Abstract: Methods, apparatus, and processor-readable storage media for authenticating usage data for processing by machine learning models are provided herein. An example method includes receiving, by a machine learning application installed in a user space of an operating system of a user device, a message from a software component, wherein the software component is: configured to collect usage data associated with the user device; signed with using private key corresponding to a digital certificate by an application installed on the user device; and deployed in a kernel space of the operating system, and wherein the message comprises usage data signed using the private key; authenticating, by the machine learning application, the usage data based on a public key corresponding to the digital certificate; and processing, by the machine learning application in response to a result of the authenticating, at least a portion of the authenticated usage data.

Abstract: Mechanisms are provided for compartmental epidemiological computer modeling based on mobility data. Machine learning training of an isolation rate prediction computer model is performed to generate a trained isolation rate prediction model that predicts an isolation rate of a biological population. Isolation data is received which comprises data indicating a measure of mobility of the biological population. The trained isolation rate prediction model is executed on input features extracted from the isolation data to generate a predicted isolation rate. A compartmental epidemiological computer model, comprising a plurality of compartments representing states of a population with regard to an infectious disease, is executed to simulate a progression of the infectious disease and flows of portions of the population from between compartments in the compartmental epidemiological computer model are controlled based on the predicted isolation rate.

Abstract: A contact lens comprising one or more microchannels for transport of liquid through the lens is provided. The contact lens can be made by contacting a curable composition with a microfiber that is insoluble in the curable composition; curing the curable composition to provide a polymeric lens body with the microfiber embedded therein; and contacting the polymeric lens body with a solvent to dissolve the microfiber.

Abstract: Multiple global motion models associated with respective segments of a current frame are decoded from a compressed bitstream. Each global motion model is based on a segmentation of the current frame and represents a respective underlying motion of blocks within a respective segment. Blocks of the current frame are decoded by: for each inter-predicted block of a segment, decoding, form the compressed bitstream, an indication of whether to decode the each inter-predicted block based on a global motion model of the multiple global motion models and associated with the segment, or whether to decode the each inter-predicted block based on a motion vector that is different from the global motion model; and decoding the each inter-predicted block based on the indication.

Abstract: In accordance with various embodiments of the present disclosure, a first instance of a data intake and query system (DIQS) may receive latency data that indicates latency states of second instances of the DIQS, the latency states indicative of latencies associated with processing of event data by the plurality of second instances. The first instance may then determine overall latency state of the first instance based, at least in part, on determining number or percentage of the first instance and the second instances of the DIQS having one or more particular latency states, and determining whether the number or percentage of the first instance and the f second instances of the DIQS having the one or more particular latency states is equal to or exceeds a threshold. The first instance may then present the overall latency state of the first instance.

Abstract: A method for adding a low TCR resistor to a baseline CMOS manufacturing flow. A method of forming a low TCR resistor in a CMOS manufacturing flow. A method of forming an n-type and a p-type transistor with a low TCR resistor in a CMOS manufacturing flow.

Abstract: A method for adding a low TCR resistor to a baseline CMOS manufacturing flow. A method of forming a low TCR resistor in a CMOS manufacturing flow. A method of forming an n-type and a p-type transistor with a low TCR resistor in a CMOS manufacturing flow.

Abstract: A method for adding a low TCR resistor to a baseline CMOS manufacturing flow. A method of forming a low TCR resistor in a CMOS manufacturing flow. A method of forming an n-type and a p-type transistor with a low TCR resistor in a CMOS manufacturing flow.

Abstract: A method for adding a low TCR resistor to a baseline CMOS manufacturing flow. A method of forming a low TCR resistor in a CMOS manufacturing flow. A method of forming an n-type and a p-type transistor with a low TCR resistor in a CMOS manufacturing flow.

Abstract: A method for manufacturing a semiconductor wafer 10 that includes implanting source/drain regions 75 within a top surface of the semiconductor substrate 20, forming a dielectric capping layer 170 over the semiconductor wafer 20, and annealing the semiconductor wafer 10 to activate sources/drains 70. The method further includes forming a layer of photoresist 180 and then patterning the layer of photoresist 180 to protect a middle portion of the polysilicon layer 100 of the non-silicided poly resistor stacks 30, etching the exposed portions of the dielectric capping layer 170, and removing the patterned photoresist 180. A layer of silicidation metal 190 is formed over the semiconductor wafer 10, and a silicide anneal is performed to create a silicide 160 within a top surface of said sources/drains 70 and also within unprotected top portions of the polysilicon layer 100 of the non-silicided poly resistors 30. Then the remaining portions of the dielectric capping layer 170 are etched.