Patents by Inventor Sarah Eppinger

Sarah Eppinger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11174378
    Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.
    Type: Grant
    Filed: April 22, 2021
    Date of Patent: November 16, 2021
    Assignee: Chevron Phillips Chemical Company LP
    Inventors: Chung Ching Tso, Errun Ding, Randall S. Muninger, John T. Blagg, Yongwoo Inn, Max P. McDaniel, Ashish M. Sukhadia, Sarah Eppinger
  • Publication number: 20210253835
    Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.
    Type: Application
    Filed: April 22, 2021
    Publication date: August 19, 2021
    Inventors: Chung Ching Tso, Errun Ding, Randall S. Muninger, John T. Blagg, Yongwoo Inn, Max P. McDaniel, Ashish M. Sukhadia, Sarah Eppinger
  • Patent number: 11028258
    Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: June 8, 2021
    Assignee: Chevron Phillips Chemical Company LP
    Inventors: Chung Ching Tso, Errun Ding, Randall S. Muninger, John T. Blagg, Yongwoo Inn, Max P. McDaniel, Ashish M. Sukhadia, Sarah Eppinger
  • Publication number: 20210054178
    Abstract: Ethylene polymers having a density from 0.908 to 0.925 g/cm3, a melt index from 0.5 to 3 g/10 min, a ratio of Mw/Mn from 2 to 4, a ratio of Mz/Mw from 1.6 to 2.3, a CY-a parameter from 0.45 to 0.6, and an ATREF profile characterized by a single peak at a peak ATREF temperature from 76 to 88° C., and by less than 4.5 wt. % of the polymer eluting above a temperature of 91° C. These ethylene polymers can be used to produce various articles of manufacture, such as blown and cast films with a beneficial combination of high tear resistance and low haze.
    Type: Application
    Filed: August 19, 2019
    Publication date: February 25, 2021
    Inventors: Chung Ching Tso, Errun Ding, Randall S. Muninger, John T. Blagg, Yongwoo Inn, Max P. McDaniel, Ashish M. Sukhadia, Sarah Eppinger