Abstract: Disclosed are pneumatic bearings with a bonded polymer film wear surface and production methods thereof. For example, a pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing has a bearing surface having a polyimide film fastened to a substrate with a bonding layer. The polyimide film can comprise poly-oxydiphenylene-pyromellitimide and the bonding layer can comprise diglycidyl ether of bisphenol A, 1,4-butanediol diglycidyl ether, and 2,2,4-trimetylhexametylen-1,6-diamin.

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

Abstract: A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a mask, e.g., a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask, such that a projection optic in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of the substrate by using a radiation beam. The support transport device is coupled to and moves the mask support device concurrently with the mask force device.

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract: Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

Abstract: In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.

Abstract: Patterning provided by a lithographic apparatus is optically corrected for focus errors that would result from a topology of a substrate being patterned. Focus control is provided in a cross-scan direction by bending a reticle about a scan axis based on a mapped topology of the substrate. The bending can be updated from field to field as the reticle is scanned. The bending may be unidirectional (e.g., down only), but an optical compensation element (e.g., a lens or mirror polished to a cylindrical shape or a transparent plate or mirror bent by a force actuator to a cylindrical shape) can be included in order to introduce either positive or negative curvature (or no curvature) to the beam wavefront, thereby simplifying the mechatronics of the bender.

Abstract: Disclosed are pneumatic bearings with a bonded polymer film wear surface and production methods thereof. For example, a pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing has a bearing surface having a polyimide film fastened to a substrate with a bonding layer. The polyimide film can comprise poly-oxydiphenylene-pyromellitimide and the bonding layer can comprise diglycidyl ether of bisphenol A, 1,4-butanediol diglycidyl ether, and 2,2,4-trimetylhexametylen-1,6-diamin.

Abstract: A system is configured to compensate for guide flatness errors and/or shifting of a support. The system can include one or more support devices, fluid or magnetic bearings to guide the one or more support devices along a guide, and a compensation system. The compensation system is coupled to respective ones of the one or more support devices adjacent to each of the fluid or magnetic bearings. The compensation system is configured to generate a rotational motion that compensates for tilting in the support devices compensate for any non-straight areas of the guide or shifting (e.g., thermal shifting) of the support devices, which is done through moving of the support devices with respect to the guides during movement of the support devices along the guide.

Abstract: A system and method substantially eliminate reticle slip during the movement of a reticle stage. The system includes a mask holding system, a mask force device, and a support transport device. The mask holding system includes a support device and a holding device where the holding device releasably couples a mask, e.g., a patterning device such as a reticle having a pattern, to the support device. The mask force device is releasably connected to the mask in order to provide an accelerating force to the mask, such that a projection optic in a lithographic apparatus may accurately project a pattern imparted by the patterning device onto a target portion of the substrate by using a radiation beam. The support transport device is coupled to and moves the mask support device concurrently with the mask force device.

Abstract: Patterning provided by a lithographic apparatus is optically corrected for focus errors that would result from a topology of a substrate being patterned. Focus control is provided in a cross-scan direction by bending a reticle about a scan axis based on a mapped topology of the substrate. The bending can be updated from field to field as the reticle is scanned. The bending may be unidirectional (e.g., down only), but an optical compensation element (e.g., a lens or mirror polished to a cylindrical shape or a transparent plate or mirror bent by a force actuator to a cylindrical shape) can be included in order to introduce either positive or negative curvature (or no curvature) to the beam wavefront, thereby simplifying the mechatronics of the bender.

Abstract: A system and method allow for a more effective synchronous scanning mirror (SSM). A lithography apparatus comprises an illumination system, a patterning device, a substrate table, and a projection system. The illumination system conditions a beam of radiation received from a radiation source operating at a first frequency. The patterning device patterns the beam. The substrate table supports and scans a substrate at a scanning velocity. The projection system includes a scanning device including a reflective device and a plurality of flexures. The plurality of flexures being configured to allow the reflective device to resonate about an axis of rotation. The scanning device is configured to scan the patterned beam onto a target area of the substrate The resonant frequency of the scanning device is substantially equal to the first frequency, and is synchronized with the scanning velocity.

Abstract: In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.

Abstract: A system if used to compensate for guide flatness errors and/or shifting of a support. The system comprises one or more of the supports, an actuating system, the guide, a fluid or magnetic bearing, and a compensation system. The one or more support devices have one or more openings. The support devices are coupled to the actuating system, which is configured to move the support devices. The guide passes through respective ones of the openings. The fluid or magnetic bearings are configured to guide the respective support devices along the guides. The compensation system is coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings. The compensation system is configured to compensate for any non-straight areas of the guides or shifting (e.g., thermal shifting) of the support devices, which is done through moving of the support devices with respect to the guides during movement of the support devices along the guides.

Abstract: A system if used to compensate for guide flatness errors and/or shifting of a support. The system comprises one or more of the supports, an actuating system, the guide, a fluid or magnetic bearing, and a compensation system. The one or more support devices have one or more openings. The support devices are coupled to the actuating system, which is configured to move the support devices. The guide passes through respective ones of the openings. The fluid or magnetic bearings are configured to guide the respective support devices along the guides. The compensation system is coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings. The compensation system is configured to compensate for any non-straight areas of the guides or shifting (e.g.

Abstract: A system and method allow for a more effective synchronous scanning mirror (SSM). A lithography apparatus comprises an illumination system, a patterning device, a substrate table, and a projection system. The illumination system conditions a beam of radiation received from a radiation source operating at a first frequency. The patterning device patterns the beam. The substrate table supports and scans a substrate at a scanning velocity. The projection system includes a scanning device including a reflective device and a plurality of flexures. The plurality of flexures being configured to allow the reflective device to resonate about an axis of rotation. The scanning device is configured to scan the patterned beam onto a target area of the substrate The resonant frequency of the scanning device is substantially equal to the first frequency, and is synchronized with the scanning velocity.

Abstract: A method utilizing a lithography system comprises a lithography patterning chamber, a wafer exchange chamber separated from the lithography patterning chamber by a first gate valve, and at least one alignment load-lock separated from the wafer exchange chamber by a second gate valve. The alignment load-lock includes an alignment stage that aligns a wafer during pump-down. The alignment load-lock can be uni-directional or bi-directional. The lithography system can include one or multiple alignment load-locks.

Abstract: A pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing comprises a bearing body having an active surface divided into a lift portion and a pre-load portion. A plurality of gas distribution channels are formed in the bearing body, wherein a first channel receives a compressed gas, a second channel supplies a vacuum to the pre-load portion of the active surface, and a third channel supplies a positive pressure gas to the lift portion of the active surface. The bearing body has an integral, pneumatically powered, vacuum generator having an inlet coupled to the first channel, a vacuum aperture coupled to the second channel, and an exhaust. The compressed gas may be supplied to the lift portion of the active surface either in parallel, in series, or in a series-parallel configuration, with the integrated vacuum generator. In an embodiment, the pneumatic bearing is reconfigurable.

Abstract: A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement.