Patents by Inventor Sangya Jain

Sangya Jain has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5399456
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
    Type: Grant
    Filed: November 19, 1992
    Date of Patent: March 21, 1995
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Patent number: 5256522
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.
    Type: Grant
    Filed: December 30, 1991
    Date of Patent: October 26, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Patent number: 5240807
    Abstract: A water soluble built-on mask layer is provided on a photoresist composition disposed on a substrate. The photoresist comprises an o-quinone diazide and a novolak or paravinyl phenol resin. The built-on mask layer comprises a water soluble, photobleachable diazonium salt, a coupler for the diazonium salt and an acidic, polymeric, film forming resin such as polystyrene sulfonic acid.
    Type: Grant
    Filed: August 2, 1989
    Date of Patent: August 31, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Sangya Jain, Salvatore Emmi, Thomas S. Phillips
  • Patent number: 5217840
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
    Type: Grant
    Filed: May 25, 1990
    Date of Patent: June 8, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Patent number: 5019488
    Abstract: A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.
    Type: Grant
    Filed: April 24, 1990
    Date of Patent: May 28, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Donald C. Mammato, Sangya Jain, Dana Durham, Mark A. Spak, Douglas A. Usifer, Michael McFarland
  • Patent number: 4931381
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image.
    Type: Grant
    Filed: November 8, 1988
    Date of Patent: June 5, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Patent number: 4929536
    Abstract: A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.
    Type: Grant
    Filed: November 8, 1988
    Date of Patent: May 29, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: Mark A. Spak, Donald Mammato, Dana Durham, Sangya Jain
  • Patent number: 4863827
    Abstract: A process for forming a multi-level positive working photosensitive element. One forms a composition containing an alkali soluble resin, an o-quinonediazide compound and an in-situ generated acid catalyzed crosslinker in a solvent mixture. After coating on a substrate, drying and partially cross-linking the first layer, a second positive working light sensitive layer is applied. Each light sensitive layer is activated by u.v. radiation in different parts of the spectrum. The top layer is imagewise exposed and developed to form a mask. The second layer is flood exposed through this mask and developed. Each development is conducted with an aqueous alkaline solution.
    Type: Grant
    Filed: October 20, 1986
    Date of Patent: September 5, 1989
    Assignee: American Hoechst Corporation
    Inventors: Sangya Jain, Yuh-Loo Chang
  • Patent number: 4835086
    Abstract: A photosensitive article which comprises a substrate, a first light sensitive layer on the substrate, a polysulfone layer and a second light sensitive layer. The first light sensitive layer preferably comprises a depolymerizable polymethyl methacrylate polymer and the second light sensitive layer preferably comprises on o-quinone diazide in admixture with a water insoluble, aqueous alkaline soluble binder resin.
    Type: Grant
    Filed: February 12, 1988
    Date of Patent: May 30, 1989
    Assignee: Hoechst Celanese Corporation
    Inventor: Sangya Jain
  • Patent number: 4588670
    Abstract: A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.
    Type: Grant
    Filed: February 28, 1985
    Date of Patent: May 13, 1986
    Assignee: American Hoechst Corporation
    Inventors: Michael Kelly, Donald C. Mammato, Dana Durham, Sangya Jain, Lawrence Crane