Abstract: The invention relates to a method of depositing a substance onto a substrate (6), comprising: —providing a substrate (6) at a distance from a conducting spraying nozzle (1), said spaying nozzle (1) having an outlet (2); —providing a liquid composition containing the substance to the spraying nozzle (1); —generating electrically charged liquid droplets from the liquid composition between the outlet (2) of the spraying nozzle (1) and the substrate (6), by providing compressed gas around the liquid composition flowing out of the outlet (2) of the spraying nozzle (1) and by providing an electric field downstream of the outlet (2) of the spraying nozzle (1); and collecting the generated liquid droplets on the substrate (6). The invention also relates to an installation for carrying out this method.

Abstract: The invention relates to a process of use for deoxidizing silicon particles comprising at least the steps consisting in: (i) having surface-oxidized silicon particles that have a mean size of less than or equal to 10 ?m, (ii) formulating said particles into the form of aggregates having a mean size ranging from 20 to 300 ?m, (iii) bringing said aggregates from step (ii) into contact with a thermal plasma conveying hydrogen radicals under conditions suitable for the deoxidation thereof and for the non-evaporation thereof, and (iv) recovering a material deoxidized according to step (iii) in a liquid silicon bath.