Patents by Inventor Sarah BROSNAN

Sarah BROSNAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200190361
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and a cationic polymer. This invention additionally provides a method suitable for polishing a dielectric substrate.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10619075
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10619076
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10584266
    Abstract: The invention relates to a chemical-mechanical polishing composition comprising (a) ceria abrasive particles, (b) a cationic polymer, (c) a nonionic polymer comprising polyethylene glycol octadecyl ether, polyethylene glycol lauryl ether, polyethylene glycol oleyl ether, poly(ethylene)-co-poly(ethylene glycol), octylphenoxy poly(ethyleneoxy)ethanol, or a combination thereof, (d) a saturated monoacid, and (e) an aqueous carrier. The invention also relates to a method of polishing a substrate.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: March 10, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventor: Sarah Brosnan
  • Publication number: 20190284434
    Abstract: The invention relates to a chemical-mechanical polishing composition comprising (a) ceria abrasive particles, (b) a cationic polymer, (c) a nonionic polymer comprising polyethylene glycol octadecyl ether, polyethylene glycol lauryl ether, polyethylene glycol oleyl ether, poly(ethylene)-co-poly(ethylene glycol), octylphenoxy poly(ethyleneoxy)ethanol, or a combination thereof, (d) a saturated monoacid, and (e) an aqueous carrier. The invention also relates to a method of polishing a substrate.
    Type: Application
    Filed: March 14, 2018
    Publication date: September 19, 2019
    Inventor: Sarah Brosnan
  • Publication number: 20190185716
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: February 8, 2019
    Publication date: June 20, 2019
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM
  • Publication number: 20180244956
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: March 23, 2018
    Publication date: August 30, 2018
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM