Patents by Inventor Sasa C. Bajt

Sasa C. Bajt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MoRu/Be multilayers for extreme ultraviolet applications
    Patent number: 6228512
    Abstract: High reflectance, low intrinsic roughness and low stress multilayer systems for extreme ultraviolet (EUV) lithography comprise amorphous layers MoRu and crystalline Be layers. Reflectance greater than 70% has been demonstrated for MoRu/Be multilayers with 50 bilayer pairs. Optical throughput of MoRu/Be multilayers can be 30-40% higher than that of Mo/Be multilayer coatings. The throughput can be improved using a diffusion barrier to make sharper interfaces. A capping layer on the top surface of the multilayer improves the long-term reflectance and EUV radiation stability of the multilayer by forming a very thin native oxide that is water resistant.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: May 8, 2001
    Assignee: The Regents of the University of California
    Inventors: Sasa C. Bajt, Mark A. Wall