Patents by Inventor Sanjay Kumar Banerjee

Sanjay Kumar Banerjee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180323370
    Abstract: A magnetic solid state device is disclosed. The magnetic solid state device includes a substrate and a topological insulator deposited on top of the substrate. The magnetic solid state device also includes a first perpendicular magnetic anisotropy (PMA) bit having a reference PMA layer located on the topological insulator, and a second PMA bit having a free PMA layer located on the topological insulator. A gate contact is utilized to receive various predetermined voltages for controlling the Ruderman-Kittel-Kasuya-Yosida (RKKY) interactions between the reference PMA layer in the first PMA bit and the free PMA layer in the second PMA bit.
    Type: Application
    Filed: May 8, 2017
    Publication date: November 8, 2018
    Inventors: LEONARD FRANKLIN REGISTER, II, BAHNIMAN GHOSH, RIK DEY, SANJAY KUMAR BANERJEE
  • Patent number: 10121962
    Abstract: A magnetic solid state device is disclosed. The magnetic solid state device includes a substrate and a topological insulator deposited on top of the substrate. The magnetic solid state device also includes a first perpendicular magnetic anisotropy (PMA) bit having a reference PMA layer located on the topological insulator, and a second PMA bit having a free PMA layer located on the topological insulator. A gate contact is utilized to receive various predetermined voltages for controlling the Ruderman-Kittel-Kasuya-Yosida (RKKY) interactions between the reference PMA layer in the first PMA bit and the free PMA layer in the second PMA bit.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: November 6, 2018
    Assignee: Board of Regents, The University of Texas System
    Inventors: Leonard Franklin Register, II, Bahniman Ghosh, Rik Dey, Sanjay Kumar Banerjee
  • Patent number: 9562045
    Abstract: The present invention provides compounds of general formula 1 useful as potential phosphodiesterase3 (PDE3) inhibitory agents and a process for the preparation thereof. The derivatives of formula 1 can be employed as therapeutics in human and veterinary medicine, where they can be used, for example, for the treatment and prophylaxis of the following diseases: heart failure, dilated cardiomyopathy, platelet inhibitors, cancer and obstructive pulmonary diseases.
    Type: Grant
    Filed: January 19, 2016
    Date of Patent: February 7, 2017
    Assignee: COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH
    Inventors: Budde Mahendar, Saidulu Mattapally, Mettu Ravinder, Sanjay Kumar Banerjee, Vaidya Jayathirtha Rao
  • Patent number: 9505760
    Abstract: The present invention provides compounds of formula 1 as potential phosphodiesterase3 (PDE3) inhibitory agents and a process for the preparation thereof. The derivatives of formula 1 can be employed as therapeutics in human and veterinary medicine, where they can be used, for the treatment and prophylaxis of the following diseases: heart failure, dilated cardiomyopathy, platelet inhibitors, cancer and obstructive pulmonary diseases.
    Type: Grant
    Filed: January 6, 2016
    Date of Patent: November 29, 2016
    Assignee: COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH
    Inventors: Budde Mahendar, Saidulu Mattapally, Mettu Ravinder, Sanjay Kumar Banerjee, Vaidya Jayathirtha Rao
  • Publication number: 20160194319
    Abstract: The invention relates to a process for the synthesis of pyridopyrimidine derivatives, which work as PDE3 inhibitors.
    Type: Application
    Filed: January 6, 2016
    Publication date: July 7, 2016
    Inventors: Budde MAHENDAR, Saidulu MATTAPALLY, Mettu RAVINDER, Sanjay Kumar BANERJEE, Vaidya Jayathirtha RAO
  • Publication number: 20160159792
    Abstract: The present invention provides compounds of general formula 1 useful as potential phosphodiesterase3 (PDE3) inhibitory agents and a process for the preparation thereof. The derivatives of formula 1 can be employed as therapeutics in human and veterinary medicine, where they can be used, for example, for the treatment and prophylaxis of the following diseases: heart failure, dilated cardiomyopathy, platelet inhibitors, cancer and obstructive pulmonary diseases.
    Type: Application
    Filed: January 19, 2016
    Publication date: June 9, 2016
    Inventors: Budde MAHENDAR, Saidulu MATTAPALLY, Mettu RAVINDER, Sanjay Kumar BANERJEE, Vaidya Jayathirtha RAO
  • Patent number: 9249139
    Abstract: The present invention provides compounds of general formula A useful as potential phosphodiesterase3 (PDE3) inhibitory agents and a process for the preparation thereof. The derivatives of formula A can be employed as therapeutics in human and veterinary medicine, where they can be used, for example, for the treatment and prophylaxis of the following diseases: heart failure, dilated cardiomyopathy, platelet inhibitors, cancer and obstructive pulmonary diseases.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: February 2, 2016
    Assignee: Council of Scientific & Industrial Research
    Inventors: Budde Mahendar, Saidulu Mattapally, Mettu Ravinder, Sanjay Kumar Banerjee, Vaidya Jayathirtha Rao
  • Patent number: 9242982
    Abstract: The present invention provides compounds of formula 1 as potential phosphodiesterase3 (PDE3) inhibitory agents and a process for the preparation thereof. The derivatives of formula 1 can be employed as therapeutics in human and veterinary medicine, where they can be used, for the treatment and prophylaxis of the following diseases: heart failure, dilated cardiomyopathy, platelet inhibitors, cancer and obstructive pulmonary diseases.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: January 26, 2016
    Assignee: COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH
    Inventors: Budde Mahendar, Saidulu Mattapally, Mettu Ravinder, Sanjay Kumar Banerjee, Vaidya Jayathirtha Rao
  • Publication number: 20140296530
    Abstract: The present invention provides compounds of general formula A useful as potential phosphodiesterase3 (PDE3) inhibitory agents and a process for the preparation thereof. The derivatives of formula A can be employed as therapeutics in human and veterinary medicine, where they can be used, for example, for the treatment and prophylaxis of the following diseases: heart failure, dilated cardiomyopathy, platelet inhibitors, cancer and obstructive pulmonary diseases.
    Type: Application
    Filed: January 30, 2014
    Publication date: October 2, 2014
    Applicant: COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH
    Inventors: Budde MAHENDAR, Saidulu MATTAPALLY, Mettu RAVINDER, Sanjay Kumar BANERJEE, Vaidya Jayathirtha RAO
  • Publication number: 20140221651
    Abstract: The present invention provides compounds of formula 1 as potential phosphodiesterase3 (PDE3) inhibitory agents and a process for the preparation thereof. The derivatives of formula 1 can be employed as therapeutics in human and veterinary medicine, where they can be used, for the treatment and prophylaxis of the following diseases: heart failure, dilated cardiomyopathy, platelet inhibitors, cancer and obstructive pulmonary diseases.
    Type: Application
    Filed: January 30, 2014
    Publication date: August 7, 2014
    Applicant: COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH
    Inventors: Budde MAHENDAR, Saidulu MATTAPALLY, Mettu RAVINDER, Sanjay Kumar BANERJEE, Vaidya Jayathirtha RAO
  • Patent number: 6744083
    Abstract: A MOSFET semiconductor device having an asymmetric channel region between the source region and the drain region. In one embodiment, the device comprises a mesa structure on a silicon substrate with the source region being in the substrate and the mesa structure extending from the source region and substrate. The asymmetric channel region can include silicon abutting the source region and a heterostructure material such as Si1-xGex extending to and abutting the drain region. The mole fraction of Ge can increase towards the drain region either uniformly or in steps. In one embodiment, the doping profile of the channel region is non-uniform with higher doping near the source region and lower doping near the drain region.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: June 1, 2004
    Assignee: The Board of Regents, The University of Texas System
    Inventors: Xiangdong Chen, Sanjay Kumar Banerjee
  • Publication number: 20030116792
    Abstract: A MOSFET semiconductor device having an asymmetric channel region between the source region and the drain region. In one embodiment, the device comprises a mesa structure on a silicon substrate with the source region being in the substrate and the mesa structure extending from the source region and substrate. The asymmetric channel region can include silicon abutting the source region and a heterostructure material such as Si1-xGex extending to and abutting the drain region. The mole fraction of Ge can increase towards the drain region either uniformly or in steps. In one embodiment, the doping profile of the channel region is non-uniform with higher doping near the source region and lower doping near the drain region.
    Type: Application
    Filed: October 1, 2002
    Publication date: June 26, 2003
    Applicant: Board of Regents, The University of Texas System
    Inventors: Xiangdong Chen, Sanjay Kumar Banerjee
  • Patent number: 6319799
    Abstract: A heterojunction transistor with high mobility carriers in the channel region includes a source region and a drain region formed in a semiconductor body with the source region and the drain region comprising doped semiconductor alloys separated from the substrate by heterojunctions. A channel region is provided between the source region and the drain region comprising an undoped layer of an alloy of the semiconductor material and a deposited layer of material of the semiconductor body overlying the undoped layer. A gate electrode is formed on a gate oxide over the channel region. In fabricating the high mobility heterojunction transistor, the spaced source and drain regions are formed in the substrate by implanting dopant of conductivity type opposite to the substrate and a material in the alloy and then annealing the structure to form the alloy of the semiconductor material under the undoped layer.
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: November 20, 2001
    Assignee: Board of Regents, The University of Texas System
    Inventors: Qiqing Ouyang, Al F. Tasch, Jr., Sanjay Kumar Banerjee