Patents by Inventor Sarah Louise Hindley

Sarah Louise Hindley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Molybdenum (IV) amide precursors and use thereof in atomic layer deposition
    Patent number: 9802220
    Abstract: Molybdenum (IV) amide complexes are disclosed herein corresponding in structure to Formula (I): wherein: L is —NR1R2; R1 and R2 are C1-C6-alkyl or hydrogen; R is C1-C6-alkyl; and n is zero, 1, 2 or 3. Further, methods of forming MoO2 films by atomic layer deposition (ALD) using Formula (I) complexes and Mo[N(Me)(Et)]4 are disclosed herein.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: October 31, 2017
    Assignee: Merck Patent GmbH
    Inventors: Peter Nicholas Heys, Rajesh Odedra, Sarah Louise Hindley
  • MOLYBDENUM (IV) AMIDE PRECURSORS AND USE THEREOF IN ATOMIC LAYER DEPOSITION
    Publication number: 20130196065
    Abstract: Molybdenum (IV) amide complexes are disclosed herein corresponding in structure to Formula (I): wherein: L is —NR1R2; R1 and R2 are C1-C6-alkyl or hydrogen; R is C1-C6-alkyl; and n is zero, 1, 2 or 3. Further, methods of forming MoO2 films by atomic layer deposition (ALD) using Formula (I) complexes and Mo[N(Me)(Et)]4 are disclosed herein.
    Type: Application
    Filed: August 25, 2011
    Publication date: August 1, 2013
    Applicant: Sigma-Aldrich Co LLC
    Inventors: Peter Nicholas Heys, Rajesh Odedra, Sarah Louise Hindley