Patents by Inventor Sashidhar Movva

Sashidhar Movva has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150221528
    Abstract: A backside mold configuration (BSMC) process for manufacturing packaged integrated circuits includes applying a mold compound to a side of a packaging substrate opposite an attached die. The mold compound is deposited on a dielectric (such as photo resist). The mold compound and dielectric are patterned after coupling a die to the packaging substrate to expose a contact pad of the packaging substrate. After patterning the mold compound and dielectric, a packaging connection is coupled to contact pads through the mold compound and dielectric. The mold compound surrounding the packaging connection reduces warpage of the packaging substrate during processing. Additionally, patterning the dielectric after attaching the die improves reliability of the packaging connection.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 6, 2015
    Applicant: QUALCOMM INCORPORATED
    Inventors: Omar James Bchir, Milind Pravin Shah, Sashidhar Movva
  • Publication number: 20140227835
    Abstract: A backside mold configuration (BSMC) process for manufacturing packaged integrated circuits includes applying a mold compound to a side of a packaging substrate opposite an attached die. The mold compound is deposited on a dielectric (such as photo resist). The mold compound and dielectric are patterned after coupling a die to the packaging substrate to expose a contact pad of the packaging substrate. After patterning the mold compound and dielectric, a packaging connection is coupled to contact pads through the mold compound and dielectric. The mold compound surrounding the packaging connection reduces warpage of the packaging substrate during processing. Additionally, patterning the dielectric after attaching the die improves reliability of the packaging connection.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 14, 2014
    Applicant: QUALCOMM INCORPORATED
    Inventors: Omar James Bchir, Milind Pravin Shah, Sashidhar Movva
  • Patent number: 8742603
    Abstract: A backside mold configuration (BSMC) process for manufacturing packaged integrated circuits includes applying a mold compound to a side of a packaging substrate opposite an attached die. The mold compound is deposited on a dielectric (such as photo resist). The mold compound and dielectric are patterned after coupling a die to the packaging substrate to expose a contact pad of the packaging substrate. After patterning the mold compound and dielectric, a packaging connection is coupled to contact pads through the mold compound and dielectric. The mold compound surrounding the packaging connection reduces warpage of the packaging substrate during processing. Additionally, patterning the dielectric after attaching the die improves reliability of the packaging connection.
    Type: Grant
    Filed: September 15, 2010
    Date of Patent: June 3, 2014
    Assignee: QUALCOMM Incorporated
    Inventors: Omar J. Bchir, Milind P. Shah, Sashidhar Movva
  • Patent number: 8703602
    Abstract: Conventional metallization processes fail at high density or small feature size patterns. For example, during patterning dry films may collapse or lift-off resulting in short circuits or open circuits in the metallization pattern. An exemplary method for metallization of integrated circuits includes forming features such as trenches, pads, and planes in a dielectric layer and depositing and selectively treating a seed layer in desired features of the dielectric layer. The treated regions of the seed layer may be used as a seed for electroless deposition of conductive material, such as copper, into the features. When the seed layer is a catalytic ink, the seed layer may be treated by curing the catalytic ink with a laser.
    Type: Grant
    Filed: December 2, 2010
    Date of Patent: April 22, 2014
    Assignee: QUALCOMM Incorporated
    Inventors: Omar J. Bchir, Milind P. Shah, Sashidhar Movva
  • Publication number: 20120139112
    Abstract: Conventional metallization processes fail at high density or small feature size patterns. For example, during patterning dry films may collapse or lift-off resulting in short circuits or open circuits in the metallization pattern. An exemplary method for metallization of integrated circuits includes forming features such as trenches, pads, and planes in a dielectric layer and depositing and selectively treating a seed layer in desired features of the dielectric layer. The treated regions of the seed layer may be used as a seed for electroless deposition of conductive material, such as copper, into the features. When the seed layer is a catalytic ink, the seed layer may be treated by curing the catalytic ink with a laser.
    Type: Application
    Filed: December 2, 2010
    Publication date: June 7, 2012
    Applicant: QUALCOMM Incorporated
    Inventors: Omar J. Bchir, Milind P. Shah, Sashidhar Movva
  • Publication number: 20120090883
    Abstract: A package substrate includes conductive layers and a dielectric interposed between the conductive layers. The dielectric includes a stiffening material component and a neat resin doped with a negative coefficient of thermal expansion (CTE) fiber.
    Type: Application
    Filed: July 15, 2011
    Publication date: April 19, 2012
    Applicant: QUALCOMM INCORPORATED
    Inventors: Omar J. Bchir, Milind P. Shah, Sashidhar Movva
  • Publication number: 20120080787
    Abstract: An electrical package and a method of forming the electrical package, where the electrical package has a substrate with a frontside, an intergrated circuit coupled to the frontside of the substrate, and at least one non-collapsible metal connector created on the frontside of the first substrate.
    Type: Application
    Filed: August 30, 2011
    Publication date: April 5, 2012
    Applicant: QUALCOMM INCORPORATED
    Inventors: Milind P. Shah, Omar J. Bchir, Sashidhar Movva
  • Publication number: 20110285026
    Abstract: A backside mold configuration (BSMC) process for manufacturing packaged integrated circuits includes applying a mold compound to a side of a packaging substrate opposite an attached die. The mold compound is deposited on a dielectric (such as photo resist). The mold compound and dielectric are patterned after coupling a die to the packaging substrate to expose a contact pad of the packaging substrate. After patterning the mold compound and dielectric, a packaging connection is coupled to contact pads through the mold compound and dielectric. The mold compound surrounding the packaging connection reduces warpage of the packaging substrate during processing. Additionally, patterning the dielectric after attaching the die improves reliability of the packaging connection.
    Type: Application
    Filed: September 15, 2010
    Publication date: November 24, 2011
    Applicant: QUALCOMM Incorporated
    Inventors: Omar J. Bchir, Milind P. Shah, Sashidhar Movva