Patents by Inventor Sascha Migura
Sascha Migura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10558126Abstract: A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.Type: GrantFiled: February 10, 2015Date of Patent: February 11, 2020Assignee: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Sascha Migura, Bernhard Kneer
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Publication number: 20170176868Abstract: A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.Type: ApplicationFiled: February 10, 2015Publication date: June 22, 2017Inventors: Jan Bernard Plechelmus VAN SCHOOT, Sascha MIGURA, Bernhard KNEER
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Patent number: 9568845Abstract: A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.Type: GrantFiled: March 12, 2012Date of Patent: February 14, 2017Assignee: Carl Zeiss SMT GmbHInventors: Martin Rocktaeschel, Hartmut Enkisch, Franz-Josef Stickel, Oliver Natt, Hans-Juergen Mann, Sascha Migura
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Patent number: 9494718Abstract: A mirror (1a; 1a?; 1b; 1b?; 1c; 1c?) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P??) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H??) and a low refractive index layer (L??), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.Type: GrantFiled: June 15, 2012Date of Patent: November 15, 2016Assignee: Carl Zeiss SMT GmbHInventors: Stephan Muellender, Joern Weber, Wilfried Clauss, Hans-Jochen Paul, Gerhard Braun, Sascha Migura, Aurelian Dodoc, Christoph Zaczek, Gisela Von Blanckenhagen, Roland Loercher
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Patent number: 9291751Abstract: An imaging optical unit (7) serves for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The imaging optical unit (7) has a plurality of components (M1 to M6, GI) which guide imaging light (3). The imaging optical unit (7) is embodied as a pupil-obscured system. The imaging optical unit (7) has at least one mirror (GI) for grazing incidence of the imaging light (3). The result is an imaging optical unit having a handleable combination of low imaging aberrations and compact construction.Type: GrantFiled: June 17, 2013Date of Patent: March 22, 2016Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Rostalski, Sascha Migura, Thomas Schicketanz
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Patent number: 9188771Abstract: An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength ?0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.Type: GrantFiled: December 7, 2011Date of Patent: November 17, 2015Assignee: Carl Zeiss SMT GmbHInventors: Aurelian Dodoc, Christoph Zaczek, Sascha Migura, Gerhard Braun, Hans-Juergen Mann, Hans-Jochen Paul
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Patent number: 9013678Abstract: An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength ? from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about ? or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.Type: GrantFiled: September 13, 2012Date of Patent: April 21, 2015Assignee: Carl Zeiss SMT GmbHInventors: Danny Chan, Hans-Juergen Mann, Sascha Migura
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Publication number: 20140368801Abstract: An imaging optical unit (7) serves for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The imaging optical unit (7) has a plurality of components (M1 to M6, GI) which guide imaging light (3). The imaging optical unit (7) is embodied as a pupil-obscured system. The imaging optical unit (7) has at least one mirror (GI) for grazing incidence of the imaging light (3). The result is an imaging optical unit having a handleable combination of low imaging aberrations and compact construction.Type: ApplicationFiled: June 17, 2013Publication date: December 18, 2014Inventors: Hans-Juergen Rostalski, Sascha Migura, Thomas Schicketanz
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Patent number: 8486590Abstract: To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate configured for a working wavelength in the EUV range and having stacks with layers of at least two materials with different real parts of the refractive index at the working wavelength, wherein the multilayer system (V) is configured such that, as it is irradiated with EUV radiation at a fixed wavelength and an angle interval between the smallest and the largest angle of incidence of up to 21°, the apodization is less than 30%.Type: GrantFiled: June 18, 2012Date of Patent: July 16, 2013Assignee: Carl Zeiss SMT GmbHInventors: Vladimir Kamenov, Sascha Migura
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Publication number: 20130038929Abstract: A mirror (1a; 1a?; 1b; 1b?; 1c; 1c?) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P??) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H??) and a low refractive index layer (L??), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.Type: ApplicationFiled: June 15, 2012Publication date: February 14, 2013Applicant: CARL ZEISS SMT GMBHInventors: Stephan MUELLENDER, Joern WEBER, Wilfried CLAUSS, Hans-Jochen PAUL, Gerhard BRAUN, Sascha MIGURA, Aurelian DODOC, Christoph ZACZEK, Gisela VON BLANCKENHAGEN, Roland LOERCHER
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Publication number: 20130010352Abstract: An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength ? from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about ? or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.Type: ApplicationFiled: September 13, 2012Publication date: January 10, 2013Applicant: Carl Zeiss SMT GmbHInventors: Danny Chan, Hans-Juergen Mann, Sascha Migura
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Publication number: 20120320348Abstract: To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate configured for a working wavelength in the EUV range and having stacks with layers of at least two materials with different real parts of the refractive index at the working wavelength, wherein the multilayer system (V) is configured such that, as it is irradiated with EUV radiation at a fixed wavelength and an angle interval between the smallest and the largest angle of incidence of up to 21°, the apodization is less than 30%.Type: ApplicationFiled: June 18, 2012Publication date: December 20, 2012Applicant: CARL ZEISS SMT GMBHInventors: Vladimir KAMENOV, Sascha MIGURA
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Patent number: 8279404Abstract: An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength ? from an object field in an object surface to an image field in an image surface. The elements include mirror elements having a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about ? or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.Type: GrantFiled: February 10, 2010Date of Patent: October 2, 2012Assignee: Carl Zeiss SMT GmbHInventors: Danny Chan, Hans-Juergen Mann, Sascha Migura
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Publication number: 20120229784Abstract: A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.Type: ApplicationFiled: March 12, 2012Publication date: September 13, 2012Applicant: Carl Zeiss SMT GmbHInventors: Martin ROCKTAESCHEL, Hartmut ENKISCH, Franz-Josef STICKEL, Oliver NATT, Hans-Juergen MANN, Sascha MIGURA
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Publication number: 20120224160Abstract: An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength ?0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.Type: ApplicationFiled: December 7, 2011Publication date: September 6, 2012Applicant: CARL ZEISS SMT GMBHInventors: Aurelian Dodoc, Christoph Zaczek, Sascha Migura, Gerhard Braun, Hans-Juergen Mann, Hans-Jochen Paul
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Publication number: 20120212810Abstract: EUV-mirror having a substrate (S) and a layer arrangement that includes plural layer subsystems (P?, P??) each consisting of a periodic sequence of at least two periods (P2, P3) of individual layers. The periods (P2, P3) include two individual layers composed of different materials for a high refractive index layer (H?, H??) and a low refractive index layer (L?, L??) and have within each layer subsystem (P?, P??) a constant thickness (d2, d3) that deviates from that of the periods of an adjacent layer subsystem.Type: ApplicationFiled: January 10, 2012Publication date: August 23, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Jochen Paul, Gerhard Braun, Sascha Migura, Aurelian Dodoc, Christoph Zaczek
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Publication number: 20120134015Abstract: EUV mirror with a layer arrangement on a substrate. The layer arrangement includes a plurality of layer subsystems each consisting of a periodic sequence of at least one period of individual layers. The periods include two individual layers composed of different material for a high refractive index layer and a low refractive index layer and have within each subsystem a constant thickness that deviates from a period thickness of an adjacent layer subsystem. The subsystem most distant from the substrate has (i) a number of periods greater than the number of periods for the layer subsystem that is second most distant from the substrate and/or (ii) a thickness of the high refractive index layer that deviates by more than 0.1 nm from that of the high refractive index layer of the subsystem that is second most distant from the substrate.Type: ApplicationFiled: October 14, 2011Publication date: May 31, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Jochen PAUL, Gerhard BRAUN, Sascha MIGURA, Aurelian DODOC, Christoph ZACZEK
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Publication number: 20100195075Abstract: An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength ? from an object field in an object surface to an image field in an image surface. The elements include mirror elements having a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about ? or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.Type: ApplicationFiled: February 10, 2010Publication date: August 5, 2010Applicant: Carl Zeiss SMT AGInventors: Danny Chan, Hans-Juergen Mann, Sascha Migura