharged; a first rotation shaft disposed in the transfer space, wherein at least one screw is formed on an outer perimeter surface of the first rotational shaft to transfer the hydrogel along a longitudinal direction of the body; a hole plate fixed to the body and having a plurality of through holes; and a second rotation shaft disposed in the discharge space, wherein a cutter is attached and spaced from the hole plate by a predetermined distance, to grind the hydrogel transferred by the screw, wherein a rotation speed of the first rotation shaft and a rotation speed of the second rotation shaft may be independently controlled.Type: ApplicationFiled: June 20, 2022Publication date: October 26, 2023Applicant: LG CHEM, LTD.Inventors: Ui Seok CHUNG, Yoon Jae MIN, Gicheul KIM, Tae Yun KIM, Heechang WOO, Sangwon HAN
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Publication number: 20220315715Abstract: This invention relates to a method for preparing a superabsorbent polymer, more specifically to a method for preparing a superabsorbent polymer that uses stearic acid or salts thereof in the process of reassembling fine powders, thereby improving processability in the preparation process of the superabsorbent polymer, and realizing excellent absorption properties.Type: ApplicationFiled: October 8, 2020Publication date: October 6, 2022Applicant: LG Chem, Ltd.Inventors: Se Yeol Park, Gicheul Kim, Yun Kyung Do, Sangwon Han
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Patent number: 7605655Abstract: There is provided a highly linear differential amplifying circuit. The highly linear differential amplifying circuit includes: a differential amplifying unit including a main differential amplifying unit having a differential pair of transistors for amplifying a difference of two input signals and an auxiliary amplifying unit connected in parallel with the main differential amplifying unit, wherein second-order derivatives of transconductances of the main differential amplifying unit and the auxiliary differential amplifying unit are properly set to have an offset; and a source degeneration resistor unit including a first source degeneration resistor to a fourth source degeneration resistor. Accordingly, the linearity of the differential amplifying circuit is improved at a wide output power region.Type: GrantFiled: May 29, 2008Date of Patent: October 20, 2009Assignee: Integrant Technologies Inc.Inventors: Jongsik Kim, Sangwon Han, Hyunchol Shin
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Publication number: 20090219092Abstract: There is provided a highly linear differential amplifying circuit. The highly linear differential amplifying circuit includes: a differential amplifying unit including a main differential amplifying unit having a differential pair of transistors for amplifying a difference of two input signals and an auxiliary amplifying unit connected in parallel with the main differential amplifying unit, wherein second-order derivatives of transconductances of the main differential amplifying unit and the auxiliary differential amplifying unit are properly set to have an offset; and a source degeneration resistor unit including a first source degeneration resistor to a fourth source degeneration resistor. Accordingly, the linearity of the differential amplifying circuit is improved at a wide output power region.Type: ApplicationFiled: May 29, 2008Publication date: September 3, 2009Inventors: Jongsik KIM, Sangwon Han, Hyunchol Shin