Abstract: The present disclosure relates to a sample support device for charged particle microscopy and related methods. The device comprises a substrate and a heating and/or biasing element integrated in or on the substrate to heat (or apply a bias voltage to) a sample when positioned in an observation region of the device. The device comprises a membrane covering an opening in the heater element and/or substrate in the observation region of the device. The membrane is perforated to form at least one hole covered by a graphene layer to form a sample support to place a sample of interest thereon for study. A cap covers the membrane such that a chamber is formed in which the sample can be isolated in a controllable gaseous environment.

Abstract: A method for performing high resolution electron microscopy of a soft matter object is described. The method comprises irradiating a soft matter object using an electron microscope having a spherical aberration correction with a substantially constant transfer function in a frequency band of thermal diffuse scattered electrons scattered at the soft matter object. The method comprises detecting the thermal diffuse scattered (TDS) electrons scattered at the soft matter, and using the detected thermal diffuse scattered electrons for deriving therefrom an image of the soft matter object.

Abstract: A method for performing high resolution electron microscopy of a soft matter object is described. The method comprises irradiating a soft matter object using an electron microscope having a spherical aberration correction with a substantially constant transfer function in a frequency band of thermal diffuse scattered electrons scattered at the soft matter object. The method comprises detecting the thermal diffuse scattered (TDS) electrons scattered at the soft matter, and using the detected thermal diffuse scattered electrons for deriving therefrom an image of the soft matter object.