Patents by Inventor Sarah Wieghold

Sarah Wieghold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210036249
    Abstract: Systems and methods for upconversion based on bulk semiconductor sensitizers are provided. In some aspects, issues with previous upconversion approaches are overcome using bulk-semiconductor thin films as sensitizers for the triplet state to achieve efficient upconversion based on triplet-triplet annihilation. Varying the film thickness shifts the threshold of efficient upconversion to subsolar incident powers, enabling practical applications for solar energy harvesting. Systems and methods are provided for upconversion of light in a solid state electronic device, the methods including exposing a bulk semiconductor to a first light source comprising light of a first wavelength, wherein the bulk semiconductor is associated with an organic material capable of upconversion via triplet-triplet annihilation from triplet states in the organic material; and observing light emitted from the organic material at a second wavelength, wherein the second wavelength is shorter than the first wavelength.
    Type: Application
    Filed: August 3, 2020
    Publication date: February 4, 2021
    Inventors: Lea Nienhaus, Sarah Wieghold
  • Patent number: 10724965
    Abstract: Embodiments related to systems and methods of crack detection in wafers (e.g., silicon wafers for photovoltaics, photovoltaic devices including silicon wafers) are disclosed. In some embodiments, an apparatus may include a light source configured to illuminate a side of a wafer and a camera directed towards a first face of the wafer. In some embodiments, a long axis of a field of view of the camera may be angled relative to a propagation direction of the light source. In some embodiments, at least a portion of the field of view of the camera is offset from the path of propagation of light emitted from the light source through the wafer. In some embodiments, at least a portion of a light beam may be oriented at a positive non-zero angle relative to the first face of the wafer, and a dimension of the light beam normal to the first face of the wafer may be larger than a thickness of the wafer.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: July 28, 2020
    Assignee: Massachusetts Institute of Technology
    Inventors: Emanuel M. Sachs, Tonio Buonassisi, Sarah Wieghold, Zhe Liu
  • Publication number: 20190250108
    Abstract: Embodiments related to systems and methods of crack detection in wafers (e.g., silicon wafers for photovoltaics, photovoltaic devices including silicon wafers) are disclosed. In some embodiments, an apparatus may include a light source configured to illuminate a side of a wafer and a camera directed towards a first face of the wafer. In some embodiments, a long axis of a field of view of the camera may be angled relative to a propagation direction of the light source. In some embodiments, at least a portion of the field of view of the camera is offset from the path of propagation of light emitted from the light source through the wafer. In some embodiments, at least a portion of a light beam may be oriented at a positive non-zero angle relative to the first face of the wafer, and a dimension of the light beam normal to the first face of the wafer may be larger than a thickness of the wafer.
    Type: Application
    Filed: February 8, 2019
    Publication date: August 15, 2019
    Applicant: Massachusetts Institute of Technology
    Inventors: Emanuel M. Sachs, Tonio Buonassisi, Sarah Wieghold, Zhe Liu