Abstract: A computer-implemented method includes requesting, using a branch controller, an operating status of at least one application of a first plurality of applications executing in a first core site using a first User Datagram Protocol (UDP) ping, the first UDP ping being transmitted to a first network controller included in the first core site through a first VPN connection between the branch controller and the first core site; and receiving, using the branch controller, the operating status of the at least one application of the first plurality of applications using the first UDP ping received through the first VPN connection.

Abstract: A computer-implemented method includes requesting, using a branch controller, an operating status of at least one application of a first plurality of applications executing in a first core site using a first User Datagram Protocol (UDP) ping, the first UDP ping being transmitted to a first network controller included in the first core site through a first VPN connection between the branch controller and the first core site; and receiving, using the branch controller, the operating status of the at least one application of the first plurality of applications using the first UDP ping received through the first VPN connection.

Abstract: A branch office controller (BoC) of a software-defined wide-area network (SDWAN) is configured to collect real-time network physical connection and connected device information and pass this information to the cloud platform server. This enables the cloud platform server to combine the information in a configuration template and other predetermined network device information with the real-time network physical connection and connected device information in order to generate provisioning information provided to the BoC to effectuate provisioning of network devices.

Abstract: A method, system, and program storage device for implementing the method of controlling a manufacturing system, wherein the method comprises providing a plurality of workpieces to be processed on a processing tool, the plurality of workpieces located at processing stations prior to the processing tool, determining auxiliary equipment allocation needs for the processing tool based on characteristics associated with the plurality of workpieces prior to the workpieces arriving at the processing tool, and sending auxiliary equipment to the processing tool based on the allocation needs prior to the workpieces arriving at the processing tool. According to an embodiment of the invention, the processing tool comprises a photolithographic system, the auxiliary equipment comprises a reticle, and the plurality of workpieces comprise semiconductor substrates.

Abstract: The invention provides a method and apparatus for decoupling loss recovery from congestion and window control. The system provides improved performance in high loss environments such as wireless links. The system avoids unnecessary window adjustment in response to packet losses. Transmission rates can be maintained without compromising loss recovery. The invention uses just-in-time Packet Expiration, Transmission Order Queue, a Forward Retransmission Algorithm and Window Control to provide improved performance. The invention maintains a queue of packets in flight called the Transmission Order Queue (TOQ). When an acknowledgement is received for a packet in the in-flight queue, that packet is removed from the queue. If a packet is still in the queue for a certain threshold time, the invention assumes that it is lost. At that point, the packet is removed from the in-flight queue and the packet is retransmitted.

Abstract: A method, system, and program storage device for implementing the method of controlling a manufacturing system, wherein the method comprises providing a plurality of workpieces to be processed on a processing tool, the plurality of workpieces located at processing stations prior to the processing tool, determining auxiliary equipment allocation needs for the processing tool based on characteristics associated with the plurality of workpieces prior to the workpieces arriving at the processing tool, and sending auxiliary equipment to the processing tool based on the allocation needs prior to the workpieces arriving at the processing tool. According to an embodiment of the invention, the processing tool comprises a photolithographic system, the auxiliary equipment comprises a reticle, and the plurality of workpieces comprise semiconductor substrates.

Abstract: The invention provides a method and apparatus for decoupling loss recovery from congestion and window control. The system provides improved performance in high loss environments such as wireless links. The system avoids unnecessary window adjustment in response to packet losses. Transmission rates can be maintained with out compromising loss recovery. The invention uses just-in-time Packet Expiration, Transmission Order Queue, a Forward Retransmission Algorithm and Window Control to provide improved performance. The invention maintains a queue of packets in flight called the Transmission Order Queue (TOQ). When an acknowledgement is received for a packet in the in-flight queue, that packet is removed from the queue. If a packet is still in the queue for a certain threshold time, the invention assumes that it is lost. At that point, the packet is removed from the in-flight queue and the packet is retransmitted.

Abstract: A method, system, and program storage device for implementing the method of controlling a manufacturing system, wherein the method comprises providing a plurality of workpieces to be processed on a processing tool, the plurality of workpieces located at processing stations prior to the processing tool, determining auxiliary equipment allocation needs for the processing tool based on characteristics associated with the plurality of workpieces prior to the workpieces arriving at the processing tool, and sending auxiliary equipment to the processing tool based on the allocation needs prior to the workpieces arriving at the processing tool. According to an embodiment of the invention, the processing tool comprises a photolithographic system, the auxiliary equipment comprises a reticle, and the plurality of workpieces comprise semiconductor substrates.